JPS61181534A - プラズマ処理装置 - Google Patents

プラズマ処理装置

Info

Publication number
JPS61181534A
JPS61181534A JP2085185A JP2085185A JPS61181534A JP S61181534 A JPS61181534 A JP S61181534A JP 2085185 A JP2085185 A JP 2085185A JP 2085185 A JP2085185 A JP 2085185A JP S61181534 A JPS61181534 A JP S61181534A
Authority
JP
Japan
Prior art keywords
sample
plasma processing
processing apparatus
magnetic field
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2085185A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0530500B2 (enrdf_load_stackoverflow
Inventor
Takeshi Watanabe
渡辺　猛志
Mitsuo Nakatani
中谷　光雄
Susumu Tsujiku
都竹　進
Masaaki Sato
正昭 佐藤
Masaaki Okunaka
正昭 奥中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP2085185A priority Critical patent/JPS61181534A/ja
Publication of JPS61181534A publication Critical patent/JPS61181534A/ja
Publication of JPH0530500B2 publication Critical patent/JPH0530500B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
JP2085185A 1985-02-07 1985-02-07 プラズマ処理装置 Granted JPS61181534A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2085185A JPS61181534A (ja) 1985-02-07 1985-02-07 プラズマ処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2085185A JPS61181534A (ja) 1985-02-07 1985-02-07 プラズマ処理装置

Publications (2)

Publication Number Publication Date
JPS61181534A true JPS61181534A (ja) 1986-08-14
JPH0530500B2 JPH0530500B2 (enrdf_load_stackoverflow) 1993-05-10

Family

ID=12038597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2085185A Granted JPS61181534A (ja) 1985-02-07 1985-02-07 プラズマ処理装置

Country Status (1)

Country Link
JP (1) JPS61181534A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0273977A (ja) * 1988-09-09 1990-03-13 Sony Corp プラズマ装置
US5016564A (en) * 1986-12-29 1991-05-21 Sumitomo Metal Industries Ltd. Plasma apparatus
JP2007154239A (ja) * 2005-12-02 2007-06-21 Stanley Electric Co Ltd プラズマ成膜方法及びプラズマ成膜装置
JP2010516036A (ja) * 2007-01-12 2010-05-13 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド イオン注入個所の磁界低減化技術

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5016564A (en) * 1986-12-29 1991-05-21 Sumitomo Metal Industries Ltd. Plasma apparatus
US5019117A (en) * 1986-12-29 1991-05-28 Sumitomo Metal Industries Ltd. Plasma apparatus
JPH0273977A (ja) * 1988-09-09 1990-03-13 Sony Corp プラズマ装置
JP2007154239A (ja) * 2005-12-02 2007-06-21 Stanley Electric Co Ltd プラズマ成膜方法及びプラズマ成膜装置
JP2010516036A (ja) * 2007-01-12 2010-05-13 ヴァリアン セミコンダクター イクイップメント アソシエイツ インコーポレイテッド イオン注入個所の磁界低減化技術

Also Published As

Publication number Publication date
JPH0530500B2 (enrdf_load_stackoverflow) 1993-05-10

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