JPS6068336A - リソグラフィー用マスク構造体 - Google Patents

リソグラフィー用マスク構造体

Info

Publication number
JPS6068336A
JPS6068336A JP58177286A JP17728683A JPS6068336A JP S6068336 A JPS6068336 A JP S6068336A JP 58177286 A JP58177286 A JP 58177286A JP 17728683 A JP17728683 A JP 17728683A JP S6068336 A JPS6068336 A JP S6068336A
Authority
JP
Japan
Prior art keywords
mask
thin film
holding
lithography
holding substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58177286A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0563933B2 (enrdf_load_stackoverflow
Inventor
Hideo Kato
日出夫 加藤
Hirofumi Shibata
浩文 柴田
Keiko Matsushita
松下　啓子
Osamu Takamatsu
修 高松
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58177286A priority Critical patent/JPS6068336A/ja
Priority to DE19843435177 priority patent/DE3435177A1/de
Priority to GB08424300A priority patent/GB2148539B/en
Publication of JPS6068336A publication Critical patent/JPS6068336A/ja
Priority to US07/398,309 priority patent/US4956249A/en
Priority to US07/534,875 priority patent/US5112707A/en
Publication of JPH0563933B2 publication Critical patent/JPH0563933B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58177286A 1983-09-26 1983-09-26 リソグラフィー用マスク構造体 Granted JPS6068336A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58177286A JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体
DE19843435177 DE3435177A1 (de) 1983-09-26 1984-09-25 Maske fuer lithographische zwecke
GB08424300A GB2148539B (en) 1983-09-26 1984-09-26 Lithographic mask
US07/398,309 US4956249A (en) 1983-09-26 1989-08-25 Mask structure for lithography
US07/534,875 US5112707A (en) 1983-09-26 1990-06-08 Mask structure for lithography

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58177286A JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体

Publications (2)

Publication Number Publication Date
JPS6068336A true JPS6068336A (ja) 1985-04-18
JPH0563933B2 JPH0563933B2 (enrdf_load_stackoverflow) 1993-09-13

Family

ID=16028369

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58177286A Granted JPS6068336A (ja) 1983-09-26 1983-09-26 リソグラフィー用マスク構造体

Country Status (1)

Country Link
JP (1) JPS6068336A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3615453A1 (de) * 1985-05-09 1986-11-13 Alps Electric Co., Ltd., Tokio/Tokyo Tuerschalteranordnung fuer eine gefrier-/kuehlkombination
JPS6252931A (ja) * 1985-08-31 1987-03-07 Dainippon Printing Co Ltd Ｘ線露光用マスク
JP2009519593A (ja) * 2005-12-13 2009-05-14 コミシリア ア レネルジ アトミック 反射フォトリソグラフィーマスクおよびこのマスクの作製方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434682A (en) * 1977-08-23 1979-03-14 Dainippon Printing Co Ltd Soft xxray lithography mask and method of producing same
JPS54124977A (en) * 1978-03-23 1979-09-28 Cho Lsi Gijutsu Kenkyu Kumiai Xxray exposure mask

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5434682A (en) * 1977-08-23 1979-03-14 Dainippon Printing Co Ltd Soft xxray lithography mask and method of producing same
JPS54124977A (en) * 1978-03-23 1979-09-28 Cho Lsi Gijutsu Kenkyu Kumiai Xxray exposure mask

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3615453A1 (de) * 1985-05-09 1986-11-13 Alps Electric Co., Ltd., Tokio/Tokyo Tuerschalteranordnung fuer eine gefrier-/kuehlkombination
JPS6252931A (ja) * 1985-08-31 1987-03-07 Dainippon Printing Co Ltd Ｘ線露光用マスク
JP2009519593A (ja) * 2005-12-13 2009-05-14 コミシリア ア レネルジ アトミック 反射フォトリソグラフィーマスクおよびこのマスクの作製方法

Also Published As

Publication number Publication date
JPH0563933B2 (enrdf_load_stackoverflow) 1993-09-13

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