JPS61177370A - 減圧反応装置 - Google Patents

減圧反応装置

Info

Publication number
JPS61177370A
JPS61177370A JP1548785A JP1548785A JPS61177370A JP S61177370 A JPS61177370 A JP S61177370A JP 1548785 A JP1548785 A JP 1548785A JP 1548785 A JP1548785 A JP 1548785A JP S61177370 A JPS61177370 A JP S61177370A
Authority
JP
Japan
Prior art keywords
pump
gas
injection port
furnace
mechanical booster
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1548785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0559987B2 (enExample
Inventor
Hisaharu Kiyota
清田　久晴
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sony Corp
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Priority to JP1548785A priority Critical patent/JPS61177370A/ja
Publication of JPS61177370A publication Critical patent/JPS61177370A/ja
Publication of JPH0559987B2 publication Critical patent/JPH0559987B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/006—Processes utilising sub-atmospheric pressure; Apparatus therefor
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Vapour Deposition (AREA)
JP1548785A 1985-01-31 1985-01-31 減圧反応装置 Granted JPS61177370A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1548785A JPS61177370A (ja) 1985-01-31 1985-01-31 減圧反応装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1548785A JPS61177370A (ja) 1985-01-31 1985-01-31 減圧反応装置

Publications (2)

Publication Number Publication Date
JPS61177370A true JPS61177370A (ja) 1986-08-09
JPH0559987B2 JPH0559987B2 (enExample) 1993-09-01

Family

ID=11890150

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1548785A Granted JPS61177370A (ja) 1985-01-31 1985-01-31 減圧反応装置

Country Status (1)

Country Link
JP (1) JPS61177370A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS648039U (enExample) * 1987-06-29 1989-01-17
EP1560252B1 (en) * 2003-12-31 2016-03-09 Edwards Vacuum, LLC Deposition apparatus
JP2025508995A (ja) * 2022-02-24 2025-04-10 アイエイチアイ ベルネックス アーゲー 化学気相成長装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS648039U (enExample) * 1987-06-29 1989-01-17
EP1560252B1 (en) * 2003-12-31 2016-03-09 Edwards Vacuum, LLC Deposition apparatus
JP2025508995A (ja) * 2022-02-24 2025-04-10 アイエイチアイ ベルネックス アーゲー 化学気相成長装置

Also Published As

Publication number Publication date
JPH0559987B2 (enExample) 1993-09-01

Similar Documents

Publication Publication Date Title
US6773687B1 (en) Exhaust apparatus for process apparatus and method of removing impurity gas
EP1560252B1 (en) Deposition apparatus
JP3140068B2 (ja) クリーニング方法
US6107198A (en) Ammonium chloride vaporizer cold trap
US6207068B1 (en) Silicon nitride etch bath system
US4655800A (en) Waste gas exhaust system for vacuum process apparatus
JP2773078B2 (ja) 処理装置及びその洗浄方法
JPS61177370A (ja) 減圧反応装置
JPS6311598A (ja) 有機金属気相成長用シリンダ−
JPH08172083A (ja) 副生成物トラップ装置及びその洗浄方法
JP2686447B2 (ja) 反応装置
JPS6235807B2 (enExample)
WO2003005427A1 (fr) Systeme de traitement et procede de nettoyage
JP4763339B2 (ja) 配管のクリーニング方法
JP2787979B2 (ja) 超高純度ガスの供給方法
JP2912306B2 (ja) 処理装置の洗浄方法
JPH08209350A (ja) 薄膜形成装置及び薄膜形成装置のクリーニング方法
JPS6322173B2 (enExample)
JPH01189114A (ja) 気相成長装置
JPH06208991A (ja) 半導体基板の処理方法及び装置
JPH0715131Y2 (ja) 有機金属気相成長装置
JP3079077B2 (ja) 有機金属気相成長装置
JPH06295870A (ja) 化学的気相成長装置
US6544488B1 (en) Method for decomposing a cleaning gas for cleaning a film deposition chamber
JP2000300956A (ja) 半導体製造装置用除害装置

Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term