JPH0217001B2 - - Google Patents
Info
- Publication number
- JPH0217001B2 JPH0217001B2 JP14256783A JP14256783A JPH0217001B2 JP H0217001 B2 JPH0217001 B2 JP H0217001B2 JP 14256783 A JP14256783 A JP 14256783A JP 14256783 A JP14256783 A JP 14256783A JP H0217001 B2 JPH0217001 B2 JP H0217001B2
- Authority
- JP
- Japan
- Prior art keywords
- organic polymer
- polymer film
- photoresist
- ion
- grating
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 229920000620 organic polymer Polymers 0.000 claims description 17
- 229920002120 photoresistant polymer Polymers 0.000 claims description 16
- 238000000992 sputter etching Methods 0.000 claims description 12
- 239000000758 substrate Substances 0.000 claims description 12
- 238000010884 ion-beam technique Methods 0.000 claims description 11
- 238000000034 method Methods 0.000 claims description 10
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000002904 solvent Substances 0.000 claims description 4
- 230000001678 irradiating effect Effects 0.000 claims description 2
- 239000002120 nanofilm Substances 0.000 claims 1
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 9
- 239000011248 coating agent Substances 0.000 description 6
- 238000000576 coating method Methods 0.000 description 6
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 6
- 239000004926 polymethyl methacrylate Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 5
- 238000010894 electron beam technology Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 2
- 230000005540 biological transmission Effects 0.000 description 2
- 239000006185 dispersion Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229920006324 polyoxymethylene Polymers 0.000 description 2
- 229920002451 polyvinyl alcohol Polymers 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 229930182556 Polyacetal Natural products 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- -1 argon ions Chemical class 0.000 description 1
- 238000002508 contact lithography Methods 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 239000000839 emulsion Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920002554 vinyl polymer Polymers 0.000 description 1
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/18—Diffraction gratings
- G02B5/1847—Manufacturing methods
- G02B5/1857—Manufacturing methods using exposure or etching means, e.g. holography, photolithography, exposure to electron or ion beams
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Diffracting Gratings Or Hologram Optical Elements (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14256783A JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP14256783A JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS6033503A JPS6033503A (ja) | 1985-02-20 |
JPH0217001B2 true JPH0217001B2 (enrdf_load_stackoverflow) | 1990-04-19 |
Family
ID=15318324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP14256783A Granted JPS6033503A (ja) | 1983-08-05 | 1983-08-05 | ブレ−ズド格子の製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6033503A (enrdf_load_stackoverflow) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6490402A (en) * | 1987-09-30 | 1989-04-06 | Kuraray Co | Transmission type diffraction grating |
CN110632689B (zh) * | 2019-08-16 | 2021-11-16 | 诚瑞光学(常州)股份有限公司 | 表面浮雕光栅结构的制作方法 |
-
1983
- 1983-08-05 JP JP14256783A patent/JPS6033503A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS6033503A (ja) | 1985-02-20 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4165395A (en) | Process for forming a high aspect ratio structure by successive exposures with electron beam and actinic radiation | |
US3945825A (en) | Method for producing width-modulated surface relief patterns | |
EP0110184B1 (en) | Process for fabricating integrated optics | |
US3944420A (en) | Generation of permanent phase holograms and relief patterns in durable media by chemical etching | |
US4131506A (en) | Method of producing echelette gratings | |
JPH0217002B2 (enrdf_load_stackoverflow) | ||
JPH0374362B2 (enrdf_load_stackoverflow) | ||
JPH0217001B2 (enrdf_load_stackoverflow) | ||
JPS6033501A (ja) | プレ−ズド格子の製造方法 | |
US4087281A (en) | Method of producing optical image on chromium or aluminum film with high-energy light beam | |
GB2079536A (en) | Process for producing an optical network | |
JPS6310401B2 (enrdf_load_stackoverflow) | ||
JPS60230650A (ja) | 微細パタ−ンの製作法 | |
US3388735A (en) | Grazing incidence diffraction gratings | |
JPS62231901A (ja) | ブレ−ズド回折格子の製造方法 | |
JPS6127505A (ja) | プレ−ズ光学素子の製造方法 | |
JP2506967B2 (ja) | 光ディスク原盤の製造方法 | |
Puech | Thin film optical components duplication method | |
JPS5947282B2 (ja) | エシエレツト格子の製造方法 | |
JPS6033505A (ja) | 回折格子の製造方法 | |
JPH0224691A (ja) | 体積位相型ホログラムの製造方法 | |
JPH0456284B2 (enrdf_load_stackoverflow) | ||
JPS5983111A (ja) | 光集積回路作製法 | |
JPS63271265A (ja) | 透過率変調型フォトマスク、その製法及びそれを用いる回折格子の製法 | |
JPS60146282A (ja) | ホログラムの製造方法 |