JPH0152052B2 - - Google Patents
Info
- Publication number
- JPH0152052B2 JPH0152052B2 JP19960881A JP19960881A JPH0152052B2 JP H0152052 B2 JPH0152052 B2 JP H0152052B2 JP 19960881 A JP19960881 A JP 19960881A JP 19960881 A JP19960881 A JP 19960881A JP H0152052 B2 JPH0152052 B2 JP H0152052B2
- Authority
- JP
- Japan
- Prior art keywords
- drum
- reaction chamber
- cylindrical substrates
- flat
- electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000006243 chemical reaction Methods 0.000 claims description 23
- 239000000758 substrate Substances 0.000 claims description 14
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims description 10
- 230000005684 electric field Effects 0.000 claims description 6
- 239000007789 gas Substances 0.000 description 15
- 238000010438 heat treatment Methods 0.000 description 10
- 108091008695 photoreceptors Proteins 0.000 description 10
- 238000001816 cooling Methods 0.000 description 9
- 229910021417 amorphous silicon Inorganic materials 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- 229910052782 aluminium Inorganic materials 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000008021 deposition Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009826 distribution Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000003507 refrigerant Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 230000002159 abnormal effect Effects 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- PXBRQCKWGAHEHS-UHFFFAOYSA-N dichlorodifluoromethane Chemical compound FC(F)(Cl)Cl PXBRQCKWGAHEHS-UHFFFAOYSA-N 0.000 description 1
- 230000009977 dual effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000012495 reaction gas Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
Landscapes
- Photoreceptors In Electrophotography (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19960881A JPS58101735A (ja) | 1981-12-11 | 1981-12-11 | プラズマｃｖｄ装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19960881A JPS58101735A (ja) | 1981-12-11 | 1981-12-11 | プラズマｃｖｄ装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS58101735A JPS58101735A (ja) | 1983-06-17 |
| JPH0152052B2 true JPH0152052B2 (enrdf_load_stackoverflow) | 1989-11-07 |
Family
ID=16410685
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19960881A Granted JPS58101735A (ja) | 1981-12-11 | 1981-12-11 | プラズマｃｖｄ装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS58101735A (enrdf_load_stackoverflow) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6024378A (ja) * | 1983-07-19 | 1985-02-07 | Kyocera Corp | 量産型グロ−放電分解装置 |
| JPS6029470A (ja) * | 1983-07-27 | 1985-02-14 | Kyocera Corp | 量産型グロ−放電分解装置 |
| JPS6036664A (ja) * | 1983-09-26 | 1985-02-25 | Kyocera Corp | 量産型グロー放電分解装置 |
| JPS6088955A (ja) * | 1983-10-21 | 1985-05-18 | Stanley Electric Co Ltd | プラズマｃｖｄ装置 |
-
1981
- 1981-12-11 JP JP19960881A patent/JPS58101735A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS58101735A (ja) | 1983-06-17 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH03166373A (ja) | インライン型ｃｖｄ装置 | |
| US4972799A (en) | Microwave plasma chemical vapor deposition apparatus for mass-producing functional deposited films | |
| JPH0152052B2 (enrdf_load_stackoverflow) | ||
| JPS6010618A (ja) | プラズマｃｖｄ装置 | |
| JPH0366819B2 (enrdf_load_stackoverflow) | ||
| JPS6242028B2 (enrdf_load_stackoverflow) | ||
| JPS6239532B2 (enrdf_load_stackoverflow) | ||
| JPH01137621A (ja) | 気相成長装置 | |
| JPH01100275A (ja) | マイクロ波プラズマｃｖｄ法による機能性堆積膜形成装置 | |
| JPH0124866B2 (enrdf_load_stackoverflow) | ||
| JPS6115974A (ja) | プラズマｃｖｄ装置 | |
| JPS6242026B2 (enrdf_load_stackoverflow) | ||
| JPH0341722A (ja) | 薄膜製造装置 | |
| JPS6126777A (ja) | プラズマｃｖｄ装置 | |
| JPS6126779A (ja) | プラズマｃｖｄ装置 | |
| JPS6126778A (ja) | プラズマｃｖｄ装置 | |
| JPS616278A (ja) | プラズマｃｖｄ装置 | |
| JPS59219927A (ja) | プラズマｃｖｄ装置 | |
| JP2620782B2 (ja) | プラズマｃｖｄ法による堆積膜形成装置 | |
| JPS6242027B2 (enrdf_load_stackoverflow) | ||
| JPS6126776A (ja) | プラズマｃｖｄ装置 | |
| JPS58154226A (ja) | プラズマｃｖｄ装置 | |
| JPH09246259A (ja) | 薄膜形成方法及び装置 | |
| JPH0351971Y2 (enrdf_load_stackoverflow) | ||
| JPS6010619A (ja) | グロ−放電による膜形成方法 |