FR2279135A1 - Procede de fabrication d'un masque pour lithographie aux rayons x - Google Patents

Procede de fabrication d'un masque pour lithographie aux rayons x

Info

Publication number
FR2279135A1
FR2279135A1 FR7518148A FR7518148A FR2279135A1 FR 2279135 A1 FR2279135 A1 FR 2279135A1 FR 7518148 A FR7518148 A FR 7518148A FR 7518148 A FR7518148 A FR 7518148A FR 2279135 A1 FR2279135 A1 FR 2279135A1
Authority
FR
France
Prior art keywords
mask
manufacturing
ray lithography
lithography
ray
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7518148A
Other languages
English (en)
Other versions
FR2279135B1 (fr
Inventor
Michael Hatzakis
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2279135A1 publication Critical patent/FR2279135A1/fr
Application granted granted Critical
Publication of FR2279135B1 publication Critical patent/FR2279135B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • ing And Chemical Polishing (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
FR7518148A 1974-07-19 1975-06-03 Procede de fabrication d'un masque pour lithographie aux rayons x Granted FR2279135A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48985374A 1974-07-19 1974-07-19

Publications (2)

Publication Number Publication Date
FR2279135A1 true FR2279135A1 (fr) 1976-02-13
FR2279135B1 FR2279135B1 (fr) 1977-07-22

Family

ID=23945535

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7518148A Granted FR2279135A1 (fr) 1974-07-19 1975-06-03 Procede de fabrication d'un masque pour lithographie aux rayons x

Country Status (5)

Country Link
JP (1) JPS5312793B2 (fr)
DE (1) DE2528666C2 (fr)
FR (1) FR2279135A1 (fr)
GB (1) GB1507752A (fr)
IT (1) IT1039152B (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2396332A1 (fr) * 1977-06-30 1979-01-26 Ibm Dispositif et procede de controle du developpement d'un materiau resistant
EP0212054A2 (fr) * 1985-08-22 1987-03-04 Kernforschungszentrum Karlsruhe Gmbh Procédé pour la fabrication de masques pour rayons X

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
JPS5695770U (fr) * 1979-12-20 1981-07-29
KR920010065B1 (ko) * 1989-04-20 1992-11-13 삼성전자 주식회사 X선 마스크

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE568197A (fr) * 1957-06-12
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2396332A1 (fr) * 1977-06-30 1979-01-26 Ibm Dispositif et procede de controle du developpement d'un materiau resistant
EP0212054A2 (fr) * 1985-08-22 1987-03-04 Kernforschungszentrum Karlsruhe Gmbh Procédé pour la fabrication de masques pour rayons X
EP0212054A3 (en) * 1985-08-22 1988-11-09 Kernforschungszentrum Karlsruhe Gmbh Process for the production of x-ray masks

Also Published As

Publication number Publication date
DE2528666C2 (de) 1984-11-22
JPS5312793B2 (fr) 1978-05-04
JPS5117672A (fr) 1976-02-12
GB1507752A (en) 1978-04-19
IT1039152B (it) 1979-12-10
FR2279135B1 (fr) 1977-07-22
DE2528666A1 (de) 1976-01-29

Similar Documents

Publication Publication Date Title
DE2861539D1 (en) Process for the fabrication of masks for lithographic processes using a photoresist
GB1489167A (en) Method of making a negative photoresist image
BE830700A (fr) Procede et dispositif pour le traitement d'information pour la fabrication d'une forme d'impression
BE846177A (fr) Procede de fabrication d'un stratifiee utile pour confectionner des pneumatiques
FR2398330B1 (fr) Procede de fabrication par voie photographique d'un stencil pour serigraphie
BE861052A (fr) Procede de fabrication d'un bandage de pneumatique
BE831505A (fr) Procede de fabrication d'un materiau filigrane et materiau obtenu par ledit procede
FR2349953A1 (fr) Anode tournante pour tube a rayons x
FR2285941A1 (fr) Procede de fabrication d'une bande de renforcement notamment pour revetement de tuyau
FR2298182A1 (fr) Procede de fabrication d'un tube a rayons cathodiques
FR2279135A1 (fr) Procede de fabrication d'un masque pour lithographie aux rayons x
BE827427A (fr) Procede de fabrication d'un corps de contact
BE871684A (fr) Agrandisseur photographique destine a la production d'epreuves geantes
BE855701A (fr) Procede pour realiser des masques pour la lithographie aux rayons x
BE853703A (fr) Anode perfectionnee pour tube a rayons x et son procede de fabrication
DE3171230D1 (en) Process for forming a patterned resist mask
FR2277809A1 (fr) Procede de fabrication d'un compose dicetonique
BE827428A (fr) Procede de fabrication d'un corps de contact
FR2324114A3 (fr) Procede pour enlever un revetement d'un element formant masque pour tube a rayons cathodiques
BE835923A (fr) Bobine de deviation destinee a un tube cathodique, et procede pour la fabrication de cette bobine
BE840034A (fr) Procede pour la realisation d'un tube a rayons cathodiques servant a la reproduction d'images colorees
FR2299406A1 (fr) Procede de fabrication d'un feuillard en acier c
BE801803A (fr) Procede de fabrication d'un masque perfore temporaire pour l'obtention de cinescope de television
FR2494461B1 (fr) Masque pour rayons x
BE864731A (fr) Procede de fabrication de tubes a rayons cathodiques

Legal Events

Date Code Title Description
ST Notification of lapse