FR2279135B1 - - Google Patents

Info

Publication number
FR2279135B1
FR2279135B1 FR7518148A FR7518148A FR2279135B1 FR 2279135 B1 FR2279135 B1 FR 2279135B1 FR 7518148 A FR7518148 A FR 7518148A FR 7518148 A FR7518148 A FR 7518148A FR 2279135 B1 FR2279135 B1 FR 2279135B1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
FR7518148A
Other versions
FR2279135A1 (fr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
International Business Machines Corp
Original Assignee
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by International Business Machines Corp filed Critical International Business Machines Corp
Publication of FR2279135A1 publication Critical patent/FR2279135A1/fr
Application granted granted Critical
Publication of FR2279135B1 publication Critical patent/FR2279135B1/fr
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
FR7518148A 1974-07-19 1975-06-03 Procede de fabrication d'un masque pour lithographie aux rayons x Granted FR2279135A1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US48985374A 1974-07-19 1974-07-19

Publications (2)

Publication Number Publication Date
FR2279135A1 FR2279135A1 (fr) 1976-02-13
FR2279135B1 true FR2279135B1 (fr) 1977-07-22

Family

ID=23945535

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7518148A Granted FR2279135A1 (fr) 1974-07-19 1975-06-03 Procede de fabrication d'un masque pour lithographie aux rayons x

Country Status (5)

Country Link
JP (1) JPS5312793B2 (fr)
DE (1) DE2528666C2 (fr)
FR (1) FR2279135A1 (fr)
GB (1) GB1507752A (fr)
IT (1) IT1039152B (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4142107A (en) * 1977-06-30 1979-02-27 International Business Machines Corporation Resist development control system
US4328298A (en) * 1979-06-27 1982-05-04 The Perkin-Elmer Corporation Process for manufacturing lithography masks
JPS5695770U (fr) * 1979-12-20 1981-07-29
DE3529966C1 (de) * 1985-08-22 1987-01-15 Kernforschungsz Karlsruhe Verfahren zur Herstellung von Masken fuer die Roentgentiefenlithographie
KR920010065B1 (ko) * 1989-04-20 1992-11-13 삼성전자 주식회사 X선 마스크

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE568197A (fr) * 1957-06-12
US3649393A (en) * 1970-06-12 1972-03-14 Ibm Variable depth etching of film layers using variable exposures of photoresists
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process

Also Published As

Publication number Publication date
DE2528666A1 (de) 1976-01-29
GB1507752A (en) 1978-04-19
DE2528666C2 (de) 1984-11-22
JPS5312793B2 (fr) 1978-05-04
IT1039152B (it) 1979-12-10
JPS5117672A (fr) 1976-02-12
FR2279135A1 (fr) 1976-02-13

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Legal Events

Date Code Title Description
ST Notification of lapse