JPS6033233A - 酸化珪素被膜の製造方法 - Google Patents
酸化珪素被膜の製造方法Info
- Publication number
- JPS6033233A JPS6033233A JP13721783A JP13721783A JPS6033233A JP S6033233 A JPS6033233 A JP S6033233A JP 13721783 A JP13721783 A JP 13721783A JP 13721783 A JP13721783 A JP 13721783A JP S6033233 A JPS6033233 A JP S6033233A
- Authority
- JP
- Japan
- Prior art keywords
- silicon oxide
- glass
- boric acid
- liquid
- treatment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims abstract description 43
- 229910052814 silicon oxide Inorganic materials 0.000 title claims abstract description 43
- 239000011521 glass Substances 0.000 title claims abstract description 42
- 239000007788 liquid Substances 0.000 claims abstract description 22
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 claims abstract description 19
- 239000004327 boric acid Substances 0.000 claims abstract description 19
- 239000002253 acid Substances 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 19
- 239000000243 solution Substances 0.000 claims description 14
- 239000007864 aqueous solution Substances 0.000 claims description 13
- 238000012545 processing Methods 0.000 claims description 13
- 238000007654 immersion Methods 0.000 claims description 12
- 238000001914 filtration Methods 0.000 claims description 5
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims description 4
- 238000010924 continuous production Methods 0.000 claims 1
- 238000005086 pumping Methods 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 abstract description 5
- 229920006395 saturated elastomer Polymers 0.000 abstract description 3
- 239000005361 soda-lime glass Substances 0.000 abstract description 3
- 238000007598 dipping method Methods 0.000 abstract description 2
- 239000000463 material Substances 0.000 description 11
- 239000002585 base Substances 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000000576 coating method Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000011368 organic material Substances 0.000 description 3
- 239000002244 precipitate Substances 0.000 description 3
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010828 elution Methods 0.000 description 2
- 239000004973 liquid crystal related substance Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 239000005388 borosilicate glass Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- LRCFXGAMWKDGLA-UHFFFAOYSA-N dioxosilane;hydrate Chemical compound O.O=[Si]=O LRCFXGAMWKDGLA-UHFFFAOYSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- -1 etc.) Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
Landscapes
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Surface Treatment Of Glass (AREA)
- Chemically Coating (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13721783A JPS6033233A (ja) | 1983-07-27 | 1983-07-27 | 酸化珪素被膜の製造方法 |
| DE19833332995 DE3332995A1 (de) | 1983-07-14 | 1983-09-13 | Verfahren zum herstellen einer siliciumdioxidbeschichtung |
| FR8314651A FR2549035A1 (en) | 1983-07-14 | 1983-09-14 | Process for producing a silica coating on the surface of a substrate such as a sheet of glass containing an alkali metal |
| GB08324760A GB2144733B (en) | 1983-07-14 | 1983-09-15 | Methods of making silicon dioxide coatings |
| DD83254853A DD215996A5 (de) | 1983-07-14 | 1983-09-15 | Verfahren zur herstellung einer siliciumdioxidbeschichtung |
| US06/538,289 US4468420A (en) | 1983-07-14 | 1983-10-03 | Method for making a silicon dioxide coating |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13721783A JPS6033233A (ja) | 1983-07-27 | 1983-07-27 | 酸化珪素被膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6033233A true JPS6033233A (ja) | 1985-02-20 |
| JPS6365621B2 JPS6365621B2 (en, 2012) | 1988-12-16 |
Family
ID=15193519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13721783A Granted JPS6033233A (ja) | 1983-07-14 | 1983-07-27 | 酸化珪素被膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6033233A (en, 2012) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS648296A (en) * | 1987-06-30 | 1989-01-12 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film |
| JPS6417871A (en) * | 1987-07-13 | 1989-01-20 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide coated film |
| JPS6436770A (en) * | 1987-07-30 | 1989-02-07 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film containing phosphorus |
| JPS6483670A (en) * | 1987-09-28 | 1989-03-29 | Nippon Sheet Glass Co Ltd | Production of oxide film |
| US5153035A (en) * | 1990-09-29 | 1992-10-06 | Nippon Sheet Glass Co., Ltd. | Process for forming silica films |
| EP0499842A3 (en) * | 1991-02-01 | 1994-06-01 | Nippon Sheet Glass Co Ltd | Thin film capacitor |
| US5326720A (en) * | 1990-10-25 | 1994-07-05 | Nippon Sheet Glass Co., Ltd. | Method for producing silicon dioxide film which prevents escape of Si component to the environment |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02105920U (en, 2012) * | 1989-02-07 | 1990-08-23 |
-
1983
- 1983-07-27 JP JP13721783A patent/JPS6033233A/ja active Granted
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS648296A (en) * | 1987-06-30 | 1989-01-12 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film |
| JPS6417871A (en) * | 1987-07-13 | 1989-01-20 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide coated film |
| JPS6436770A (en) * | 1987-07-30 | 1989-02-07 | Nippon Sheet Glass Co Ltd | Production of silicon dioxide film containing phosphorus |
| JPS6483670A (en) * | 1987-09-28 | 1989-03-29 | Nippon Sheet Glass Co Ltd | Production of oxide film |
| US5153035A (en) * | 1990-09-29 | 1992-10-06 | Nippon Sheet Glass Co., Ltd. | Process for forming silica films |
| US5326720A (en) * | 1990-10-25 | 1994-07-05 | Nippon Sheet Glass Co., Ltd. | Method for producing silicon dioxide film which prevents escape of Si component to the environment |
| EP0499842A3 (en) * | 1991-02-01 | 1994-06-01 | Nippon Sheet Glass Co Ltd | Thin film capacitor |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6365621B2 (en, 2012) | 1988-12-16 |
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