JPS5518615A - Radiation sensitive material - Google Patents

Radiation sensitive material

Info

Publication number
JPS5518615A
JPS5518615A JP9092378A JP9092378A JPS5518615A JP S5518615 A JPS5518615 A JP S5518615A JP 9092378 A JP9092378 A JP 9092378A JP 9092378 A JP9092378 A JP 9092378A JP S5518615 A JPS5518615 A JP S5518615A
Authority
JP
Japan
Prior art keywords
sensitive material
radiation sensitive
polymer
main chain
solvent soluble
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP9092378A
Other languages
Japanese (ja)
Other versions
JPS577425B2 (en
Inventor
Yuji Shin
Mutsuo Kataoka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP9092378A priority Critical patent/JPS5518615A/en
Publication of JPS5518615A publication Critical patent/JPS5518615A/en
Publication of JPS577425B2 publication Critical patent/JPS577425B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds
    • G03F7/0758—Macromolecular compounds containing Si-O, Si-C or Si-N bonds with silicon- containing groups in the side chains

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Formation Of Insulating Films (AREA)
  • Polymerisation Methods In General (AREA)
  • Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Macromonomer-Based Addition Polymer (AREA)

Abstract

PURPOSE:To prepare a silicon-containing radiation sensitive material superior in sensitivity characteristics and stability, and suitable foe formation of micropattern, by using a solvent soluble polymer having vinylsilyl groups as side chains. CONSTITUTION:What is used as a radiation sensitive material is a solvent soluble polymer of formulaI(P is a polymer molecule consisting mainly of a carbon main chain;R<1> is a divalent atomic group bonding the polymer main chain and a silicon atom;R<2> is an atomic group linked to a silicon atom except R<1> and vinyl groups, and it consists of a 1 to 4C cydrocarbon group; and n is an integer of 1,2, or 3), such as formulas I and III.
JP9092378A 1978-07-27 1978-07-27 Radiation sensitive material Granted JPS5518615A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9092378A JPS5518615A (en) 1978-07-27 1978-07-27 Radiation sensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9092378A JPS5518615A (en) 1978-07-27 1978-07-27 Radiation sensitive material

Publications (2)

Publication Number Publication Date
JPS5518615A true JPS5518615A (en) 1980-02-08
JPS577425B2 JPS577425B2 (en) 1982-02-10

Family

ID=14011939

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9092378A Granted JPS5518615A (en) 1978-07-27 1978-07-27 Radiation sensitive material

Country Status (1)

Country Link
JP (1) JPS5518615A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5529849A (en) * 1978-08-25 1980-03-03 Toray Ind Inc Forming method of fine pattern
JPS6090205A (en) * 1983-10-24 1985-05-21 Shin Etsu Chem Co Ltd Production of monodisperse vinylsilyl group-containing organic high polymer
JPS6127537A (en) * 1984-07-18 1986-02-07 Shin Etsu Chem Co Ltd Resist agent
JPH0326930A (en) * 1989-06-26 1991-02-05 Sumitomo Heavy Ind Ltd Load cell for two range pressure control

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59190135U (en) * 1983-06-07 1984-12-17 三洋電機株式会社 water heater
JPH0410769Y2 (en) * 1986-07-10 1992-03-17
JPH0295319A (en) * 1988-09-30 1990-04-06 Tatsuta Electric Wire & Cable Co Ltd Coffee drip machine

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5529849A (en) * 1978-08-25 1980-03-03 Toray Ind Inc Forming method of fine pattern
JPS6090205A (en) * 1983-10-24 1985-05-21 Shin Etsu Chem Co Ltd Production of monodisperse vinylsilyl group-containing organic high polymer
JPH0320125B2 (en) * 1983-10-24 1991-03-18 Shinetsu Chem Ind Co
JPS6127537A (en) * 1984-07-18 1986-02-07 Shin Etsu Chem Co Ltd Resist agent
JPH0469898B2 (en) * 1984-07-18 1992-11-09 Shinetsu Chem Ind Co
JPH0326930A (en) * 1989-06-26 1991-02-05 Sumitomo Heavy Ind Ltd Load cell for two range pressure control

Also Published As

Publication number Publication date
JPS577425B2 (en) 1982-02-10

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