JPS6090205A - 単分散ビニルシリル基含有有機高分子化合物の製造方法 - Google Patents

単分散ビニルシリル基含有有機高分子化合物の製造方法

Info

Publication number
JPS6090205A
JPS6090205A JP58198928A JP19892883A JPS6090205A JP S6090205 A JPS6090205 A JP S6090205A JP 58198928 A JP58198928 A JP 58198928A JP 19892883 A JP19892883 A JP 19892883A JP S6090205 A JPS6090205 A JP S6090205A
Authority
JP
Japan
Prior art keywords
group
vinylsilyl
monodisperse
styrene
formula
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58198928A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0320125B2 (cg-RX-API-DMAC7.html
Inventor
Teruo Fujimoto
藤本　輝雄
Minoru Takamizawa
高見沢　稔
Akira Yamamoto
昭 山本
Toshinobu Ishihara
俊信 石原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shin-Etsu Chemical Co Ltd
Original Assignee
Shin-Etsu Chemical Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shin-Etsu Chemical Co Ltd filed Critical Shin-Etsu Chemical Co Ltd
Priority to JP58198928A priority Critical patent/JPS6090205A/ja
Publication of JPS6090205A publication Critical patent/JPS6090205A/ja
Priority to US06/861,739 priority patent/US4758640A/en
Publication of JPH0320125B2 publication Critical patent/JPH0320125B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F30/00—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal
    • C08F30/04—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal
    • C08F30/08—Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and containing phosphorus, selenium, tellurium or a metal containing a metal containing silicon

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
  • Polymerization Catalysts (AREA)
JP58198928A 1983-10-24 1983-10-24 単分散ビニルシリル基含有有機高分子化合物の製造方法 Granted JPS6090205A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58198928A JPS6090205A (ja) 1983-10-24 1983-10-24 単分散ビニルシリル基含有有機高分子化合物の製造方法
US06/861,739 US4758640A (en) 1983-10-24 1986-05-07 Vinylsilyl group-containing monodisperse polymeric compound and a method for the preparation thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58198928A JPS6090205A (ja) 1983-10-24 1983-10-24 単分散ビニルシリル基含有有機高分子化合物の製造方法

Publications (2)

Publication Number Publication Date
JPS6090205A true JPS6090205A (ja) 1985-05-21
JPH0320125B2 JPH0320125B2 (cg-RX-API-DMAC7.html) 1991-03-18

Family

ID=16399293

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58198928A Granted JPS6090205A (ja) 1983-10-24 1983-10-24 単分散ビニルシリル基含有有機高分子化合物の製造方法

Country Status (2)

Country Link
US (1) US4758640A (cg-RX-API-DMAC7.html)
JP (1) JPS6090205A (cg-RX-API-DMAC7.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636454A (en) * 1984-07-18 1987-01-13 Shin-Etsu Chemical Co., Ltd. Method for the preparation of a patterned photoresist layer and a photoresist composition therefor
US4730031A (en) * 1985-01-23 1988-03-08 Nissan Chemical Industries Ltd. Polymers of substituted 1,3-butadiene compounds having reactive silyl groups and process for their preparation
JP2000154223A (ja) * 1998-06-25 2000-06-06 Hydro Quebec 架橋性ポリマ―
KR20250003924A (ko) 2022-04-28 2025-01-07 에이지씨 가부시키가이샤 경화성 중합체, 경화성 조성물, 프리프레그, 적층체, 금속 피복 적층판 및 배선 기판

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4822864A (en) * 1987-06-18 1989-04-18 Ocular Technologies, Inc. Gas permeable contact lens and method and materials for its manufacture

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518615A (en) * 1978-07-27 1980-02-08 Toray Ind Inc Radiation sensitive material
JPS58192163A (ja) * 1982-05-04 1983-11-09 Mitsubishi Electric Corp 図形処理装置
JPS58197128A (ja) * 1982-05-11 1983-11-16 Matsushita Electric Ind Co Ltd 頭付き棒材供給装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2639669C3 (de) * 1976-09-03 1982-05-06 Hoechst Ag, 6000 Frankfurt Verfahren zur Herstellung eines Poly(meth)acrylsäureesters mit hoher Isotaxie und enger Molekulargewichtsverteilung
JPS5837321B2 (ja) * 1978-04-19 1983-08-16 東ソー株式会社 アニオン重合方法
US4301231A (en) * 1980-02-15 1981-11-17 Toray Industries, Incorporated Negative resist for high energy radiation

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5518615A (en) * 1978-07-27 1980-02-08 Toray Ind Inc Radiation sensitive material
JPS58192163A (ja) * 1982-05-04 1983-11-09 Mitsubishi Electric Corp 図形処理装置
JPS58197128A (ja) * 1982-05-11 1983-11-16 Matsushita Electric Ind Co Ltd 頭付き棒材供給装置

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4636454A (en) * 1984-07-18 1987-01-13 Shin-Etsu Chemical Co., Ltd. Method for the preparation of a patterned photoresist layer and a photoresist composition therefor
US4730031A (en) * 1985-01-23 1988-03-08 Nissan Chemical Industries Ltd. Polymers of substituted 1,3-butadiene compounds having reactive silyl groups and process for their preparation
JP2000154223A (ja) * 1998-06-25 2000-06-06 Hydro Quebec 架橋性ポリマ―
KR20250003924A (ko) 2022-04-28 2025-01-07 에이지씨 가부시키가이샤 경화성 중합체, 경화성 조성물, 프리프레그, 적층체, 금속 피복 적층판 및 배선 기판

Also Published As

Publication number Publication date
JPH0320125B2 (cg-RX-API-DMAC7.html) 1991-03-18
US4758640A (en) 1988-07-19

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