JPS6070185A - シヤドウマスクの製造方法 - Google Patents

シヤドウマスクの製造方法

Info

Publication number
JPS6070185A
JPS6070185A JP58176378A JP17637883A JPS6070185A JP S6070185 A JPS6070185 A JP S6070185A JP 58176378 A JP58176378 A JP 58176378A JP 17637883 A JP17637883 A JP 17637883A JP S6070185 A JPS6070185 A JP S6070185A
Authority
JP
Japan
Prior art keywords
etching
shadow mask
metal plate
resist film
water
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58176378A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0419311B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html
Inventor
Makoto Harikae
誠 張替
Yasuhisa Otake
大竹　康久
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58176378A priority Critical patent/JPS6070185A/ja
Priority to EP84111132A priority patent/EP0137366B1/en
Priority to DE8484111132T priority patent/DE3477709D1/de
Priority to US06/652,092 priority patent/US4689114A/en
Priority to KR1019840005923A priority patent/KR890002128B1/ko
Publication of JPS6070185A publication Critical patent/JPS6070185A/ja
Publication of JPH0419311B2 publication Critical patent/JPH0419311B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02—Manufacture of electrodes or electrode systems
    • H01J9/14—Manufacture of electrodes or electrode systems of non-emitting electrodes
    • H01J9/142—Manufacture of electrodes or electrode systems of non-emitting electrodes of shadow-masks for colour television tubes
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2209/00—Apparatus and processes for manufacture of discharge tubes
    • H01J2209/01—Generalised techniques
    • H01J2209/012—Coating
    • H01J2209/015—Machines therefor

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP58176378A 1983-09-26 1983-09-26 シヤドウマスクの製造方法 Granted JPS6070185A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58176378A JPS6070185A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法
EP84111132A EP0137366B1 (en) 1983-09-26 1984-09-18 Method for manufacturing a shadow mask
DE8484111132T DE3477709D1 (en) 1983-09-26 1984-09-18 Method for manufacturing a shadow mask
US06/652,092 US4689114A (en) 1983-09-26 1984-09-19 Method for manufacturing a shadow mask
KR1019840005923A KR890002128B1 (ko) 1983-09-26 1984-09-26 샤도우 마스크의 제조방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58176378A JPS6070185A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法

Publications (2)

Publication Number Publication Date
JPS6070185A true JPS6070185A (ja) 1985-04-20
JPH0419311B2 JPH0419311B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-03-30

Family

ID=16012584

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58176378A Granted JPS6070185A (ja) 1983-09-26 1983-09-26 シヤドウマスクの製造方法

Country Status (5)

Country Link
US (1) US4689114A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
EP (1) EP0137366B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
JP (1) JPS6070185A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR890002128B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
DE (1) DE3477709D1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6487786A (en) * 1987-09-30 1989-03-31 Toshiba Corp Production of shadow mask
JPH09157867A (ja) * 1995-11-30 1997-06-17 Toppan Printing Co Ltd シャドウマスクの製造方法
JP2005220370A (ja) * 2004-02-03 2005-08-18 Sony Chem Corp 両面エッチング方法及び両面エッチングシステム
JP2018059130A (ja) * 2016-09-30 2018-04-12 大日本印刷株式会社 蒸着マスクの製造方法、及び蒸着マスクを製造するために用いられる金属板の製造方法

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4795694A (en) * 1986-06-20 1989-01-03 Siemens Aktiengesellschaft Manufacture of fine structures for semiconductor contacting
JPS63286588A (ja) * 1987-05-19 1988-11-24 Toshiba Corp シャドウマスクの製造方法
US5006432A (en) * 1987-10-28 1991-04-09 Kabushiki Kaisha Toshiba Method for manufacturing a shadow mask
US5126005A (en) * 1990-08-31 1992-06-30 The Boeing Company Process for eliminating pits during chemical milling
US5200025A (en) * 1990-09-20 1993-04-06 Dainippon Screen Manufacturing Co. Ltd. Method of forming small through-holes in thin metal plate
CA2041062C (en) * 1991-02-14 2000-11-28 D. Gregory Beckett Demetallizing procedure
JPH05114358A (ja) * 1991-10-24 1993-05-07 Toshiba Corp シヤドウマスクの製造方法
JPH0737492A (ja) * 1993-07-21 1995-02-07 Dainippon Printing Co Ltd アパーチャーグリルの製造方法
US5484074A (en) * 1994-05-03 1996-01-16 Bmc Industries, Inc. Method for manufacturing a shadow mask
TW378334B (en) * 1994-10-14 2000-01-01 Thomson Consumer Electronics Method of forming an enhanced resolution shadow mask
AU2003203088A1 (en) * 2002-02-07 2003-09-02 Browne And Co. Ltd. Non-symmetrical photo tooling and dual surface etching
TWI490637B (zh) 2013-12-06 2015-07-01 金屬遮罩製造方法以及金屬遮罩
KR102808351B1 (ko) * 2018-11-13 2025-05-19 삼성디스플레이 주식회사 기판 식각 방법

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2046417A5 (en) * 1970-04-23 1971-03-05 Dainippon Screen Manufac Pickling process for obtaining perforations - in metallic sheet
GB1468298A (en) * 1974-07-11 1977-03-23 Buckbee Mears Co Method of making a shadow mask for a colour television tube
US4013498A (en) * 1974-07-11 1977-03-22 Buckbee-Mears Company Etching apparatus for accurately making small holes in thick materials
US3971682A (en) * 1974-07-11 1976-07-27 Buckbee-Mears Company Etching process for accurately making small holes in thick materials
US4124437A (en) * 1976-04-05 1978-11-07 Buckbee-Mears Company System for etching patterns of small openings on a continuous strip of metal
JPS56139676A (en) * 1980-04-02 1981-10-31 Toshiba Corp Method and apparatus for etching metal sheet
US4303466A (en) * 1980-06-19 1981-12-01 Buckbee-Mears Company Process of forming graded aperture masks
JPS5726345A (en) * 1980-07-24 1982-02-12 Ritsukaa Kk Water warmer utilizing solar heat
JPS5973833A (ja) * 1982-10-19 1984-04-26 Toshiba Corp シヤドウマスクの製造方法
JPS5981839A (ja) * 1982-11-02 1984-05-11 Toshiba Corp シヤドウマスクの製造方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6487786A (en) * 1987-09-30 1989-03-31 Toshiba Corp Production of shadow mask
JPH09157867A (ja) * 1995-11-30 1997-06-17 Toppan Printing Co Ltd シャドウマスクの製造方法
JP2005220370A (ja) * 2004-02-03 2005-08-18 Sony Chem Corp 両面エッチング方法及び両面エッチングシステム
JP2018059130A (ja) * 2016-09-30 2018-04-12 大日本印刷株式会社 蒸着マスクの製造方法、及び蒸着マスクを製造するために用いられる金属板の製造方法

Also Published As

Publication number Publication date
US4689114A (en) 1987-08-25
EP0137366A2 (en) 1985-04-17
EP0137366A3 (en) 1986-08-20
JPH0419311B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 1992-03-30
EP0137366B1 (en) 1989-04-12
KR850002660A (ko) 1985-05-15
DE3477709D1 (en) 1989-05-18
KR890002128B1 (ko) 1989-06-20

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