JPS607725A - 電磁アラインメント装置 - Google Patents

電磁アラインメント装置

Info

Publication number
JPS607725A
JPS607725A JP59118399A JP11839984A JPS607725A JP S607725 A JPS607725 A JP S607725A JP 59118399 A JP59118399 A JP 59118399A JP 11839984 A JP11839984 A JP 11839984A JP S607725 A JPS607725 A JP S607725A
Authority
JP
Japan
Prior art keywords
coil
magnets
magnet
positioning device
coil assemblies
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59118399A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0586846B2 (en, 2012
Inventor
デビツド・トロスト
ダニエル・ギヤルバ−ト
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Applied Biosystems Inc
Original Assignee
Perkin Elmer Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Perkin Elmer Corp filed Critical Perkin Elmer Corp
Publication of JPS607725A publication Critical patent/JPS607725A/ja
Publication of JPH0586846B2 publication Critical patent/JPH0586846B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Position Or Direction (AREA)
  • Electron Beam Exposure (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59118399A 1983-06-10 1984-06-11 電磁アラインメント装置 Granted JPS607725A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US502998 1983-06-10
US06/502,998 US4506205A (en) 1983-06-10 1983-06-10 Electro-magnetic alignment apparatus

Publications (2)

Publication Number Publication Date
JPS607725A true JPS607725A (ja) 1985-01-16
JPH0586846B2 JPH0586846B2 (en, 2012) 1993-12-14

Family

ID=24000338

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59118399A Granted JPS607725A (ja) 1983-06-10 1984-06-11 電磁アラインメント装置

Country Status (5)

Country Link
US (1) US4506205A (en, 2012)
EP (1) EP0128433B1 (en, 2012)
JP (1) JPS607725A (en, 2012)
CA (1) CA1217224A (en, 2012)
DE (1) DE3477698D1 (en, 2012)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60223119A (ja) * 1984-04-20 1985-11-07 Hitachi Ltd ２軸方向非接触駆動形精密移動台
JPH01217914A (ja) * 1988-02-26 1989-08-31 Canon Inc 露光装置
JPH04112305A (ja) * 1990-09-03 1992-04-14 Agency Of Ind Science & Technol 被駆動体の制御装置
JP2002525858A (ja) * 1998-09-18 2002-08-13 ゼネラル・スキャニング・インコーポレーテッド 高速精密位置決め装置

Families Citing this family (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD222747A1 (de) * 1983-11-30 1985-05-22 Zeiss Jena Veb Carl X-y-flaechenantrieb mit begrenzter phi-drehung und z-verschiebung
NL8500930A (nl) * 1985-03-29 1986-10-16 Philips Nv Verplaatsingsinrichting met voorgespannen contactloze lagers.
JPH07101663B2 (ja) * 1987-02-09 1995-11-01 キヤノン株式会社 マスク保持装置
US4654571A (en) * 1985-09-16 1987-03-31 Hinds Walter E Single plane orthogonally movable drive system
US4808892A (en) * 1985-12-13 1989-02-28 Kulick And Soffa Ind. Inc. Bi-directional drive motor system
NL8601095A (nl) * 1986-04-29 1987-11-16 Philips Nv Positioneerinrichting.
US4952858A (en) * 1988-05-18 1990-08-28 Galburt Daniel N Microlithographic apparatus
NL8902472A (nl) * 1989-10-05 1991-05-01 Philips Nv Positioneerinrichting.
US5153494A (en) * 1990-04-06 1992-10-06 International Business Machines Corp. Ultrafast electro-dynamic x, y and theta positioning stage
JPH06183561A (ja) * 1992-12-18 1994-07-05 Canon Inc 移動ステージ装置
JPH07142336A (ja) * 1993-06-30 1995-06-02 Canon Inc 露光装置
US5874820A (en) * 1995-04-04 1999-02-23 Nikon Corporation Window frame-guided stage mechanism
US6989647B1 (en) 1994-04-01 2006-01-24 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US7365513B1 (en) 1994-04-01 2008-04-29 Nikon Corporation Positioning device having dynamically isolated frame, and lithographic device provided with such a positioning device
US5528118A (en) * 1994-04-01 1996-06-18 Nikon Precision, Inc. Guideless stage with isolated reaction stage
US6246204B1 (en) 1994-06-27 2001-06-12 Nikon Corporation Electromagnetic alignment and scanning apparatus
US5623853A (en) * 1994-10-19 1997-04-29 Nikon Precision Inc. Precision motion stage with single guide beam and follower stage
US6008500A (en) * 1995-04-04 1999-12-28 Nikon Corporation Exposure apparatus having dynamically isolated reaction frame
TW318255B (en, 2012) 1995-05-30 1997-10-21 Philips Electronics Nv
US5760564A (en) * 1995-06-27 1998-06-02 Nikon Precision Inc. Dual guide beam stage mechanism with yaw control
US5699621A (en) * 1996-02-21 1997-12-23 Massachusetts Institute Of Technology Positioner with long travel in two dimensions
WO1998028665A1 (en) * 1996-12-24 1998-07-02 Koninklijke Philips Electronics N.V. Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
US6355994B1 (en) * 1999-11-05 2002-03-12 Multibeam Systems, Inc. Precision stage
US6437463B1 (en) 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
US6405659B1 (en) 2000-05-01 2002-06-18 Nikon Corporation Monolithic stage
WO2002031945A2 (en) 2000-10-13 2002-04-18 Clarity, Llc Magnetic actuation and positioning
EP1265105B1 (en) * 2001-05-31 2009-04-22 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
EP1262832A1 (en) * 2001-05-31 2002-12-04 ASML Netherlands B.V. Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6650079B2 (en) * 2001-06-01 2003-11-18 Nikon Corporation System and method to control planar motors
AU2002347900B8 (en) 2001-10-11 2006-01-12 Emphasys Medical, Inc. Bronchial flow control devices and methods of use
US6879082B2 (en) * 2002-03-25 2005-04-12 Clarity Technologies, Inc. Electromagnetic positioning
CA2487405A1 (en) 2002-07-26 2004-02-05 Emphasys Medical, Inc. Bronchial flow control devices with membrane seal
JP4323409B2 (ja) * 2003-10-21 2009-09-02 エーエスエムエル ネザーランズ ビー．ブイ． 位置決めシステム及び位置決め方法
US8206684B2 (en) 2004-02-27 2012-06-26 Pulmonx Corporation Methods and devices for blocking flow through collateral pathways in the lung
US7771472B2 (en) 2004-11-19 2010-08-10 Pulmonx Corporation Bronchial flow control devices and methods of use
US9211181B2 (en) 2004-11-19 2015-12-15 Pulmonx Corporation Implant loading device and system
TWI347469B (en) * 2007-04-27 2011-08-21 Hon Hai Prec Ind Co Ltd Fixation device and method for controlling thereof
NL2004847A (en) * 2009-06-30 2011-01-04 Asml Holding Nv Method for controlling the position of a movable object, a control system for controlling a positioning device, and a lithographic apparatus.
US10084364B2 (en) 2013-10-05 2018-09-25 Nikon Research Corporation Of America Power minimizing controller for a stage assembly

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US27436A (en) * 1860-03-13 Kaitge
US27289A (en) * 1860-02-28 Island
AU411601B2 (en) 1966-05-31 1971-03-12 Alden Sawyer Magnetic positioning device
DE1522287A1 (de) * 1966-07-01 1969-08-07 Telefunken Patent Einrichtung zur Feinjustierung von Fotomasken
US3457482A (en) 1967-10-30 1969-07-22 Bruce A Sawyer Magnetic positioning device
US3789285A (en) * 1972-03-27 1974-01-29 Handotai Kenkyu Shinkokai Position control system using magnetic force
JPS553679B2 (en, 2012) * 1973-08-27 1980-01-26
US4019109A (en) * 1974-05-13 1977-04-19 Hughes Aircraft Company Alignment system and method with micromovement stage
JPS51123565A (en) * 1975-04-21 1976-10-28 Nippon Telegr & Teleph Corp <Ntt> Three-dimention-position differential adjustment of processing article
DE3132919A1 (de) * 1980-12-09 1982-09-02 VEB Zentrum für Forschung und Technologie Mikroelektronik, DDR 8080 Dresden "stellantrieb"

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60223119A (ja) * 1984-04-20 1985-11-07 Hitachi Ltd ２軸方向非接触駆動形精密移動台
JPH01217914A (ja) * 1988-02-26 1989-08-31 Canon Inc 露光装置
JPH04112305A (ja) * 1990-09-03 1992-04-14 Agency Of Ind Science & Technol 被駆動体の制御装置
JP2002525858A (ja) * 1998-09-18 2002-08-13 ゼネラル・スキャニング・インコーポレーテッド 高速精密位置決め装置

Also Published As

Publication number Publication date
CA1217224A (en) 1987-01-27
US4506205A (en) 1985-03-19
EP0128433A2 (en) 1984-12-19
EP0128433A3 (en) 1985-01-16
EP0128433B1 (en) 1989-04-12
JPH0586846B2 (en, 2012) 1993-12-14
DE3477698D1 (en) 1989-05-18

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