JPS60251108A - 窒化ケイ素粉末の製造装置 - Google Patents
窒化ケイ素粉末の製造装置Info
- Publication number
- JPS60251108A JPS60251108A JP10747984A JP10747984A JPS60251108A JP S60251108 A JPS60251108 A JP S60251108A JP 10747984 A JP10747984 A JP 10747984A JP 10747984 A JP10747984 A JP 10747984A JP S60251108 A JPS60251108 A JP S60251108A
- Authority
- JP
- Japan
- Prior art keywords
- reaction
- powder
- reaction vessel
- silicon nitride
- reaction chamber
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000843 powder Substances 0.000 title claims abstract description 50
- 229910052581 Si3N4 Inorganic materials 0.000 title claims abstract description 29
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims description 23
- 238000006243 chemical reaction Methods 0.000 claims abstract description 72
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract description 24
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 8
- 229910052799 carbon Inorganic materials 0.000 claims abstract description 7
- 238000010438 heat treatment Methods 0.000 claims abstract description 7
- 230000006698 induction Effects 0.000 claims abstract description 4
- 239000002994 raw material Substances 0.000 claims description 21
- 238000000034 method Methods 0.000 abstract description 16
- 239000011361 granulated particle Substances 0.000 abstract description 10
- 239000000377 silicon dioxide Substances 0.000 abstract description 9
- 239000002245 particle Substances 0.000 abstract description 8
- 239000007858 starting material Substances 0.000 abstract description 7
- 229910052681 coesite Inorganic materials 0.000 abstract description 6
- 229910052906 cristobalite Inorganic materials 0.000 abstract description 6
- 235000012239 silicon dioxide Nutrition 0.000 abstract description 6
- 229910052682 stishovite Inorganic materials 0.000 abstract description 6
- 229910052905 tridymite Inorganic materials 0.000 abstract description 6
- 239000007795 chemical reaction product Substances 0.000 abstract description 4
- 239000006227 byproduct Substances 0.000 abstract description 2
- 239000006229 carbon black Substances 0.000 abstract description 2
- 239000000047 product Substances 0.000 abstract description 2
- 239000000203 mixture Substances 0.000 abstract 2
- 238000007599 discharging Methods 0.000 abstract 1
- 238000005243 fluidization Methods 0.000 abstract 1
- 239000007789 gas Substances 0.000 description 21
- 238000004519 manufacturing process Methods 0.000 description 16
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 7
- 229910001873 dinitrogen Inorganic materials 0.000 description 7
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 6
- 230000001590 oxidative effect Effects 0.000 description 6
- 238000005469 granulation Methods 0.000 description 5
- 230000003179 granulation Effects 0.000 description 5
- 238000005121 nitriding Methods 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 238000001035 drying Methods 0.000 description 3
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 3
- 229910010271 silicon carbide Inorganic materials 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 239000000428 dust Substances 0.000 description 2
- 238000011049 filling Methods 0.000 description 2
- 230000005484 gravity Effects 0.000 description 2
- 238000002156 mixing Methods 0.000 description 2
- 238000009790 rate-determining step (RDS) Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002699 waste material Substances 0.000 description 2
- 241001062872 Cleyera japonica Species 0.000 description 1
- 206010019049 Hair texture abnormal Diseases 0.000 description 1
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000013019 agitation Methods 0.000 description 1
- 238000011021 bench scale process Methods 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 239000008119 colloidal silica Substances 0.000 description 1
- 238000002485 combustion reaction Methods 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000003337 fertilizer Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000395 magnesium oxide Substances 0.000 description 1
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 description 1
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000011812 mixed powder Substances 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 239000012466 permeate Substances 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
Landscapes
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10747984A JPS60251108A (ja) | 1984-05-29 | 1984-05-29 | 窒化ケイ素粉末の製造装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10747984A JPS60251108A (ja) | 1984-05-29 | 1984-05-29 | 窒化ケイ素粉末の製造装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60251108A true JPS60251108A (ja) | 1985-12-11 |
JPS6356168B2 JPS6356168B2 (enrdf_load_stackoverflow) | 1988-11-07 |
Family
ID=14460252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10747984A Granted JPS60251108A (ja) | 1984-05-29 | 1984-05-29 | 窒化ケイ素粉末の製造装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60251108A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63297205A (ja) * | 1987-05-29 | 1988-12-05 | Ibiden Co Ltd | 窒化物の製造方法 |
US4818511A (en) * | 1986-03-08 | 1989-04-04 | Nihon Cement Co., Ltd. | Process and apparatus for producing non-oxide compounds |
US5662875A (en) * | 1992-02-18 | 1997-09-02 | Elf Atochem S. A. | Continuous process for the preparation of silicon nitride by carbonitriding and silicon nitride thereby obtained |
CN102829613A (zh) * | 2012-09-19 | 2012-12-19 | 邱富仁 | 工频感应式四石英管动态干燥机 |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5889941A (ja) * | 1981-11-25 | 1983-05-28 | Toshiba Ceramics Co Ltd | 反応装置 |
JPS5891012A (ja) * | 1981-11-25 | 1983-05-30 | Toshiba Ceramics Co Ltd | 窒化珪素粉末の製造方法及びその製造装置 |
-
1984
- 1984-05-29 JP JP10747984A patent/JPS60251108A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5889941A (ja) * | 1981-11-25 | 1983-05-28 | Toshiba Ceramics Co Ltd | 反応装置 |
JPS5891012A (ja) * | 1981-11-25 | 1983-05-30 | Toshiba Ceramics Co Ltd | 窒化珪素粉末の製造方法及びその製造装置 |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4818511A (en) * | 1986-03-08 | 1989-04-04 | Nihon Cement Co., Ltd. | Process and apparatus for producing non-oxide compounds |
JPS63297205A (ja) * | 1987-05-29 | 1988-12-05 | Ibiden Co Ltd | 窒化物の製造方法 |
US5662875A (en) * | 1992-02-18 | 1997-09-02 | Elf Atochem S. A. | Continuous process for the preparation of silicon nitride by carbonitriding and silicon nitride thereby obtained |
CN102829613A (zh) * | 2012-09-19 | 2012-12-19 | 邱富仁 | 工频感应式四石英管动态干燥机 |
Also Published As
Publication number | Publication date |
---|---|
JPS6356168B2 (enrdf_load_stackoverflow) | 1988-11-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |