JPS61114449A - 電子銃 - Google Patents

電子銃

Info

Publication number
JPS61114449A
JPS61114449A JP59235831A JP23583184A JPS61114449A JP S61114449 A JPS61114449 A JP S61114449A JP 59235831 A JP59235831 A JP 59235831A JP 23583184 A JP23583184 A JP 23583184A JP S61114449 A JPS61114449 A JP S61114449A
Authority
JP
Japan
Prior art keywords
electron
electron beam
annealing
target
wehnelt
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59235831A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0212376B2 (enrdf_load_stackoverflow
Inventor
Teruo Someya
染谷　輝夫
Shigeo Konno
今野　茂生
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Jeol Ltd
Original Assignee
Jeol Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Jeol Ltd filed Critical Jeol Ltd
Priority to JP59235831A priority Critical patent/JPS61114449A/ja
Publication of JPS61114449A publication Critical patent/JPS61114449A/ja
Publication of JPH0212376B2 publication Critical patent/JPH0212376B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/06—Electron sources; Electron guns
    • H01J37/065—Construction of guns or parts thereof

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Recrystallisation Techniques (AREA)
  • Electron Sources, Ion Sources (AREA)
JP59235831A 1984-11-08 1984-11-08 電子銃 Granted JPS61114449A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59235831A JPS61114449A (ja) 1984-11-08 1984-11-08 電子銃

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59235831A JPS61114449A (ja) 1984-11-08 1984-11-08 電子銃

Publications (2)

Publication Number Publication Date
JPS61114449A true JPS61114449A (ja) 1986-06-02
JPH0212376B2 JPH0212376B2 (enrdf_load_stackoverflow) 1990-03-20

Family

ID=16991903

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59235831A Granted JPS61114449A (ja) 1984-11-08 1984-11-08 電子銃

Country Status (1)

Country Link
JP (1) JPS61114449A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422053A (ja) * 1990-05-16 1992-01-27 Hitachi Ltd リニアフィラメント型電子銃
US8304743B2 (en) 2008-05-20 2012-11-06 Samsung Electronics Co., Ltd. Electron beam focusing electrode and electron gun using the same

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0422053A (ja) * 1990-05-16 1992-01-27 Hitachi Ltd リニアフィラメント型電子銃
US8304743B2 (en) 2008-05-20 2012-11-06 Samsung Electronics Co., Ltd. Electron beam focusing electrode and electron gun using the same
US8912505B2 (en) 2008-05-20 2014-12-16 Samsung Electronics Co., Ltd. Electron beam focusing electrode and electron gun using the same

Also Published As

Publication number Publication date
JPH0212376B2 (enrdf_load_stackoverflow) 1990-03-20

Similar Documents

Publication Publication Date Title
JPH0145694B2 (enrdf_load_stackoverflow)
US3751701A (en) Convergent flow hollow beam x-ray gun with high average power
US6252344B1 (en) Electron gun used in an electron beam exposure apparatus
JPH0828190B2 (ja) イオンビ−ム装置
JPS61114449A (ja) 電子銃
JPS6318297B2 (enrdf_load_stackoverflow)
JPH0238365Y2 (enrdf_load_stackoverflow)
JP2850411B2 (ja) 線状電子ビーム用遮蔽マスク
JPH0727864B2 (ja) 電子ビーム加熱装置
JPH0610964B2 (ja) 線状電子線発生装置
JPH0610965B2 (ja) 線状電子線発生装置
JPH03257746A (ja) 線源線状電子ビーム装置用線状カソード
JP2790218B2 (ja) 電界放出型電子放出素子
JP2001196020A (ja) Ｒｈｅｅｄ装置およびその駆動方法
JPH0666256B2 (ja) 線状電子ビ−ムアニ−ル装置
JPS61245453A (ja) 線状電子ビ−ム熱処理装置
JPH07169422A (ja) Ｘ線管
JP2625369B2 (ja) 電子ビーム露光装置
JPS6264036A (ja) 電子ビ−ム装置
JPH06302535A (ja) 電子ビームによるアニール方法
JPS5891643A (ja) 電子ビ−ムアニ−ル方法
JPH0574900B2 (enrdf_load_stackoverflow)
JPH0542099B2 (enrdf_load_stackoverflow)
JPS61227354A (ja) 線状電子ビ−ム発生装置
JPS6081747A (ja) 電子ビ−ム発生装置