JPS61121453A - Braking and expanding process of fragile thin sheet - Google Patents
Braking and expanding process of fragile thin sheetInfo
- Publication number
- JPS61121453A JPS61121453A JP59243660A JP24366084A JPS61121453A JP S61121453 A JPS61121453 A JP S61121453A JP 59243660 A JP59243660 A JP 59243660A JP 24366084 A JP24366084 A JP 24366084A JP S61121453 A JPS61121453 A JP S61121453A
- Authority
- JP
- Japan
- Prior art keywords
- sheet
- wafer
- expanding
- braking
- backside
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
Abstract
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、半導体素子または表面弾性波フィルター等の
製造方法において、スクライブ加工またはダイシング加
工をされたぜい性薄板(以下ウェハという)のブレイキ
ング・エキスパンド方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to breaking and expanding a brittle thin plate (hereinafter referred to as a wafer) that has been subjected to scribing or dicing processing in a method of manufacturing semiconductor devices or surface acoustic wave filters. It is about the method.
従来の技術
従来、この種の加工fP:ハ、ブレイクとエキスパンド
が別作業として行われている。BACKGROUND OF THE INVENTION Conventionally, this type of machining fP: C, break and expand have been performed as separate operations.
すなわち、第3図(ム)に示すように、ウェハ1のスク
ライブまたはダイシング加工された面とは反対側の面を
粘着シート2に貼合わせ、さらに前記加工面を保護用シ
ート3で覆い、ゴム鈑等の弾性体板4上に置く。そして
、粘着シート2側よりローラー5等により力を加え、ブ
レイキングラインへの応力集中によるブレーキングを行
なっていた。That is, as shown in FIG. 3(m), the surface of the wafer 1 opposite to the scribed or diced surface is bonded to the adhesive sheet 2, the processed surface is further covered with the protective sheet 3, and the rubber Place it on an elastic plate 4 such as a board. Then, force is applied from the adhesive sheet 2 side using a roller 5 or the like to perform braking by concentrating stress on the breaking line.
ローラー6を図示方向だけでなくそれと直角な方向に加
圧状態で移動させて、ウェハ1をチップらにブレイキン
グされる。The wafer 1 is broken into chips by moving the roller 6 under pressure not only in the direction shown but also in a direction perpendicular thereto.
次に同図(Blに示すように、ブレイキングずみウェハ
、すなわちチップ6が付着している粘着シート’6シー
ト保持用リング7で保持してから、チップ6の付着面側
とは反対側の面を平板8にて押し上げてシートラ延伸さ
せ、その状態のまま平板8の外周面上で、0リング9等
によりシートと平板8を保持し、エキスパンドしてI/
′する。Next, as shown in FIG. The sheet is pushed up by the flat plate 8 to stretch the sheet, and in this state, the sheet and the flat plate 8 are held on the outer circumferential surface of the flat plate 8 with an O-ring 9, etc., and expanded and I/
'do.
発明が解決しようとする問題点
これらの場合、第1図においては、ウェノ・−上に形成
された薄膜、微細ノぐターンがカバーシートと接触する
Cとによる汚染、および外力を間接的とはいえ受けると
いう問題があり、さらにローラーで加圧する過程でブレ
イキングの際に発生する細かなウェハーのかけらが保護
/−ト3とウェハーのパターン面との間に入り込み、パ
ターンに損傷を与える問題ももっていた。Problems to be Solved by the Invention In these cases, as shown in FIG. Moreover, there is also the problem that fine wafer fragments generated during breaking during the process of applying pressure with rollers can get between the protective plate 3 and the pattern surface of the wafer, damaging the pattern. there was.
また、ブレイクとエキスパンドが別作業として行われて
いることも設備価格、作業性の面から良好なものとは言
えなかった。Furthermore, the fact that breaking and expanding were performed as separate operations was not a good idea in terms of equipment cost and workability.
本発明はこのような従来の方法の欠点を除去するもので
、ウェハー表面の微細パターンへの損傷を防ぐと共に、
二つの作業を一つにまとめ合理化を図ること全目的とす
るものである。The present invention eliminates the drawbacks of such conventional methods, prevents damage to fine patterns on the wafer surface, and
The overall purpose is to combine two tasks into one and streamline them.
問題点を解決するための手段
この目的を達成するため、本発明は、ウェハの貼付けら
れたシートを、そのウェハ貼付面とは反対の面側より流
体で加圧して、シートに貼り付けたウニ・・表面に他の
物体を接触させることなく、ウェハのブレイキングライ
ン部分に集中的に応力をかけてブレーキングを行い、さ
らにエキスパンド全行う。Means for Solving the Problems In order to achieve this object, the present invention applies pressure to a sheet with a wafer pasted thereon using fluid from the side opposite to the wafer pasting side, thereby making the sea urchin pasted on the sheet.・・Braking is performed by applying stress intensively to the breaking line portion of the wafer without bringing other objects into contact with the surface, and then the entire expansion is performed.
作用
この構成によって、ウェハ表面の微細パターンがなんら
損傷を受けることがなくなり、表面を保護被覆されるこ
となく、パターンが形成されている表面弾性波フィルタ
等の工程歩留を著しく向上させることができ、さらに−
遅動作の中で二つの作業が集約される合理化効果が得ら
れる。Effect: With this configuration, the fine pattern on the wafer surface is not damaged in any way, and the process yield of surface acoustic wave filters and the like on which patterns are formed can be significantly improved without the surface being covered with a protective coating. , further −
A streamlining effect can be obtained by consolidating two tasks in a slow operation.
実施例
以下1本発明の一実施例について第1図全周いて説明す
る。なお第1図において、第2図と同一の部品について
は同一番号を付している。第1図(Blは同図(ム)に
て拡張されたノート2を拡張保持リング10に保持した
状態を示す図である、図において、スクライブまたはダ
イシング加工済ウェハを粘着シート2の表面に貼付け、
このシート2をウェハがシート保持用リング7で囲まれ
る部分に位置するよう前記リング7で保持した状態のま
ま、その前記シート2にて閉じられた空間に圧縮空気全
送りこみ、前記シート2の伸張による力とノート2裏面
に圧力が均等にかかることによるブレイキングラインへ
の応力集中によりチップ6にブレイキングされると同時
に球状にシート2が拡張する。Embodiment One embodiment of the present invention will now be described with reference to FIG. 1. In FIG. 1, the same parts as in FIG. 2 are given the same numbers. FIG. 1 (Bl is a diagram showing a state in which the expanded notebook 2 shown in FIG. ,
While holding this sheet 2 by the ring 7 so that the wafer is located in the area surrounded by the sheet holding ring 7, all the compressed air is fed into the space closed by the sheet 2, and the sheet 2 is The sheet 2 expands into a spherical shape at the same time as the chip 6 is broken due to the stress concentration on the breaking line due to the force caused by the stretching and the pressure being evenly applied to the back surface of the notebook 2.
次に拡張保持用リング10が上昇し、シート2のチップ
付着面を平面状にする。その状態で拡張保持リング10
に設けた溝部にQ IJング9を装着し、拡張された状
態でシート2を保持する。Next, the expansion holding ring 10 is raised to make the chip attachment surface of the sheet 2 flat. In that state, the expansion retaining ring 10
A Q IJ ring 9 is attached to the groove provided in the seat 2 to hold the sheet 2 in the expanded state.
このように粘着シート2のウェノ・付着面とは反対の面
側から加圧空気で加圧することにより、ウニ・・表面に
は何も接触させることなく、ブレイキングとエキスパン
ディングを行うことができる、発明の効果
以上のように、本発明の方法によれば、ウニ/・のパタ
ーン面に触れることなくチップ化することができ、ウェ
ノ・表面の微細パターンにはパターン切れ、ダストの付
着等の損傷を与えることなく、容易にブレイキングとエ
キスパンディングの二つの作業が一連化されて行えると
いう効果が得られる。In this way, by applying pressure with pressurized air from the side of the adhesive sheet 2 opposite to the surface to which the sea urchin is attached, breaking and expanding can be performed without any contact with the surface of the sea urchin. Effects of the Invention As described above, according to the method of the present invention, it is possible to make chips without touching the patterned surface of the sea urchin, and the fine pattern on the surface of the sea urchin is free from damage such as pattern breakage and adhesion of dust. This has the effect that the two operations of breaking and expanding can be easily performed in series without giving any problems.
第1図(Alは本発明の方法の一実施例によるウェハの
ブレイキング・エキスパンド方法を示す断面図、同図(
Blは拡張終了段階での保持状態金示す断面図、第2図
(Al 、 (Bl(d従来のウエノ・ブレイキング・
エキスパンド方法を示す断面図である。
2・・・・・・粘着シート、6・・・・・・チップ、7
・・・・・・シート保持リング、9・・・・・・0リン
グ、10・・・・・・拡張保持リング。
代理人の氏名 弁理士 中 尾 敏 男 ほか1名第1
図
(A)
(B)
第2図
(ハノ
(B〕FIG. 1 (Al is a sectional view showing a wafer breaking/expanding method according to an embodiment of the method of the present invention; FIG.
Bl is a cross-sectional view showing the holding state at the end of expansion stage.
FIG. 3 is a cross-sectional view showing an expanding method. 2... Adhesive sheet, 6... Chip, 7
... Seat retaining ring, 9...0 ring, 10... Expansion retaining ring. Name of agent: Patent attorney Toshio Nakao and 1 other person No. 1
Figure (A) (B) Figure 2 (Hano (B)
Claims (1)
加工面側を粘着シートの一方の面側に貼り付け、前記粘
着シートの他方の面側に流体による圧力を加えて、前記
ぜい性薄板のブレーキングライン部分に応力を集中させ
てブレイキングを行うと同時にエキスパンドすることを
特徴とするぜい性薄板のブレイキング・エキスパンド方
法。The processed side of a scribed or diced brittle thin plate is pasted on one side of an adhesive sheet, and fluid pressure is applied to the other side of the adhesive sheet to brake the brittle thin plate. A method for breaking and expanding a brittle thin plate, which is characterized by concentrating stress on the lining portion to perform breaking and expanding at the same time.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59243660A JPS61121453A (en) | 1984-11-19 | 1984-11-19 | Braking and expanding process of fragile thin sheet |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59243660A JPS61121453A (en) | 1984-11-19 | 1984-11-19 | Braking and expanding process of fragile thin sheet |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS61121453A true JPS61121453A (en) | 1986-06-09 |
Family
ID=17107107
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59243660A Pending JPS61121453A (en) | 1984-11-19 | 1984-11-19 | Braking and expanding process of fragile thin sheet |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS61121453A (en) |
Cited By (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0529440A (en) * | 1991-07-22 | 1993-02-05 | Rohm Co Ltd | Stretching apparatus for tape |
US7396742B2 (en) | 2000-09-13 | 2008-07-08 | Hamamatsu Photonics K.K. | Laser processing method for cutting a wafer-like object by using a laser to form modified regions within the object |
JP2010177340A (en) * | 2009-01-28 | 2010-08-12 | Panasonic Electric Works Co Ltd | Dicing method and expanding apparatus |
US8058103B2 (en) | 2003-09-10 | 2011-11-15 | Hamamatsu Photonics K.K. | Semiconductor substrate cutting method |
JP2012114268A (en) * | 2010-11-25 | 2012-06-14 | Fuji Electric Co Ltd | Expand device for semiconductor substrate |
US8865566B2 (en) | 2002-12-03 | 2014-10-21 | Hamamatsu Photonics K.K. | Method of cutting semiconductor substrate |
US8889525B2 (en) | 2002-03-12 | 2014-11-18 | Hamamatsu Photonics K.K. | Substrate dividing method |
KR20160019849A (en) * | 2014-08-12 | 2016-02-22 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Method and device for dividing brittle material substrate |
JP2016104578A (en) * | 2016-02-29 | 2016-06-09 | 三星ダイヤモンド工業株式会社 | Separator of weak material substrate |
-
1984
- 1984-11-19 JP JP59243660A patent/JPS61121453A/en active Pending
Cited By (28)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0529440A (en) * | 1991-07-22 | 1993-02-05 | Rohm Co Ltd | Stretching apparatus for tape |
US8937264B2 (en) | 2000-09-13 | 2015-01-20 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US7396742B2 (en) | 2000-09-13 | 2008-07-08 | Hamamatsu Photonics K.K. | Laser processing method for cutting a wafer-like object by using a laser to form modified regions within the object |
US7547613B2 (en) | 2000-09-13 | 2009-06-16 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US7592238B2 (en) | 2000-09-13 | 2009-09-22 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US7615721B2 (en) | 2000-09-13 | 2009-11-10 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US7626137B2 (en) | 2000-09-13 | 2009-12-01 | Hamamatsu Photonics K.K. | Laser cutting by forming a modified region within an object and generating fractures |
US10796959B2 (en) | 2000-09-13 | 2020-10-06 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US9837315B2 (en) | 2000-09-13 | 2017-12-05 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US8946591B2 (en) | 2000-09-13 | 2015-02-03 | Hamamatsu Photonics K.K. | Method of manufacturing a semiconductor device formed using a substrate cutting method |
US8946592B2 (en) | 2000-09-13 | 2015-02-03 | Hamamatsu Photonics K.K. | Laser processing method and laser processing apparatus |
US9553023B2 (en) | 2002-03-12 | 2017-01-24 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9548246B2 (en) | 2002-03-12 | 2017-01-17 | Hamamatsu Photonics K.K. | Substrate dividing method |
US11424162B2 (en) | 2002-03-12 | 2022-08-23 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9142458B2 (en) | 2002-03-12 | 2015-09-22 | Hamamatsu Photonics K.K. | Substrate dividing method |
US10622255B2 (en) | 2002-03-12 | 2020-04-14 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9287177B2 (en) | 2002-03-12 | 2016-03-15 | Hamamatsu Photonics K.K. | Substrate dividing method |
US10068801B2 (en) | 2002-03-12 | 2018-09-04 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9543256B2 (en) | 2002-03-12 | 2017-01-10 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9543207B2 (en) | 2002-03-12 | 2017-01-10 | Hamamatsu Photonics K.K. | Substrate dividing method |
US8889525B2 (en) | 2002-03-12 | 2014-11-18 | Hamamatsu Photonics K.K. | Substrate dividing method |
US9711405B2 (en) | 2002-03-12 | 2017-07-18 | Hamamatsu Photonics K.K. | Substrate dividing method |
US8865566B2 (en) | 2002-12-03 | 2014-10-21 | Hamamatsu Photonics K.K. | Method of cutting semiconductor substrate |
US8058103B2 (en) | 2003-09-10 | 2011-11-15 | Hamamatsu Photonics K.K. | Semiconductor substrate cutting method |
JP2010177340A (en) * | 2009-01-28 | 2010-08-12 | Panasonic Electric Works Co Ltd | Dicing method and expanding apparatus |
JP2012114268A (en) * | 2010-11-25 | 2012-06-14 | Fuji Electric Co Ltd | Expand device for semiconductor substrate |
KR20160019849A (en) * | 2014-08-12 | 2016-02-22 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Method and device for dividing brittle material substrate |
JP2016104578A (en) * | 2016-02-29 | 2016-06-09 | 三星ダイヤモンド工業株式会社 | Separator of weak material substrate |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2856216B2 (en) | Method of bonding adhesive tape to semiconductor wafer | |
JPH0384919A (en) | Method and apparatus for bonding semiconductor substrates | |
JP2004146727A (en) | Transferring method of wafer | |
JPS61121453A (en) | Braking and expanding process of fragile thin sheet | |
WO2004038779A1 (en) | Expansion method and device | |
JPS61145839A (en) | Semiconductor wafer bonding method and bonding jig | |
JPH0590393A (en) | Adhering device for semiconductor wafer | |
JPH04223356A (en) | Manufacture of semiconductor device | |
JPS59130438A (en) | Method for separating plates | |
JPH03270156A (en) | Manufacture of semiconductor device | |
JP7067904B2 (en) | Manufacturing method of semiconductor device | |
US20040152285A1 (en) | Method for producing chips from wafers of low thickness | |
JPS62284707A (en) | Wafer breaking device | |
JP2008016751A (en) | Method for sticking semiconductor chip to protection tape | |
JPH0855824A (en) | Method for sticking tape on semiconductor wafer | |
JPS58142543A (en) | Dicing method for semiconductor substrate | |
JPS61222146A (en) | Sheet for supporting semiconductor wafer | |
JPS6010639A (en) | Wafer attaching and detaching device | |
JPH11297650A (en) | Manufacturing for semiconductor wafer | |
JPS63284551A (en) | Method for mounting photomask pellicle | |
JPS644339B2 (en) | ||
JP4026090B2 (en) | Bonding jig | |
JPH11297648A (en) | Apparatus and manufacture for semiconductor wafer | |
JPH1187203A (en) | Method for bonding substrates | |
JPH06224299A (en) | Dividing method for semiconductor wafer and dividing system |