JPS6085576A - 薄膜光電変換素子の製造方法 - Google Patents

薄膜光電変換素子の製造方法

Info

Publication number
JPS6085576A
JPS6085576A JP58193632A JP19363283A JPS6085576A JP S6085576 A JPS6085576 A JP S6085576A JP 58193632 A JP58193632 A JP 58193632A JP 19363283 A JP19363283 A JP 19363283A JP S6085576 A JPS6085576 A JP S6085576A
Authority
JP
Japan
Prior art keywords
electrode
photoelectric conversion
thin film
conversion element
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58193632A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0221662B2 (enrdf_load_stackoverflow
Inventor
Mario Fuse
マリオ 布施
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Business Innovation Corp
Original Assignee
Fuji Xerox Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Xerox Co Ltd filed Critical Fuji Xerox Co Ltd
Priority to JP58193632A priority Critical patent/JPS6085576A/ja
Publication of JPS6085576A publication Critical patent/JPS6085576A/ja
Publication of JPH0221662B2 publication Critical patent/JPH0221662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F71/00—Manufacture or treatment of devices covered by this subclass
    • H10F71/10—Manufacture or treatment of devices covered by this subclass the devices comprising amorphous semiconductor material
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F77/00—Constructional details of devices covered by this subclass
    • H10F77/20—Electrodes
    • H10F77/206—Electrodes for devices having potential barriers
    • H10F77/211—Electrodes for devices having potential barriers for photovoltaic cells
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

Landscapes

  • Photovoltaic Devices (AREA)
  • Light Receiving Elements (AREA)
  • Solid State Image Pick-Up Elements (AREA)
JP58193632A 1983-10-17 1983-10-17 薄膜光電変換素子の製造方法 Granted JPS6085576A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58193632A JPS6085576A (ja) 1983-10-17 1983-10-17 薄膜光電変換素子の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58193632A JPS6085576A (ja) 1983-10-17 1983-10-17 薄膜光電変換素子の製造方法

Publications (2)

Publication Number Publication Date
JPS6085576A true JPS6085576A (ja) 1985-05-15
JPH0221662B2 JPH0221662B2 (enrdf_load_stackoverflow) 1990-05-15

Family

ID=16311168

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58193632A Granted JPS6085576A (ja) 1983-10-17 1983-10-17 薄膜光電変換素子の製造方法

Country Status (1)

Country Link
JP (1) JPS6085576A (enrdf_load_stackoverflow)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4729970A (en) * 1986-09-15 1988-03-08 Energy Conversion Devices, Inc. Conversion process for passivating short circuit current paths in semiconductor devices
US7098058B1 (en) 2004-01-15 2006-08-29 University Of Toledo Photovoltaic healing of non-uniformities in semiconductor devices
WO2011032854A3 (en) * 2009-09-18 2012-05-18 Oerlikon Solar Ag, Truebbach Method for manufacturing a thin film photovoltaic device
US8574944B2 (en) 2008-03-28 2013-11-05 The University Of Toledo System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS538088A (en) * 1976-07-12 1978-01-25 Hitachi Ltd Production of semiconductor device

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS538088A (en) * 1976-07-12 1978-01-25 Hitachi Ltd Production of semiconductor device

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4729970A (en) * 1986-09-15 1988-03-08 Energy Conversion Devices, Inc. Conversion process for passivating short circuit current paths in semiconductor devices
JPS6376442A (ja) * 1986-09-15 1988-04-06 エナージー・コンバーシヨン・デバイセス・インコーポレーテツド 半導体装置の短絡欠陥を不動態化する方法
US7098058B1 (en) 2004-01-15 2006-08-29 University Of Toledo Photovoltaic healing of non-uniformities in semiconductor devices
US8574944B2 (en) 2008-03-28 2013-11-05 The University Of Toledo System for selectively filling pin holes, weak shunts and/or scribe lines in photovoltaic devices and photovoltaic cells made thereby
WO2011032854A3 (en) * 2009-09-18 2012-05-18 Oerlikon Solar Ag, Truebbach Method for manufacturing a thin film photovoltaic device

Also Published As

Publication number Publication date
JPH0221662B2 (enrdf_load_stackoverflow) 1990-05-15

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