JPS61113209A - サ−ミスタ用酸化物半導体の製造方法 - Google Patents

Info

Publication number

JPS61113209A

JPS61113209A JP23571484A JP23571484A JPS61113209A JP S61113209 A JPS61113209 A JP S61113209A JP 23571484 A JP23571484 A JP 23571484A JP 23571484 A JP23571484 A JP 23571484A JP S61113209 A JPS61113209 A JP S61113209A

Authority

JP

Japan

Prior art keywords

thermistor

oxide semiconductor

oxide

manufacture

sensor

Prior art date

1984-11-08

Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)

Granted

Links

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• 238000004519 manufacturing process Methods 0.000 title claims description 8
• 239000004065 semiconductor Substances 0.000 title claims description 7
• MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 claims description 12
• 238000000034 method Methods 0.000 claims description 5
• 229910003440 dysprosium oxide Inorganic materials 0.000 claims description 3
• NLQFUUYNQFMIJW-UHFFFAOYSA-N dysprosium(iii) oxide Chemical compound O=[Dy]O[Dy]=O NLQFUUYNQFMIJW-UHFFFAOYSA-N 0.000 claims description 3
• 229910052759 nickel Inorganic materials 0.000 claims description 3
• 229910052692 Dysprosium Inorganic materials 0.000 claims description 2
• 229910052804 chromium Inorganic materials 0.000 claims description 2
• 229910052751 metal Inorganic materials 0.000 claims description 2
• 239000007858 starting material Substances 0.000 claims description 2
• 229910052726 zirconium Inorganic materials 0.000 claims description 2
• PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims 2
• VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
• QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 1
• 239000011651 chromium Substances 0.000 claims 1
• KBQHZAAAGSGFKK-UHFFFAOYSA-N dysprosium atom Chemical compound [Dy] KBQHZAAAGSGFKK-UHFFFAOYSA-N 0.000 claims 1
• WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 claims 1
• 229910052596 spinel Inorganic materials 0.000 description 6
• 239000011029 spinel Substances 0.000 description 6
• 239000013078 crystal Substances 0.000 description 5
• 239000000463 material Substances 0.000 description 4
• XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
• 229910019580 Cr Zr Inorganic materials 0.000 description 2
• 229910019817 Cr—Zr Inorganic materials 0.000 description 2
• BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
• 239000002994 raw material Substances 0.000 description 2
• 239000002002 slurry Substances 0.000 description 2
• 239000006104 solid solution Substances 0.000 description 2
• 229910018487 Ni—Cr Inorganic materials 0.000 description 1
• 239000004372 Polyvinyl alcohol Substances 0.000 description 1
• VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
• 238000002441 X-ray diffraction Methods 0.000 description 1
• 238000004125 X-ray microanalysis Methods 0.000 description 1
• 229910052786 argon Inorganic materials 0.000 description 1
• 239000011324 bead Substances 0.000 description 1
• 239000011230 binding agent Substances 0.000 description 1
• 230000000052 comparative effect Effects 0.000 description 1
• 239000000470 constituent Substances 0.000 description 1
• 238000001035 drying Methods 0.000 description 1
• 230000000694 effects Effects 0.000 description 1
• 239000007772 electrode material Substances 0.000 description 1
• 238000000921 elemental analysis Methods 0.000 description 1
• 238000011156 evaluation Methods 0.000 description 1
• 238000010304 firing Methods 0.000 description 1
• 239000007789 gas Substances 0.000 description 1
• 239000011521 glass Substances 0.000 description 1
• 229910052748 manganese Inorganic materials 0.000 description 1
• 239000000203 mixture Substances 0.000 description 1
• 229910052697 platinum Inorganic materials 0.000 description 1
• 229920002451 polyvinyl alcohol Polymers 0.000 description 1
• 238000010298 pulverizing process Methods 0.000 description 1
• 238000007650 screen-printing Methods 0.000 description 1
• 229910002076 stabilized zirconia Inorganic materials 0.000 description 1
• 230000000087 stabilizing effect Effects 0.000 description 1