JPH0351971Y2 - - Google Patents

Info

Publication number
JPH0351971Y2
JPH0351971Y2 JP1988062572U JP6257288U JPH0351971Y2 JP H0351971 Y2 JPH0351971 Y2 JP H0351971Y2 JP 1988062572 U JP1988062572 U JP 1988062572U JP 6257288 U JP6257288 U JP 6257288U JP H0351971 Y2 JPH0351971 Y2 JP H0351971Y2
Authority
JP
Japan
Prior art keywords
electrode
plate electrode
flat plate
substrate
reaction chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1988062572U
Other languages
English (en)
Japanese (ja)
Other versions
JPH01125530U (enrdf_load_stackoverflow
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988062572U priority Critical patent/JPH0351971Y2/ja
Publication of JPH01125530U publication Critical patent/JPH01125530U/ja
Application granted granted Critical
Publication of JPH0351971Y2 publication Critical patent/JPH0351971Y2/ja
Expired legal-status Critical Current

Links

JP1988062572U 1988-05-12 1988-05-12 Expired JPH0351971Y2 (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988062572U JPH0351971Y2 (enrdf_load_stackoverflow) 1988-05-12 1988-05-12

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988062572U JPH0351971Y2 (enrdf_load_stackoverflow) 1988-05-12 1988-05-12

Publications (2)

Publication Number Publication Date
JPH01125530U JPH01125530U (enrdf_load_stackoverflow) 1989-08-28
JPH0351971Y2 true JPH0351971Y2 (enrdf_load_stackoverflow) 1991-11-08

Family

ID=31288175

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988062572U Expired JPH0351971Y2 (enrdf_load_stackoverflow) 1988-05-12 1988-05-12

Country Status (1)

Country Link
JP (1) JPH0351971Y2 (enrdf_load_stackoverflow)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4445111B2 (ja) * 2000-09-12 2010-04-07 株式会社神戸製鋼所 プラズマ表面処理装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5265184A (en) * 1975-11-26 1977-05-30 Nippon Telegr & Teleph Corp <Ntt> Eqipment for simultaneous sputtering at both surface
US4116806A (en) * 1977-12-08 1978-09-26 Battelle Development Corporation Two-sided planar magnetron sputtering apparatus
JPS6034633B2 (ja) * 1978-06-26 1985-08-09 株式会社日立製作所 プラズマ気相反応装置
JPS5527626A (en) * 1978-08-17 1980-02-27 Murata Manufacturing Co Electronic part magazine container
JPS5559727A (en) * 1978-10-27 1980-05-06 Hitachi Ltd Plasma deposition device
US4194962A (en) * 1978-12-20 1980-03-25 Advanced Coating Technology, Inc. Cathode for sputtering
FR2463975A1 (fr) * 1979-08-22 1981-02-27 Onera (Off Nat Aerospatiale) Procede et appareil pour la gravure chimique par voie seche des circuits integres
JPS5927212B2 (ja) * 1979-09-25 1984-07-04 三菱電機株式会社 プラズマ反応装置
JPS5681923A (en) * 1979-12-06 1981-07-04 Sumitomo Electric Ind Ltd Manufacture of thin film
DD153497A3 (de) * 1980-02-08 1982-01-13 Georg Rudakoff Verfahren und vorrichtung zum plasmaaetzen oder zur plasma cvd
JPS56114387A (en) * 1980-02-13 1981-09-08 Sanyo Electric Co Ltd Manufacture of photovoltaic force element
US4400409A (en) * 1980-05-19 1983-08-23 Energy Conversion Devices, Inc. Method of making p-doped silicon films
JPS5767020A (en) * 1980-10-15 1982-04-23 Agency Of Ind Science & Technol Thin silicon film and its manufacture
JPS5778546A (en) * 1980-11-05 1982-05-17 Stanley Electric Co Ltd Production of photoconductive silicon layer
JPS5784137A (en) * 1980-11-14 1982-05-26 Matsushita Electric Ind Co Ltd Plasma chemical evaporation
JPS5789217A (en) * 1980-11-26 1982-06-03 Seiko Epson Corp Manufacturing device of semiconductor
US4423701A (en) * 1982-03-29 1984-01-03 Energy Conversion Devices, Inc. Glow discharge deposition apparatus including a non-horizontally disposed cathode

Also Published As

Publication number Publication date
JPH01125530U (enrdf_load_stackoverflow) 1989-08-28

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