JPS6033503A - ブレ−ズド格子の製造方法 - Google Patents
ブレ−ズド格子の製造方法Info
- Publication number
- JPS6033503A JPS6033503A JP14256783A JP14256783A JPS6033503A JP S6033503 A JPS6033503 A JP S6033503A JP 14256783 A JP14256783 A JP 14256783A JP 14256783 A JP14256783 A JP 14256783A JP S6033503 A JPS6033503 A JP S6033503A
- Authority
- JP
- Japan
- Prior art keywords
- film
- photoresist
- ion beam
- ion
- polymer film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 229920002120 photoresistant polymer Polymers 0.000 claims abstract description 16
- 238000010884 ion-beam technique Methods 0.000 claims abstract description 15
- 238000000992 sputter etching Methods 0.000 claims abstract description 13
- 239000000758 substrate Substances 0.000 claims abstract description 13
- 238000000034 method Methods 0.000 claims abstract description 7
- 229920000620 organic polymer Polymers 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 2
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 abstract description 13
- 229910052786 argon Inorganic materials 0.000 abstract description 7
- 239000002904 solvent Substances 0.000 abstract description 4
- 230000005540 biological transmission Effects 0.000 abstract description 3
- 238000005530 etching Methods 0.000 abstract description 2
- 229920006254 polymer film Polymers 0.000 abstract 2
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 5
- 239000004926 polymethyl methacrylate Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- -1 argon ion Chemical class 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- SDIXRDNYIMOKSG-UHFFFAOYSA-L disodium methyl arsenate Chemical compound [Na+].[Na+].C[As]([O-])([O-])=O SDIXRDNYIMOKSG-UHFFFAOYSA-L 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920005597 polymer membrane Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14256783A JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14256783A JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6033503A true JPS6033503A (ja) | 1985-02-20 |
| JPH0217001B2 JPH0217001B2 (enrdf_load_stackoverflow) | 1990-04-19 |
Family
ID=15318324
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14256783A Granted JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6033503A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6490402A (en) * | 1987-09-30 | 1989-04-06 | Kuraray Co | Transmission type diffraction grating |
| WO2021031111A1 (zh) * | 2019-08-16 | 2021-02-25 | 诚瑞光学(常州)股份有限公司 | 表面浮雕光栅结构的制作方法 |
-
1983
- 1983-08-05 JP JP14256783A patent/JPS6033503A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6490402A (en) * | 1987-09-30 | 1989-04-06 | Kuraray Co | Transmission type diffraction grating |
| WO2021031111A1 (zh) * | 2019-08-16 | 2021-02-25 | 诚瑞光学(常州)股份有限公司 | 表面浮雕光栅结构的制作方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0217001B2 (enrdf_load_stackoverflow) | 1990-04-19 |