JPS6365933B2 - - Google Patents

Info

Publication number
JPS6365933B2
JPS6365933B2 JP10978285A JP10978285A JPS6365933B2 JP S6365933 B2 JPS6365933 B2 JP S6365933B2 JP 10978285 A JP10978285 A JP 10978285A JP 10978285 A JP10978285 A JP 10978285A JP S6365933 B2 JPS6365933 B2 JP S6365933B2
Authority
JP
Japan
Prior art keywords
light
shielding film
film
photomask
etched
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10978285A
Other languages
English (en)
Japanese (ja)
Other versions
JPS61267762A (ja
Inventor
Hisao Kawai
Masao Ushida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hoya Corp
Original Assignee
Hoya Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hoya Corp filed Critical Hoya Corp
Priority to JP60109782A priority Critical patent/JPS61267762A/ja
Publication of JPS61267762A publication Critical patent/JPS61267762A/ja
Publication of JPS6365933B2 publication Critical patent/JPS6365933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/54—Absorbers, e.g. of opaque materials
    • G03F1/58—Absorbers, e.g. of opaque materials having two or more different absorber layers, e.g. stacked multilayer absorbers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
JP60109782A 1985-05-22 1985-05-22 フォトマスクブランクとフォトマスクの製造方法 Granted JPS61267762A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60109782A JPS61267762A (ja) 1985-05-22 1985-05-22 フォトマスクブランクとフォトマスクの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60109782A JPS61267762A (ja) 1985-05-22 1985-05-22 フォトマスクブランクとフォトマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS61267762A JPS61267762A (ja) 1986-11-27
JPS6365933B2 true JPS6365933B2 (enrdf_load_stackoverflow) 1988-12-19

Family

ID=14519082

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60109782A Granted JPS61267762A (ja) 1985-05-22 1985-05-22 フォトマスクブランクとフォトマスクの製造方法

Country Status (1)

Country Link
JP (1) JPS61267762A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI478770B (zh) * 2010-06-22 2015-04-01 Toshiba Lighting & Technology Photocatalyst deodorization device

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007271661A (ja) * 2006-03-30 2007-10-18 Hoya Corp マスクブランク及びハーフトーン型位相シフトマスク
CN104914663B (zh) * 2014-03-11 2020-01-07 中芯国际集成电路制造(上海)有限公司 一种光掩模制作方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI478770B (zh) * 2010-06-22 2015-04-01 Toshiba Lighting & Technology Photocatalyst deodorization device

Also Published As

Publication number Publication date
JPS61267762A (ja) 1986-11-27

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