JPS6117497A - 炭化硅素単結晶膜の製造方法 - Google Patents
炭化硅素単結晶膜の製造方法Info
- Publication number
- JPS6117497A JPS6117497A JP59138569A JP13856984A JPS6117497A JP S6117497 A JPS6117497 A JP S6117497A JP 59138569 A JP59138569 A JP 59138569A JP 13856984 A JP13856984 A JP 13856984A JP S6117497 A JPS6117497 A JP S6117497A
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- crystal film
- silicon carbide
- film
- aluminum nitride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B23/00—Single-crystal growth by condensing evaporated or sublimed materials
- C30B23/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B25/00—Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour-deposition growth
- C30B25/02—Epitaxial-layer growth
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/10—Inorganic compounds or compositions
- C30B29/36—Carbides
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Inorganic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59138569A JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59138569A JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6117497A true JPS6117497A (ja) | 1986-01-25 |
| JPH0143720B2 JPH0143720B2 (enExample) | 1989-09-22 |
Family
ID=15225197
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59138569A Granted JPS6117497A (ja) | 1984-07-04 | 1984-07-04 | 炭化硅素単結晶膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6117497A (enExample) |
-
1984
- 1984-07-04 JP JP59138569A patent/JPS6117497A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0143720B2 (enExample) | 1989-09-22 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN109545657B (zh) | 一种改善碳化硅衬底上生长的氧化镓薄膜的方法 | |
| JPS58130517A (ja) | 単結晶薄膜の製造方法 | |
| CN110729385A (zh) | 一种含氧复合缓冲层结构及提高氮化镓系外延层晶体质量的方法 | |
| CN1458129A (zh) | 在氧化铝陶瓷上进行金刚石薄膜定向生长的方法 | |
| JPH0556851B2 (enExample) | ||
| US12610656B2 (en) | AIN layer, its fabrication process and epitaxial wafer | |
| JPS5840820A (ja) | シリコン単結晶膜形成法 | |
| JPH0952793A (ja) | 成膜方法 | |
| JPH0143720B2 (enExample) | ||
| JPH082999A (ja) | 窒化アルミニウム薄膜製造法 | |
| JPS6126501B2 (enExample) | ||
| JP3157280B2 (ja) | 半導体装置の製造方法 | |
| CN111048404B (zh) | 一种缓冲层结构及其制备方法 | |
| CN105803523B (zh) | 一种半导体材料的外延方法 | |
| JPH0637355B2 (ja) | 炭化珪素単結晶膜の製造方法 | |
| JPS62119939A (ja) | 半導体用絶縁基板 | |
| JPH0427116A (ja) | 半導体異種接合を形成する方法 | |
| JP3183939B2 (ja) | 酸化亜鉛単結晶薄膜の製造方法 | |
| JPS5893228A (ja) | 半導体単結晶薄膜の製造方法 | |
| JPS59177919A (ja) | 薄膜の選択成長法 | |
| CN119615091A (zh) | 一种异质外延生长钇稳定氧化锆薄膜的方法 | |
| JPH03195016A (ja) | Si基板の熱清浄化法及びエピタキシャル成長及び熱処理装置 | |
| JP2001244199A (ja) | ベータ鉄シリサイドの成膜方法 | |
| JPH02191319A (ja) | Soi構造の形成方法 | |
| CN119694887A (zh) | 一种氧化镓薄膜材料结构及其外延生长方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |