JPS6115596B2 - - Google Patents

Info

Publication number
JPS6115596B2
JPS6115596B2 JP14908679A JP14908679A JPS6115596B2 JP S6115596 B2 JPS6115596 B2 JP S6115596B2 JP 14908679 A JP14908679 A JP 14908679A JP 14908679 A JP14908679 A JP 14908679A JP S6115596 B2 JPS6115596 B2 JP S6115596B2
Authority
JP
Japan
Prior art keywords
gate
gate electrode
epitaxial layer
electrode
etching
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14908679A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5671980A (en
Inventor
Masao Sumyoshi
Takuji Shimanoe
Aiichiro Nara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14908679A priority Critical patent/JPS5671980A/ja
Publication of JPS5671980A publication Critical patent/JPS5671980A/ja
Publication of JPS6115596B2 publication Critical patent/JPS6115596B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/68Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H01L29/76Unipolar devices, e.g. field effect transistors
    • H01L29/772Field effect transistors
    • H01L29/80Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier
    • H01L29/812Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate
    • H01L29/8128Field effect transistors with field effect produced by a PN or other rectifying junction gate, i.e. potential-jump barrier with a Schottky gate with recessed gate

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Junction Field-Effect Transistors (AREA)
JP14908679A 1979-11-15 1979-11-15 Schottky barrier gate type field effect transistor and preparation method thereof Granted JPS5671980A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14908679A JPS5671980A (en) 1979-11-15 1979-11-15 Schottky barrier gate type field effect transistor and preparation method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14908679A JPS5671980A (en) 1979-11-15 1979-11-15 Schottky barrier gate type field effect transistor and preparation method thereof

Publications (2)

Publication Number Publication Date
JPS5671980A JPS5671980A (en) 1981-06-15
JPS6115596B2 true JPS6115596B2 (ko) 1986-04-24

Family

ID=15467387

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14908679A Granted JPS5671980A (en) 1979-11-15 1979-11-15 Schottky barrier gate type field effect transistor and preparation method thereof

Country Status (1)

Country Link
JP (1) JPS5671980A (ko)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63143609A (ja) * 1986-12-08 1988-06-15 Nikon Corp 移動体の位置決め装置

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2752663B2 (ja) * 1988-11-01 1998-05-18 三菱電機株式会社 電界効果トランジスタの製造方法
FR2685819A1 (fr) * 1991-12-31 1993-07-02 Thomson Composants Microondes Procede de realisation d'un transistor a effet de champ hyperfrequence.
KR950034830A (ko) * 1994-04-29 1995-12-28 빈센트 비. 인그라시아 전계 효과 트랜지스터 및 이 트랜지스터의 제조 방법

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63143609A (ja) * 1986-12-08 1988-06-15 Nikon Corp 移動体の位置決め装置

Also Published As

Publication number Publication date
JPS5671980A (en) 1981-06-15

Similar Documents

Publication Publication Date Title
US5362677A (en) Method for producing a field effect transistor with a gate recess structure
JPH03292744A (ja) 化合物半導体装置およびその製造方法
JP3233207B2 (ja) 電界効果トランジスタの製造方法
EP0668610A2 (en) Method of manufacturing a schottky gate field effect transistor
JPH10199896A (ja) 半導体装置の製造方法および半導体装置
JPS6115596B2 (ko)
JPS6253953B2 (ko)
CN109727918B (zh) 集成增强型与耗尽型场效应管的结构及其制造方法
US6051506A (en) Method of fabrication ultra-frequency semiconductor device
JP2723901B2 (ja) 半導体装置及びその応用回路
US9583589B1 (en) Self-aligned double gate recess for semiconductor field effect transistors
KR100342443B1 (ko) 전계효과 트랜지스터의 서브미크론 티이형 게이트형성방법
KR100349368B1 (ko) 초고주파 반도체 소자 및 그의 제조방법
JP2000021900A (ja) 電界効果トランジスタの製造方法
JPS6323667B2 (ko)
JP2001308110A (ja) 半導体装置
KR100554967B1 (ko) 음성미분저항 억제용 부정합 고전자이동도 트랜지스터 및제조 방법
JPS62260370A (ja) 電界効果トランジスタの製造方法
JP2507030B2 (ja) 電界効果トランジスタ
JPH0855861A (ja) 電界効果トランジスタ、及びその製造方法
KR920009896B1 (ko) 갈륨비소 전계효과 트랜지스터 및 그 제조방법
JPS62274675A (ja) 電界効果トランジスタの製造方法
JPH0521473A (ja) 電界効果トランジスタの製造方法
JPH06232168A (ja) 電界効果トランジスタおよびその製造方法
JPS5850434B2 (ja) 電界効果トランジスタの製造方法