JPS6030933B2 - 印刷用原版の製作法 - Google Patents
印刷用原版の製作法Info
- Publication number
- JPS6030933B2 JPS6030933B2 JP51069153A JP6915376A JPS6030933B2 JP S6030933 B2 JPS6030933 B2 JP S6030933B2 JP 51069153 A JP51069153 A JP 51069153A JP 6915376 A JP6915376 A JP 6915376A JP S6030933 B2 JPS6030933 B2 JP S6030933B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- printing
- transparent
- light
- transparent positive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C5/00—Photographic processes or agents therefor; Regeneration of such processing agents
- G03C5/08—Photoprinting; Processes and means for preventing photoprinting
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Laminated Bodies (AREA)
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51069153A JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
DE19772725968 DE2725968A1 (de) | 1976-06-11 | 1977-06-08 | Verfahren zur herstellung einer stammplatte fuer den druck |
FR7717869A FR2354583A1 (fr) | 1976-06-11 | 1977-06-10 | Procede perfectionne de fabrication de plaques de tirage |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP51069153A JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS52152303A JPS52152303A (en) | 1977-12-17 |
JPS6030933B2 true JPS6030933B2 (ja) | 1985-07-19 |
Family
ID=13394429
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51069153A Expired JPS6030933B2 (ja) | 1976-06-11 | 1976-06-11 | 印刷用原版の製作法 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS6030933B2 (fr) |
DE (1) | DE2725968A1 (fr) |
FR (1) | FR2354583A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450342U (fr) * | 1990-09-05 | 1992-04-28 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS607428A (ja) * | 1983-06-28 | 1985-01-16 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
JPS608846A (ja) * | 1983-07-26 | 1985-01-17 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
JPS608845A (ja) * | 1983-12-27 | 1985-01-17 | Osaka Seihan Center Kyogyo Kumiai | 印刷用版の製法 |
-
1976
- 1976-06-11 JP JP51069153A patent/JPS6030933B2/ja not_active Expired
-
1977
- 1977-06-08 DE DE19772725968 patent/DE2725968A1/de not_active Withdrawn
- 1977-06-10 FR FR7717869A patent/FR2354583A1/fr active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0450342U (fr) * | 1990-09-05 | 1992-04-28 |
Also Published As
Publication number | Publication date |
---|---|
FR2354583A1 (fr) | 1978-01-06 |
JPS52152303A (en) | 1977-12-17 |
FR2354583B1 (fr) | 1980-02-08 |
DE2725968A1 (de) | 1977-12-22 |
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