JPS61154082A - 霧により薄膜を作製する方法 - Google Patents

霧により薄膜を作製する方法

Info

Publication number
JPS61154082A
JPS61154082A JP59280620A JP28062084A JPS61154082A JP S61154082 A JPS61154082 A JP S61154082A JP 59280620 A JP59280620 A JP 59280620A JP 28062084 A JP28062084 A JP 28062084A JP S61154082 A JPS61154082 A JP S61154082A
Authority
JP
Japan
Prior art keywords
substrate
guide rails
heater
film
sides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59280620A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0436585B2 (enrdf_load_stackoverflow
Inventor
Yutaka Hayashi
豊 林
Atsuo Ito
厚雄 伊藤
Hideyo Iida
英世 飯田
Yukiko Fujimaki
藤巻 ゆき子
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Taiyo Yuden Co Ltd
Original Assignee
Agency of Industrial Science and Technology
Taiyo Yuden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Taiyo Yuden Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP59280620A priority Critical patent/JPS61154082A/ja
Publication of JPS61154082A publication Critical patent/JPS61154082A/ja
Publication of JPH0436585B2 publication Critical patent/JPH0436585B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10FINORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00Manufacture or treatment of devices covered by this subclass

Landscapes

  • Surface Treatment Of Glass (AREA)
  • Photovoltaic Devices (AREA)
  • Non-Insulated Conductors (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Chemically Coating (AREA)
  • Chemical Vapour Deposition (AREA)
  • Liquid Deposition Of Substances Of Which Semiconductor Devices Are Composed (AREA)
JP59280620A 1984-12-26 1984-12-26 霧により薄膜を作製する方法 Granted JPS61154082A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59280620A JPS61154082A (ja) 1984-12-26 1984-12-26 霧により薄膜を作製する方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59280620A JPS61154082A (ja) 1984-12-26 1984-12-26 霧により薄膜を作製する方法

Publications (2)

Publication Number Publication Date
JPS61154082A true JPS61154082A (ja) 1986-07-12
JPH0436585B2 JPH0436585B2 (enrdf_load_stackoverflow) 1992-06-16

Family

ID=17627584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59280620A Granted JPS61154082A (ja) 1984-12-26 1984-12-26 霧により薄膜を作製する方法

Country Status (1)

Country Link
JP (1) JPS61154082A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003061106A (ja) * 2001-08-09 2003-02-28 Jai Corporation:Kk Rgbフィルタを有するエリアセンサ付き光学像読取装置
JP2007077435A (ja) * 2005-09-13 2007-03-29 Fujikura Ltd 成膜装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003061106A (ja) * 2001-08-09 2003-02-28 Jai Corporation:Kk Rgbフィルタを有するエリアセンサ付き光学像読取装置
JP2007077435A (ja) * 2005-09-13 2007-03-29 Fujikura Ltd 成膜装置
US7913643B2 (en) 2005-09-13 2011-03-29 Fujikura Ltd. Film forming apparatus and film forming method

Also Published As

Publication number Publication date
JPH0436585B2 (enrdf_load_stackoverflow) 1992-06-16

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term