JPS60255613A - 水素化ケイ素の製造方法 - Google Patents
水素化ケイ素の製造方法Info
- Publication number
- JPS60255613A JPS60255613A JP11070384A JP11070384A JPS60255613A JP S60255613 A JPS60255613 A JP S60255613A JP 11070384 A JP11070384 A JP 11070384A JP 11070384 A JP11070384 A JP 11070384A JP S60255613 A JPS60255613 A JP S60255613A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- silicon
- diethyl ether
- hydroxide
- silicon compound
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Silicon Compounds (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11070384A JPS60255613A (ja) | 1984-06-01 | 1984-06-01 | 水素化ケイ素の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11070384A JPS60255613A (ja) | 1984-06-01 | 1984-06-01 | 水素化ケイ素の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60255613A true JPS60255613A (ja) | 1985-12-17 |
| JPH0480845B2 JPH0480845B2 (enExample) | 1992-12-21 |
Family
ID=14542313
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11070384A Granted JPS60255613A (ja) | 1984-06-01 | 1984-06-01 | 水素化ケイ素の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60255613A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010079842A1 (ja) * | 2009-01-09 | 2010-07-15 | 独立行政法人科学技術振興機構 | 高次シラン組成物および膜付基板の製造方法 |
-
1984
- 1984-06-01 JP JP11070384A patent/JPS60255613A/ja active Granted
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2010079842A1 (ja) * | 2009-01-09 | 2010-07-15 | 独立行政法人科学技術振興機構 | 高次シラン組成物および膜付基板の製造方法 |
| JP2010159191A (ja) * | 2009-01-09 | 2010-07-22 | Japan Science & Technology Agency | 高次シラン組成物、膜付基板の製造方法、電気光学装置および電子デバイス |
| US8673682B2 (en) | 2009-01-09 | 2014-03-18 | Japan Science And Technology Agency | High order silane composition and method of manufacturing a film-coated substrate |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0480845B2 (enExample) | 1992-12-21 |
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