JPS6077422A - 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ− - Google Patents

電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Info

Publication number
JPS6077422A
JPS6077422A JP18540483A JP18540483A JPS6077422A JP S6077422 A JPS6077422 A JP S6077422A JP 18540483 A JP18540483 A JP 18540483A JP 18540483 A JP18540483 A JP 18540483A JP S6077422 A JPS6077422 A JP S6077422A
Authority
JP
Japan
Prior art keywords
electron beam
wafer
sample
mark
beam exposure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18540483A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0578167B2 (enExample
Inventor
Toshiyuki Honda
本田　俊之
Yasuo Iida
康夫 飯田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
NEC Corp
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Corp, Nippon Electric Co Ltd filed Critical NEC Corp
Priority to JP18540483A priority Critical patent/JPS6077422A/ja
Publication of JPS6077422A publication Critical patent/JPS6077422A/ja
Publication of JPH0578167B2 publication Critical patent/JPH0578167B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Electron Beam Exposure (AREA)
JP18540483A 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ− Granted JPS6077422A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18540483A JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18540483A JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Publications (2)

Publication Number Publication Date
JPS6077422A true JPS6077422A (ja) 1985-05-02
JPH0578167B2 JPH0578167B2 (enExample) 1993-10-28

Family

ID=16170196

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18540483A Granted JPS6077422A (ja) 1983-10-04 1983-10-04 電子ビ−ム露光による描画位置決め方法および電子ビ−ム露光装置の試料ホルダ−

Country Status (1)

Country Link
JP (1) JPS6077422A (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6018395A (en) * 1989-09-26 2000-01-25 Canon Kabushiki Kaisha Alignment system
US6212252B1 (en) 1998-04-01 2001-04-03 Mitsubishi Denki Kabushiki Kaisha X-ray mask provided with an alignment mark and method of manufacturing the same

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS575330A (en) * 1980-06-11 1982-01-12 Toshiba Corp Specimen cassette for microminiature machining apparatus
JPS5821326A (ja) * 1981-07-29 1983-02-08 Toshiba Corp 電子ビ−ム描画装置のカセツト位置合わせ方法
JPS58127325A (ja) * 1982-01-26 1983-07-29 Toshiba Corp 電子ビ−ム露光用位置合わせ装置

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS575330A (en) * 1980-06-11 1982-01-12 Toshiba Corp Specimen cassette for microminiature machining apparatus
JPS5821326A (ja) * 1981-07-29 1983-02-08 Toshiba Corp 電子ビ−ム描画装置のカセツト位置合わせ方法
JPS58127325A (ja) * 1982-01-26 1983-07-29 Toshiba Corp 電子ビ−ム露光用位置合わせ装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6018395A (en) * 1989-09-26 2000-01-25 Canon Kabushiki Kaisha Alignment system
US6212252B1 (en) 1998-04-01 2001-04-03 Mitsubishi Denki Kabushiki Kaisha X-ray mask provided with an alignment mark and method of manufacturing the same

Also Published As

Publication number Publication date
JPH0578167B2 (enExample) 1993-10-28

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