JPS6331555B2 - - Google Patents
Info
- Publication number
- JPS6331555B2 JPS6331555B2 JP8410180A JP8410180A JPS6331555B2 JP S6331555 B2 JPS6331555 B2 JP S6331555B2 JP 8410180 A JP8410180 A JP 8410180A JP 8410180 A JP8410180 A JP 8410180A JP S6331555 B2 JPS6331555 B2 JP S6331555B2
- Authority
- JP
- Japan
- Prior art keywords
- metal
- layer
- substrate
- gold
- photoresist
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229910052737 gold Inorganic materials 0.000 claims description 39
- 239000010931 gold Substances 0.000 claims description 39
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 claims description 38
- 229910052751 metal Inorganic materials 0.000 claims description 38
- 239000002184 metal Substances 0.000 claims description 38
- 238000000034 method Methods 0.000 claims description 38
- 239000000758 substrate Substances 0.000 claims description 24
- 229920002120 photoresistant polymer Polymers 0.000 claims description 18
- 238000007747 plating Methods 0.000 claims description 13
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 claims description 12
- 238000004519 manufacturing process Methods 0.000 claims description 10
- 238000000151 deposition Methods 0.000 claims description 9
- 230000005855 radiation Effects 0.000 claims description 9
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 6
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 6
- 238000001459 lithography Methods 0.000 claims description 6
- 229910052763 palladium Inorganic materials 0.000 claims description 6
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 4
- 238000010521 absorption reaction Methods 0.000 claims description 4
- 229910052804 chromium Inorganic materials 0.000 claims description 4
- 239000011651 chromium Substances 0.000 claims description 4
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 3
- 229910052785 arsenic Inorganic materials 0.000 claims description 3
- RQNWIZPPADIBDY-UHFFFAOYSA-N arsenic atom Chemical compound [As] RQNWIZPPADIBDY-UHFFFAOYSA-N 0.000 claims description 3
- 239000011248 coating agent Substances 0.000 claims description 3
- 238000000576 coating method Methods 0.000 claims description 3
- 229910017052 cobalt Inorganic materials 0.000 claims description 3
- 239000010941 cobalt Substances 0.000 claims description 3
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims description 3
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- 229910052742 iron Inorganic materials 0.000 claims description 3
- 229910052759 nickel Inorganic materials 0.000 claims description 3
- 238000005530 etching Methods 0.000 claims 1
- 238000001015 X-ray lithography Methods 0.000 description 7
- 239000003054 catalyst Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 230000008569 process Effects 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- 238000004140 cleaning Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000009713 electroplating Methods 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 238000001465 metallisation Methods 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- -1 polyethylene terephthalate Polymers 0.000 description 2
- 238000000746 purification Methods 0.000 description 2
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- 229920002799 BoPET Polymers 0.000 description 1
- XFXPMWWXUTWYJX-UHFFFAOYSA-N Cyanide Chemical compound N#[C-] XFXPMWWXUTWYJX-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- 239000005041 Mylar™ Substances 0.000 description 1
- 239000002033 PVDF binder Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 206010070834 Sensitisation Diseases 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 239000012190 activator Substances 0.000 description 1
- 238000005844 autocatalytic reaction Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002985 plastic film Substances 0.000 description 1
- 229920006255 plastic film Polymers 0.000 description 1
- 229920003223 poly(pyromellitimide-1,4-diphenyl ether) Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 229920000139 polyethylene terephthalate Polymers 0.000 description 1
- 239000005020 polyethylene terephthalate Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000131 polyvinylidene Polymers 0.000 description 1
- 229920002981 polyvinylidene fluoride Polymers 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 230000008313 sensitization Effects 0.000 description 1
- 229920001169 thermoplastic Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 239000004416 thermosoftening plastic Substances 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000001429 visible spectrum Methods 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0104—Properties and characteristics in general
- H05K2201/0108—Transparent
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0002—Apparatus or processes for manufacturing printed circuits for manufacturing artworks for printed circuits
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Chemically Coating (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Wiring (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/052,514 US4328298A (en) | 1979-06-27 | 1979-06-27 | Process for manufacturing lithography masks |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS565980A JPS565980A (en) | 1981-01-22 |
| JPS6331555B2 true JPS6331555B2 (enExample) | 1988-06-24 |
Family
ID=21978108
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8410180A Granted JPS565980A (en) | 1979-06-27 | 1980-06-23 | Production of lithgraphy mask |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US4328298A (enExample) |
| JP (1) | JPS565980A (enExample) |
| DE (1) | DE3019856A1 (enExample) |
Families Citing this family (32)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4414314A (en) * | 1982-02-26 | 1983-11-08 | International Business Machines Corporation | Resolution in optical lithography |
| JPS5950443A (ja) * | 1982-09-16 | 1984-03-23 | Hitachi Ltd | Ｘ線マスク |
| DE3329662A1 (de) * | 1983-08-17 | 1985-03-07 | Philips Patentverwaltung Gmbh, 2000 Hamburg | Verfahren zum nachbessern von optischen belichtungsmasken |
| US4696878A (en) * | 1985-08-02 | 1987-09-29 | Micronix Corporation | Additive process for manufacturing a mask for use in X-ray photolithography and the resulting mask |
| JPS63210845A (ja) * | 1987-02-27 | 1988-09-01 | Hitachi Ltd | 欠陥修正方法 |
| GB8812235D0 (en) * | 1988-05-24 | 1988-06-29 | Jones B L | Manufacturing electronic devices |
| DE3907004A1 (de) * | 1989-03-04 | 1990-09-06 | Contraves Ag | Verfahren zum herstellen von duennschichtschaltungen |
| US5178975A (en) * | 1991-01-25 | 1993-01-12 | International Business Machines Corporation | High resolution X-ray mask having high aspect ratio absorber patterns |
| DE59206797D1 (de) * | 1991-04-10 | 1996-08-29 | Dyconex Ag | Metallfolie mit einer strukturierten Oberfläche |
| US7608367B1 (en) * | 2005-04-22 | 2009-10-27 | Sandia Corporation | Vitreous carbon mask substrate for X-ray lithography |
| US20070026691A1 (en) * | 2005-07-07 | 2007-02-01 | Mks Instruments Inc. | Low-field non-contact charging apparatus for testing substrates |
| JP4692290B2 (ja) * | 2006-01-11 | 2011-06-01 | セイコーエプソン株式会社 | マスクおよび成膜方法 |
| CN103395278B (zh) * | 2013-07-02 | 2016-08-10 | 北京中钞钞券设计制版有限公司 | 一种高耐印力印刷版的加工方法 |
| JP6495025B2 (ja) * | 2014-01-31 | 2019-04-03 | ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ | 真空統合ハードマスク処理および装置 |
| US9996004B2 (en) | 2015-11-20 | 2018-06-12 | Lam Research Corporation | EUV photopatterning of vapor-deposited metal oxide-containing hardmasks |
| US10074764B2 (en) * | 2016-09-29 | 2018-09-11 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Method of fabricating x-ray absorbers for low-energy x-ray spectroscopy |
| US10796912B2 (en) | 2017-05-16 | 2020-10-06 | Lam Research Corporation | Eliminating yield impact of stochastics in lithography |
| KR102955829B1 (ko) | 2018-11-14 | 2026-04-23 | 램 리써치 코포레이션 | 차세대 리소그래피에서 유용한 하드 마스크들을 제조하기 위한 방법들 |
| CN120762258A (zh) | 2018-12-20 | 2025-10-10 | 朗姆研究公司 | 抗蚀剂的干式显影 |
| US12125711B2 (en) | 2019-03-18 | 2024-10-22 | Lam Research Corporation | Reducing roughness of extreme ultraviolet lithography resists |
| WO2020223011A1 (en) | 2019-04-30 | 2020-11-05 | Lam Research Corporation | Atomic layer etch and selective deposition process for extreme ultraviolet lithography resist improvement |
| TWI910974B (zh) | 2019-06-26 | 2026-01-01 | 美商蘭姆研究公司 | 利用鹵化物化學品的光阻顯影 |
| US12601974B2 (en) | 2019-06-28 | 2026-04-14 | Lam Research Corporation | Bake strategies to enhance lithographic performance of metal-containing resist |
| TWI849159B (zh) | 2019-06-28 | 2024-07-21 | 美商蘭姆研究公司 | 光阻膜的乾式腔室清潔 |
| KR20250160237A (ko) | 2019-06-28 | 2025-11-11 | 램 리써치 코포레이션 | 복수의 패터닝 복사-흡수 엘리먼트들 및/또는 수직 조성 경사를 갖는 포토레지스트 |
| CN114200776A (zh) | 2020-01-15 | 2022-03-18 | 朗姆研究公司 | 用于光刻胶粘附和剂量减少的底层 |
| CN115244664A (zh) | 2020-02-28 | 2022-10-25 | 朗姆研究公司 | 用于减少euv图案化缺陷的多层硬掩模 |
| CN115362414A (zh) | 2020-04-03 | 2022-11-18 | 朗姆研究公司 | 用于增强euv光刻性能的暴露前光致抗蚀剂固化 |
| JP2023530299A (ja) | 2020-06-22 | 2023-07-14 | ラム リサーチ コーポレーション | 金属含有フォトレジスト堆積のための表面改質 |
| KR102601038B1 (ko) | 2020-07-07 | 2023-11-09 | 램 리써치 코포레이션 | 방사선 포토레지스트 패터닝을 패터닝하기 위한 통합된 건식 프로세스 |
| KR102673863B1 (ko) | 2020-11-13 | 2024-06-11 | 램 리써치 코포레이션 | 포토레지스트의 건식 제거를 위한 프로세스 툴 |
| KR20250142946A (ko) | 2020-12-08 | 2025-09-30 | 램 리써치 코포레이션 | 유기 증기를 사용한 포토레지스트 현상 |
Family Cites Families (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2702253A (en) * | 1950-11-01 | 1955-02-15 | Gasaccumulator Svenska Ab | Surface metallizing method |
| US2924534A (en) * | 1955-07-05 | 1960-02-09 | John E Morse | Method for the production of a metallic printing member |
| US3367792A (en) * | 1963-09-16 | 1968-02-06 | Dow Chemical Co | Electroless plating on nonconducting surfaces |
| US3558290A (en) * | 1968-04-02 | 1971-01-26 | Union Carbide Corp | Plated plastic printing plates |
| FR2279135A1 (fr) * | 1974-07-19 | 1976-02-13 | Ibm | Procede de fabrication d'un masque pour lithographie aux rayons x |
| US3957552A (en) * | 1975-03-05 | 1976-05-18 | International Business Machines Corporation | Method for making multilayer devices using only a single critical masking step |
| US4001061A (en) * | 1975-03-05 | 1977-01-04 | International Business Machines Corporation | Single lithography for multiple-layer bubble domain devices |
| US4018938A (en) * | 1975-06-30 | 1977-04-19 | International Business Machines Corporation | Fabrication of high aspect ratio masks |
-
1979
- 1979-06-27 US US06/052,514 patent/US4328298A/en not_active Expired - Lifetime
-
1980
- 1980-05-23 DE DE19803019856 patent/DE3019856A1/de not_active Ceased
- 1980-06-23 JP JP8410180A patent/JPS565980A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS565980A (en) | 1981-01-22 |
| US4328298A (en) | 1982-05-04 |
| DE3019856A1 (de) | 1981-01-15 |
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