JPS6045242A - パターン形成方法 - Google Patents

パターン形成方法

Info

Publication number
JPS6045242A
JPS6045242A JP58153818A JP15381883A JPS6045242A JP S6045242 A JPS6045242 A JP S6045242A JP 58153818 A JP58153818 A JP 58153818A JP 15381883 A JP15381883 A JP 15381883A JP S6045242 A JPS6045242 A JP S6045242A
Authority
JP
Japan
Prior art keywords
resist
pattern
substrate
film
resist pattern
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58153818A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0470626B2 (enExample
Inventor
Yoshio Yamashita
山下　吉雄
Takaharu Kawazu
河津　隆治
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Oki Electric Industry Co Ltd
Original Assignee
Oki Electric Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Oki Electric Industry Co Ltd filed Critical Oki Electric Industry Co Ltd
Priority to JP58153818A priority Critical patent/JPS6045242A/ja
Priority to US06/594,481 priority patent/US4609615A/en
Priority to DE8484302145T priority patent/DE3466741D1/de
Priority to EP84302145A priority patent/EP0124265B1/en
Priority to CA000450963A priority patent/CA1214679A/en
Publication of JPS6045242A publication Critical patent/JPS6045242A/ja
Publication of JPH0470626B2 publication Critical patent/JPH0470626B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58153818A 1983-03-31 1983-08-23 パターン形成方法 Granted JPS6045242A (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP58153818A JPS6045242A (ja) 1983-08-23 1983-08-23 パターン形成方法
US06/594,481 US4609615A (en) 1983-03-31 1984-03-27 Process for forming pattern with negative resist using quinone diazide compound
DE8484302145T DE3466741D1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
EP84302145A EP0124265B1 (en) 1983-03-31 1984-03-29 Process for forming pattern with negative resist
CA000450963A CA1214679A (en) 1983-03-31 1984-03-30 Process for forming pattern with negative resist

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58153818A JPS6045242A (ja) 1983-08-23 1983-08-23 パターン形成方法

Publications (2)

Publication Number Publication Date
JPS6045242A true JPS6045242A (ja) 1985-03-11
JPH0470626B2 JPH0470626B2 (enExample) 1992-11-11

Family

ID=15570756

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58153818A Granted JPS6045242A (ja) 1983-03-31 1983-08-23 パターン形成方法

Country Status (1)

Country Link
JP (1) JPS6045242A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625241A (ja) * 1985-06-29 1987-01-12 Oki Electric Ind Co Ltd フオトマスクの製造方法
JPS6339935U (enExample) * 1986-09-02 1988-03-15
JPH02250006A (ja) * 1989-03-24 1990-10-05 Fujitsu Ltd レジストの剥離方法

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5692536A (en) * 1979-12-27 1981-07-27 Fujitsu Ltd Pattern formation method

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS625241A (ja) * 1985-06-29 1987-01-12 Oki Electric Ind Co Ltd フオトマスクの製造方法
JPS6339935U (enExample) * 1986-09-02 1988-03-15
JPH02250006A (ja) * 1989-03-24 1990-10-05 Fujitsu Ltd レジストの剥離方法

Also Published As

Publication number Publication date
JPH0470626B2 (enExample) 1992-11-11

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