JPS63284551A - Method for mounting photomask pellicle - Google Patents

Abstract

PURPOSE:To obtain a uniform mounting part which has no clearances, air bubbles, etc., with a small pressing force by executing pressurization dividedly plural times in the case of mounting a photomask pellicle frame to a photomask substrate via an adhesive agent under the pressing force exerted thereto. CONSTITUTION:The photomask substrate 4 is previously positioned and fixed and the pressing force of the prescribed magnitude is exerted to the pellicle frame 1 to hold the frame for a prescribed period of time and to adhere the same tentatively by the adhesive agent 3. The adhesive agent is thereby uniformly spread on the adhering surface. The pressing force is then once released and the pressing force for the purpose of remounting is exerted to the frame to hold the frame for the specified period of time, by which the mounting stage is completed. The clearances, air bubbles, etc., of the adhesive agent are eliminated and the uniform mounting part is obtd. by the second time of the pressing.

Description

DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for mounting a photomask pellicle on a photomask substrate used in semiconductor manufacturing equipment and the like.

[Conventional technology]

Figure 2 (A) shows the conventional photomask pellicle mounting method.
, shown in (B). Hereinafter, the photomask pellicle will be abbreviated as r pellicle j. Note that FIG. 2(A) is a side cross-sectional view showing a state in which a pellicle is attached to a photomask substrate, and FIG.
B) is a side view showing how to apply force in the operation of attaching a pellicle to a photomask substrate. In both figures,
1 is a vertical frame, 2 is a pellicle film, 3 is an adhesive, 4 is a photomask substrate, 5 is a photomask pattern, and 6 is a heodomask positioning fixture.

Next, the operation will be explained. First, the staking photomask substrate 4 is positioned and fixed, a predetermined pressing force is applied to the pellicle frame 1, and the force is maintained for a predetermined time to attach the pellicle frame 1 to the photomask substrate 4 with the adhesive 3.

[Problem that the invention seeks to solve]

The conventional pellicle attachment method is structured as described above. When attaching the pellicle frame to the photomask substrate with adhesive, it is necessary to apply force during attachment to ensure that the attachment area is uniform without gaps or bubbles. The pellicle frame and the photomask substrate need to be extremely large, and the excessive pressing force applied during mounting causes distortions in the pellicle frame and the photomask substrate, resulting in problems such as the inability to obtain a uniform mounting portion.

This invention was made in order to solve the above-mentioned problems, and provides a pellicle attachment method that can obtain a pellicle attachment part in which the adhesive spreads uniformly without applying excessive pressing force for attachment. It is something to do.

[Means for solving problems]

The pellicle attachment method according to the present invention includes a temporary attachment step of pressing and holding the pellicle frame with a predetermined pressing force for a predetermined time when attaching the pellicle frame to a photomask substrate via an adhesive;
After the above-mentioned process is completed, the mounting process consists of once releasing the above-mentioned pressing force, applying the pressing force again, and holding the pressing force for a certain period of time.

[Effect]

The pellicle mounting method of the present invention involves applying a pressing force multiple times during the temporary mounting process and the mounting process when mounting the pellicle frame on the photomask substrate, so that the spreading action of the adhesive is applied the number of times the pressing force is applied for mounting. As the layers are stacked, the mounting portion is gradually strengthened and the mounting portion is in a uniform state without gaps, bubbles, etc.

[Embodiments of the invention]

FIGS. 1A, 1B, and 1C are diagrams of a pellicle mounting method according to an embodiment of the present invention, and its configuration is similar to the conventional pellicle mounting method shown in FIG. It is.

Next, a pellicle mounting method according to the present invention configured as described above will be explained. First, the photomask substrate 4 is positioned and fixed in advance, a predetermined pressing force is applied to the pellicle frame 1, and the pressing force is maintained for a predetermined period of time to attach the pellicle frame 1 to the photomask substrate 4 with the adhesive 3.

At this time, the adhesive 3 spreads over the entire surface of the mounting portion of the pellicle frame 1 and the photomask substrate 4 due to the pressing force applied during mounting, thereby completing the temporary mounting process. Next, the pressing force for mounting is once released, and the pressing force for mounting is applied again and held for a certain period of time to complete the mounting process. At this time, the pressing force applied the second time spreads the adhesive over the entire surface of the bonded part, and the pressing force applied the second time spreads the adhesive uniformly without gaps or bubbles.

〔Effect of the invention〕

As described above, according to the present invention, since the pressing force applied when attaching the pellicle frame to the photomask substrate is applied repeatedly multiple times, the gap can be reduced with a relatively small pressing force.
It is easy to obtain a uniform attachment part free of air bubbles, etc., and it is possible to prevent foreign matter from entering from outside the pellicle.

[Brief explanation of the drawing]

FIGS. 1(Δ)+(B) and (C) are diagrams showing a pellicle mounting method according to an embodiment of the present invention, and FIG. 1(8) is a side cross-sectional view showing a state in which a pellicle is mounted on a photomask substrate. , (B) is a side view showing the first addition of the pellicle to the photomask substrate, and (C) is a side view showing the second addition. Figure 2 (A
), (B) are diagrams showing a conventional pellicle attachment method, (A) is a side sectional view showing a state in which a pellicle is attached to a photomask substrate, and (B) is a diagram showing a state in which a pellicle is attached to a photomask substrate. FIG. 3 is a side view showing how to apply force. DESCRIPTION OF SYMBOLS 1... Pellicle frame, 2... Pellicle film, 3... Adhesive, 4... Photomask substrate, 5... Photomask pattern, 6... Photomask positioning fixture. In the drawings, the same reference numerals indicate the same or corresponding parts.

Claims (1)

[Claims] In the photomask pellicle mounting method of mounting a photomask pellicle including a transparent pellicle film and a pellicle frame mounted on the photomask substrate on the photomask substrate, the photomask substrate is positioned and fixed, and the photomask substrate is bonded to the substrate. It consists of a temporary attachment step in which the pellicle frame is pressed and held for a predetermined period of time with a predetermined pressure force through an agent, and an attachment step in which the pressure force is once released after the completion of the step, and then the pressing force is applied again and held for a certain period of time. How to attach a photomask pellicle.