JPS6053025A - ドライエツチング方法 - Google Patents

ドライエツチング方法

Info

Publication number
JPS6053025A
JPS6053025A JP58160355A JP16035583A JPS6053025A JP S6053025 A JPS6053025 A JP S6053025A JP 58160355 A JP58160355 A JP 58160355A JP 16035583 A JP16035583 A JP 16035583A JP S6053025 A JPS6053025 A JP S6053025A
Authority
JP
Japan
Prior art keywords
resist
dry etching
film
sor
pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58160355A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0452613B2 (cg-RX-API-DMAC10.html
Inventor
Kozo Mochiji
広造 持地
Takeshi Kimura
剛 木村
Hidehito Obayashi
大林　秀仁
Akihiko Kishimoto
岸本　晃彦
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58160355A priority Critical patent/JPS6053025A/ja
Publication of JPS6053025A publication Critical patent/JPS6053025A/ja
Publication of JPH0452613B2 publication Critical patent/JPH0452613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P50/267—

Landscapes

  • Drying Of Semiconductors (AREA)
JP58160355A 1983-09-02 1983-09-02 ドライエツチング方法 Granted JPS6053025A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58160355A JPS6053025A (ja) 1983-09-02 1983-09-02 ドライエツチング方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58160355A JPS6053025A (ja) 1983-09-02 1983-09-02 ドライエツチング方法

Publications (2)

Publication Number Publication Date
JPS6053025A true JPS6053025A (ja) 1985-03-26
JPH0452613B2 JPH0452613B2 (cg-RX-API-DMAC10.html) 1992-08-24

Family

ID=15713179

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58160355A Granted JPS6053025A (ja) 1983-09-02 1983-09-02 ドライエツチング方法

Country Status (1)

Country Link
JP (1) JPS6053025A (cg-RX-API-DMAC10.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199428A (ja) * 1987-02-16 1988-08-17 Nippon Telegr & Teleph Corp <Ntt> 光ドライエツチング装置及び方法
JPH02225680A (ja) * 1989-02-27 1990-09-07 Nippon Telegr & Teleph Corp <Ntt> 光励起エッチング法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53116077A (en) * 1977-03-22 1978-10-11 Hitachi Ltd Etching method
JPS56147438A (en) * 1980-04-16 1981-11-16 Fujitsu Ltd Microplasma treatment apparatus

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53116077A (en) * 1977-03-22 1978-10-11 Hitachi Ltd Etching method
JPS56147438A (en) * 1980-04-16 1981-11-16 Fujitsu Ltd Microplasma treatment apparatus

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63199428A (ja) * 1987-02-16 1988-08-17 Nippon Telegr & Teleph Corp <Ntt> 光ドライエツチング装置及び方法
JPH02225680A (ja) * 1989-02-27 1990-09-07 Nippon Telegr & Teleph Corp <Ntt> 光励起エッチング法

Also Published As

Publication number Publication date
JPH0452613B2 (cg-RX-API-DMAC10.html) 1992-08-24

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