JPS6045017A - 拡散炉 - Google Patents

拡散炉

Info

Publication number
JPS6045017A
JPS6045017A JP15393083A JP15393083A JPS6045017A JP S6045017 A JPS6045017 A JP S6045017A JP 15393083 A JP15393083 A JP 15393083A JP 15393083 A JP15393083 A JP 15393083A JP S6045017 A JPS6045017 A JP S6045017A
Authority
JP
Japan
Prior art keywords
tube
processing tube
processing
inclined surfaces
heater
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP15393083A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0158650B2 (cs
Inventor
Yasuhiro Fuwa
保博 不破
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Rohm Co Ltd
Original Assignee
Rohm Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rohm Co Ltd filed Critical Rohm Co Ltd
Priority to JP15393083A priority Critical patent/JPS6045017A/ja
Publication of JPS6045017A publication Critical patent/JPS6045017A/ja
Publication of JPH0158650B2 publication Critical patent/JPH0158650B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005Apparatus not specifically provided for elsewhere
    • H01L21/67011Apparatus for manufacture or treatment
    • H01L21/67098Apparatus for thermal treatment
    • H01L21/67115Apparatus for thermal treatment mainly by radiation

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Furnace Details (AREA)
JP15393083A 1983-08-22 1983-08-22 拡散炉 Granted JPS6045017A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15393083A JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15393083A JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Publications (2)

Publication Number Publication Date
JPS6045017A true JPS6045017A (ja) 1985-03-11
JPH0158650B2 JPH0158650B2 (cs) 1989-12-13

Family

ID=15573185

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15393083A Granted JPS6045017A (ja) 1983-08-22 1983-08-22 拡散炉

Country Status (1)

Country Link
JP (1) JPS6045017A (cs)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115712A (ja) * 1985-11-14 1987-05-27 Nec Kyushu Ltd 拡散炉装置
JPS6385321U (cs) * 1986-11-20 1988-06-03
JPH02257612A (ja) * 1989-03-30 1990-10-18 Fujitsu Ltd 熱処理炉
JPH03207600A (ja) * 1990-01-11 1991-09-10 Citizen Watch Co Ltd 順送りプレス抜金型

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62115712A (ja) * 1985-11-14 1987-05-27 Nec Kyushu Ltd 拡散炉装置
JPS6385321U (cs) * 1986-11-20 1988-06-03
JPH02257612A (ja) * 1989-03-30 1990-10-18 Fujitsu Ltd 熱処理炉
JPH03207600A (ja) * 1990-01-11 1991-09-10 Citizen Watch Co Ltd 順送りプレス抜金型

Also Published As

Publication number Publication date
JPH0158650B2 (cs) 1989-12-13

Similar Documents

Publication Publication Date Title
NO20003477L (no) Varmeveksler i komposittmateriale og fremgangsmÕte for dens fremstilling
KR970067593A (ko) 기판처리장치
JP3155757B2 (ja) 端部開口式モールドのキャビティを形成する手段及び技術
JPS553384A (en) Method of adhering siliconndenatured silicon carbide element
JPS6045017A (ja) 拡散炉
ES8407103A1 (es) Disposicion de cesta para la sujecion de piezas sobre un fondo durante su tratamiento termico
EP0614216A4 (en) APPARATUS FOR FORMING AN OXIDE FILM, HOT PROCESSING APPARATUS, SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF.
JPH0766181B2 (ja) マスク膜とホルダ枠とからなるマスクの安定化方法
JPS59132122A (ja) 気相結晶成長方法
JPS6331688Y2 (cs)
JPS636520B2 (cs)
JPS6245020A (ja) 半導体加熱用石英管のシ−ル方法
JPS6017076A (ja) 気相成長用装置
JP3987841B2 (ja) ウェハ保持装置
JP2573614B2 (ja) 半導体拡散炉用炭化珪素質炉芯管
JP2562683B2 (ja) 縦型ウェハボ−ト
JPS63164312A (ja) シリコンウエ−ハ処理用治具
JPH01130522A (ja) ウェハボートの製造方法
JP2005040943A (ja) チャックにエンボス加工板リングを締付けるための方法
JPS6038018B2 (ja) 半導体ウエ−ハの減圧熱処理炉
JPS61180428A (ja) 半導体液相エピタキシヤル成長装置
JPS59161672A (ja) アンダ−ヒ−タ−型アルミニウム保持炉
JPS60204879A (ja) 気相反応を利用した被膜形成方法
JPS62218046A (ja) 工作機械における構成部材の冷却装置
JPS5950135A (ja) アンダ−ヒ−ト型保持炉