JPS6078452A - 湿し水不要平版印刷原版 - Google Patents

湿し水不要平版印刷原版

Info

Publication number
JPS6078452A
JPS6078452A JP18517283A JP18517283A JPS6078452A JP S6078452 A JPS6078452 A JP S6078452A JP 18517283 A JP18517283 A JP 18517283A JP 18517283 A JP18517283 A JP 18517283A JP S6078452 A JPS6078452 A JP S6078452A
Authority
JP
Japan
Prior art keywords
photosensitive layer
original plate
compound
exposed
dampening water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18517283A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0356624B2 (https=
Inventor
Mikio Tsuda
幹雄 津田
Norio Kawabe
川辺　紀雄
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP18517283A priority Critical patent/JPS6078452A/ja
Publication of JPS6078452A publication Critical patent/JPS6078452A/ja
Publication of JPH0356624B2 publication Critical patent/JPH0356624B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/022—Quinonediazides
    • G03F7/0226—Quinonediazides characterised by the non-macromolecular additives

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP18517283A 1983-10-05 1983-10-05 湿し水不要平版印刷原版 Granted JPS6078452A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18517283A JPS6078452A (ja) 1983-10-05 1983-10-05 湿し水不要平版印刷原版

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18517283A JPS6078452A (ja) 1983-10-05 1983-10-05 湿し水不要平版印刷原版

Publications (2)

Publication Number Publication Date
JPS6078452A true JPS6078452A (ja) 1985-05-04
JPH0356624B2 JPH0356624B2 (https=) 1991-08-28

Family

ID=16166089

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18517283A Granted JPS6078452A (ja) 1983-10-05 1983-10-05 湿し水不要平版印刷原版

Country Status (1)

Country Link
JP (1) JPS6078452A (https=)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198465A (en) * 1981-06-01 1982-12-06 Toray Ind Inc Manufacture of negative type lithographic plate

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57198465A (en) * 1981-06-01 1982-12-06 Toray Ind Inc Manufacture of negative type lithographic plate

Also Published As

Publication number Publication date
JPH0356624B2 (https=) 1991-08-28

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Legal Events

Date Code Title Description
LAPS Cancellation because of no payment of annual fees