JPH0549752B2 - - Google Patents

Info

Publication number
JPH0549752B2
JPH0549752B2 JP59076558A JP7655884A JPH0549752B2 JP H0549752 B2 JPH0549752 B2 JP H0549752B2 JP 59076558 A JP59076558 A JP 59076558A JP 7655884 A JP7655884 A JP 7655884A JP H0549752 B2 JPH0549752 B2 JP H0549752B2
Authority
JP
Japan
Prior art keywords
film
vacuum chamber
vacuum
exhaust
gas
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59076558A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60221577A (ja
Inventor
Satoru Sugita
Atsushi Yamagami
Teruhiko Furushima
Tatsumi Shoji
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP7655884A priority Critical patent/JPS60221577A/ja
Publication of JPS60221577A publication Critical patent/JPS60221577A/ja
Publication of JPH0549752B2 publication Critical patent/JPH0549752B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • C23C16/509Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
    • C23C16/5096Flat-bed apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
JP7655884A 1984-04-18 1984-04-18 真空成膜装置および成膜方法 Granted JPS60221577A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7655884A JPS60221577A (ja) 1984-04-18 1984-04-18 真空成膜装置および成膜方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7655884A JPS60221577A (ja) 1984-04-18 1984-04-18 真空成膜装置および成膜方法

Publications (2)

Publication Number Publication Date
JPS60221577A JPS60221577A (ja) 1985-11-06
JPH0549752B2 true JPH0549752B2 (enrdf_load_stackoverflow) 1993-07-27

Family

ID=13608577

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7655884A Granted JPS60221577A (ja) 1984-04-18 1984-04-18 真空成膜装置および成膜方法

Country Status (1)

Country Link
JP (1) JPS60221577A (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN113445009B (zh) * 2021-06-28 2024-01-23 北方夜视科技(南京)研究院有限公司 打拿极型光电倍增管阴极和打拿极瓦片镀膜设备及镀膜方法

Also Published As

Publication number Publication date
JPS60221577A (ja) 1985-11-06

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