JPS61164030U - - Google Patents

Info

Publication number
JPS61164030U
JPS61164030U JP4757885U JP4757885U JPS61164030U JP S61164030 U JPS61164030 U JP S61164030U JP 4757885 U JP4757885 U JP 4757885U JP 4757885 U JP4757885 U JP 4757885U JP S61164030 U JPS61164030 U JP S61164030U
Authority
JP
Japan
Prior art keywords
semiconductor substrate
ozone
ozone pipe
cleaning device
pipe
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4757885U
Other languages
English (en)
Other versions
JPH0621236Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985047578U priority Critical patent/JPH0621236Y2/ja
Publication of JPS61164030U publication Critical patent/JPS61164030U/ja
Application granted granted Critical
Publication of JPH0621236Y2 publication Critical patent/JPH0621236Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Cleaning By Liquid Or Steam (AREA)

Description

【図面の簡単な説明】
図は本考案による一実施例を示す模型図である
。 １：処理槽、２：処理液、４：半導体基板、９
：オゾン用配管、１４：低圧水銀ランプ、１６：
第２の配管。

Claims (1)

  1. 【実用新案登録請求の範囲】 半導体基板に付着した汚染物を除去する洗浄装
    置において、 洗浄処理液を収容して半導体基板を浸漬させる
    処理槽と、 上記処理槽内に導かれて、処理液中にオゾンを
    バブリングさせるオゾン配管と、 上記オゾン配管に近接させて配置され、発生期
    の酸素の発生を促進させる紫外線照射ランプとを
    備えてなることを特徴とする半導体基板の洗浄装
    置。
JP1985047578U 1985-03-28 1985-03-28 半導体基板の洗浄装置 Expired - Lifetime JPH0621236Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985047578U JPH0621236Y2 (ja) 1985-03-28 1985-03-28 半導体基板の洗浄装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985047578U JPH0621236Y2 (ja) 1985-03-28 1985-03-28 半導体基板の洗浄装置

Publications (2)

Publication Number Publication Date
JPS61164030U true JPS61164030U (ja) 1986-10-11
JPH0621236Y2 JPH0621236Y2 (ja) 1994-06-01

Family

ID=30563034

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985047578U Expired - Lifetime JPH0621236Y2 (ja) 1985-03-28 1985-03-28 半導体基板の洗浄装置

Country Status (1)

Country Link
JP (1) JPH0621236Y2 (ja)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01132126A (ja) * 1987-08-28 1989-05-24 Arrowhead Ind Water Inc 集積回路製作方法
JPH04179225A (ja) * 1990-11-14 1992-06-25 Ebara Res Co Ltd 洗浄方法
JP2000286220A (ja) * 1999-01-29 2000-10-13 Dainippon Screen Mfg Co Ltd 基板処理装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212063A (en) * 1975-07-15 1977-01-29 Matsushita Electric Works Ltd Hair curling apparatus
JPS6039240U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5212063A (en) * 1975-07-15 1977-01-29 Matsushita Electric Works Ltd Hair curling apparatus
JPS6039240U (ja) * 1983-08-24 1985-03-19 ウシオ電機株式会社 紫外線洗浄装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01132126A (ja) * 1987-08-28 1989-05-24 Arrowhead Ind Water Inc 集積回路製作方法
JPH04179225A (ja) * 1990-11-14 1992-06-25 Ebara Res Co Ltd 洗浄方法
JP2000286220A (ja) * 1999-01-29 2000-10-13 Dainippon Screen Mfg Co Ltd 基板処理装置

Also Published As

Publication number Publication date
JPH0621236Y2 (ja) 1994-06-01

Similar Documents

Publication Publication Date Title
DE3277567D1 (en) Method for disinfecting and cleaning contact lenses
MY135992A (en) Method of cleaning porous body, and process for producing porous body, non-porous film or bonded substrate
JPS61164030U (ja)
JPS6061040U (ja) 脱臭装置
JPS5882831U (ja) 排オゾン処理装置
JPS5528756A (en) Removing method of corrosive gas
JPS6010672Y2 (ja) ガス処理塔
JP4203776B2 (ja) 電子材料用洗浄液
JPS6343428U (ja)
JPS57167723A (en) Ozone deodorizing device
JPS6111990U (ja) 水の浄化殺菌装置
JPH0326302U (ja)
JPH0253967U (ja)
JPH0242641U (ja)
JPH01104024U (ja)
JPH01156541U (ja)
JPH10223588A (ja) 有機質汚れの高度洗浄方法
JPS5984839U (ja) 半導体製造装置
JPS6456897U (ja)
JPS6343698U (ja)
JPS61115129U (ja)
JPS6256193U (ja)
JPS6456690U (ja)
JPH05198548A (ja) 半導体基板の洗浄方法およびその装置
JPH0487639U (ja)