JPS6490402A - Transmission type diffraction grating - Google Patents

Transmission type diffraction grating

Info

Publication number
JPS6490402A
JPS6490402A JP24863487A JP24863487A JPS6490402A JP S6490402 A JPS6490402 A JP S6490402A JP 24863487 A JP24863487 A JP 24863487A JP 24863487 A JP24863487 A JP 24863487A JP S6490402 A JPS6490402 A JP S6490402A
Authority
JP
Japan
Prior art keywords
substrate
thin film
fluctuation
temperature variation
caused
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24863487A
Other languages
Japanese (ja)
Inventor
Yoshihiro Kawatsuki
Masao Uetsuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP24863487A priority Critical patent/JPS6490402A/en
Publication of JPS6490402A publication Critical patent/JPS6490402A/en
Pending legal-status Critical Current

Links

Landscapes

  • Diffracting Gratings Or Hologram Optical Elements (AREA)

Abstract

PURPOSE:To reduce the fluctuation of an angle of diffraction caused by a temperature variation, and also, to reduce the cost by using a substrate whose thermal expansion coefficient is small by bringing an uneven thin film to patterning onto said substrate so that its thickness becomes 0.1-5mum, and also, both the projecting part and the recessed part adhere closely to the substrate. CONSTITUTION:A substrate 1 whose thermal expansion coefficient is remarkably smaller than plastics such as PMMA, etc., is used, and a thin film 2 having a diffraction grating-like pattern is brought to patterning thereon so that both a recessed part and a projecting part adhere closely to the substrate 1 with such a step difference (usually <=2mum) as has a desired phase difference. Thickness (d) of the thin film 2 is extremely thin such as <=5mum, therefore, the fluctuation of a grating pitch caused by a temperature variation of the periphery and the fluctuation of a grating thin film form are controlled by the substrate 1 whose thermal expansion coefficient, and also, since both the recessed part and the projecting part of the thin film 2 adhere closely to the substrate 1, peeling-off due to temperature variation is not generated either. Accordingly, the fluctuation of an angle of diffraction caused by temperature variation is small, and also, the wave front aberration is also scarcely caused.
JP24863487A 1987-09-30 1987-09-30 Transmission type diffraction grating Pending JPS6490402A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24863487A JPS6490402A (en) 1987-09-30 1987-09-30 Transmission type diffraction grating

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24863487A JPS6490402A (en) 1987-09-30 1987-09-30 Transmission type diffraction grating

Publications (1)

Publication Number Publication Date
JPS6490402A true JPS6490402A (en) 1989-04-06

Family

ID=17181031

Family Applications (1)

Application Number Title Priority Date Filing Date
JP24863487A Pending JPS6490402A (en) 1987-09-30 1987-09-30 Transmission type diffraction grating

Country Status (1)

Country Link
JP (1) JPS6490402A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015050037A (en) * 2013-09-02 2015-03-16 株式会社ジャパンディスプレイ Light-emitting element display device and manufacturing method of light-emitting element display device
CN111736342A (en) * 2019-03-25 2020-10-02 精工爱普生株式会社 Display device, optical element, and method for manufacturing optical element

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033503A (en) * 1983-08-05 1985-02-20 Agency Of Ind Science & Technol Production of blazed grating
JPS60176001A (en) * 1984-02-22 1985-09-10 Ricoh Co Ltd Manufacture of hologram diffraction grating
JPS60181703A (en) * 1984-02-29 1985-09-17 Ricoh Co Ltd Production of halogram diffraction grating

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6033503A (en) * 1983-08-05 1985-02-20 Agency Of Ind Science & Technol Production of blazed grating
JPS60176001A (en) * 1984-02-22 1985-09-10 Ricoh Co Ltd Manufacture of hologram diffraction grating
JPS60181703A (en) * 1984-02-29 1985-09-17 Ricoh Co Ltd Production of halogram diffraction grating

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015050037A (en) * 2013-09-02 2015-03-16 株式会社ジャパンディスプレイ Light-emitting element display device and manufacturing method of light-emitting element display device
CN111736342A (en) * 2019-03-25 2020-10-02 精工爱普生株式会社 Display device, optical element, and method for manufacturing optical element
US11656465B2 (en) 2019-03-25 2023-05-23 Seiko Epson Corporation Display device, optical element, and method of producing optical element

Similar Documents

Publication Publication Date Title
TW363146B (en) An anti-reflective layer and a method of forming a photoresist pattern
JPS523583A (en) Crystal film forming process
JPS5260142A (en) Optical system for copying machine
EP0379358A3 (en) A method for producing a diffraction grating in optical elements
JPS5240348A (en) Reflecting mirror formed of metallic film
DE69410872T2 (en) Process for the production of a phase retardation film
JPS6490402A (en) Transmission type diffraction grating
EP0206288A3 (en) Diffraction grating and process for producing the same
JPS53149259A (en) Production of embossed release film
JPS52115202A (en) Recording member for information
JPS53120527A (en) Forming method of positive type radiation sensitive material layer
JPS53125761A (en) Manufacture for binary compound semiconductor thin film
JPS5320770A (en) Production of thin film fine patterns
JPS644703A (en) Diffraction grating and its production
JPS52136234A (en) Decorative metal plates
JPS52141649A (en) Production of hologram recorder
JPS53131851A (en) Optical fiber production
JPS54110857A (en) Optical production of sawtooth photo-sensitive resin flim
JPS5412689A (en) Photo coupler
JPS53140338A (en) Dazzle-proofing coating material
JPS5267647A (en) Optical film
JPS5292520A (en) Materials for recording
JPS52129469A (en) Wristwatch case
JPS53143241A (en) Production of optical diffusing plate
JPS53143242A (en) Production of optical diffusing plate