JPS6083333A - 無塵乾燥方法 - Google Patents

無塵乾燥方法

Info

Publication number
JPS6083333A
JPS6083333A JP19162283A JP19162283A JPS6083333A JP S6083333 A JPS6083333 A JP S6083333A JP 19162283 A JP19162283 A JP 19162283A JP 19162283 A JP19162283 A JP 19162283A JP S6083333 A JPS6083333 A JP S6083333A
Authority
JP
Japan
Prior art keywords
substrate
spinner
drying
fine particles
infrared ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19162283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0452614B2 (enrdf_load_stackoverflow
Inventor
Setsuo Nagashima
長島　節夫
Katsuyuki Arii
有井　勝之
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP19162283A priority Critical patent/JPS6083333A/ja
Publication of JPS6083333A publication Critical patent/JPS6083333A/ja
Publication of JPH0452614B2 publication Critical patent/JPH0452614B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B7/00—Cleaning by methods not provided for in a single other subclass or a single group in this subclass
    • B08B7/0064—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes
    • B08B7/0092—Cleaning by methods not provided for in a single other subclass or a single group in this subclass by temperature changes by cooling

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
JP19162283A 1983-10-13 1983-10-13 無塵乾燥方法 Granted JPS6083333A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19162283A JPS6083333A (ja) 1983-10-13 1983-10-13 無塵乾燥方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19162283A JPS6083333A (ja) 1983-10-13 1983-10-13 無塵乾燥方法

Publications (2)

Publication Number Publication Date
JPS6083333A true JPS6083333A (ja) 1985-05-11
JPH0452614B2 JPH0452614B2 (enrdf_load_stackoverflow) 1992-08-24

Family

ID=16277698

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19162283A Granted JPS6083333A (ja) 1983-10-13 1983-10-13 無塵乾燥方法

Country Status (1)

Country Link
JP (1) JPS6083333A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62245639A (ja) * 1986-04-18 1987-10-26 Hitachi Ltd ベ−パ乾燥装置
JPS6373626A (ja) * 1986-09-17 1988-04-04 Hitachi Ltd 処理装置
JPS63155729A (ja) * 1986-12-19 1988-06-28 Hitachi Electronics Eng Co Ltd シリコンウエハの低温洗浄方法および低温洗浄装置
US4883775A (en) * 1986-12-17 1989-11-28 Fujitsu Limited Process for cleaning and protecting semiconductor substrates
JPH03145130A (ja) * 1989-10-17 1991-06-20 Applied Materials Inc 物体表面から汚染粒子を除去する装置及び方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178328A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Wafer dryer
JPS5834923A (ja) * 1981-08-27 1983-03-01 Toshiba Corp 半導体装置の乾燥方法

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57178328A (en) * 1981-04-27 1982-11-02 Hitachi Ltd Wafer dryer
JPS5834923A (ja) * 1981-08-27 1983-03-01 Toshiba Corp 半導体装置の乾燥方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62245639A (ja) * 1986-04-18 1987-10-26 Hitachi Ltd ベ−パ乾燥装置
JPS6373626A (ja) * 1986-09-17 1988-04-04 Hitachi Ltd 処理装置
US4883775A (en) * 1986-12-17 1989-11-28 Fujitsu Limited Process for cleaning and protecting semiconductor substrates
JPS63155729A (ja) * 1986-12-19 1988-06-28 Hitachi Electronics Eng Co Ltd シリコンウエハの低温洗浄方法および低温洗浄装置
JPH03145130A (ja) * 1989-10-17 1991-06-20 Applied Materials Inc 物体表面から汚染粒子を除去する装置及び方法

Also Published As

Publication number Publication date
JPH0452614B2 (enrdf_load_stackoverflow) 1992-08-24

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