JPS60221577A - 真空成膜装置および成膜方法 - Google Patents
真空成膜装置および成膜方法Info
- Publication number
- JPS60221577A JPS60221577A JP7655884A JP7655884A JPS60221577A JP S60221577 A JPS60221577 A JP S60221577A JP 7655884 A JP7655884 A JP 7655884A JP 7655884 A JP7655884 A JP 7655884A JP S60221577 A JPS60221577 A JP S60221577A
- Authority
- JP
- Japan
- Prior art keywords
- film
- vacuum
- gas
- exhaust
- raw material
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
- C23C16/5096—Flat-bed apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7655884A JPS60221577A (ja) | 1984-04-18 | 1984-04-18 | 真空成膜装置および成膜方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7655884A JPS60221577A (ja) | 1984-04-18 | 1984-04-18 | 真空成膜装置および成膜方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60221577A true JPS60221577A (ja) | 1985-11-06 |
| JPH0549752B2 JPH0549752B2 (enrdf_load_stackoverflow) | 1993-07-27 |
Family
ID=13608577
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7655884A Granted JPS60221577A (ja) | 1984-04-18 | 1984-04-18 | 真空成膜装置および成膜方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60221577A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113445009A (zh) * | 2021-06-28 | 2021-09-28 | 北方夜视科技(南京)研究院有限公司 | 打拿极型光电倍增管阴极和打拿极瓦片镀膜设备及镀膜方法 |
-
1984
- 1984-04-18 JP JP7655884A patent/JPS60221577A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113445009A (zh) * | 2021-06-28 | 2021-09-28 | 北方夜视科技(南京)研究院有限公司 | 打拿极型光电倍增管阴极和打拿极瓦片镀膜设备及镀膜方法 |
| CN113445009B (zh) * | 2021-06-28 | 2024-01-23 | 北方夜视科技(南京)研究院有限公司 | 打拿极型光电倍增管阴极和打拿极瓦片镀膜设备及镀膜方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0549752B2 (enrdf_load_stackoverflow) | 1993-07-27 |
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