JPS6021523A - マスク欠陥検査方法 - Google Patents

マスク欠陥検査方法

Info

Publication number
JPS6021523A
JPS6021523A JP58128913A JP12891383A JPS6021523A JP S6021523 A JPS6021523 A JP S6021523A JP 58128913 A JP58128913 A JP 58128913A JP 12891383 A JP12891383 A JP 12891383A JP S6021523 A JPS6021523 A JP S6021523A
Authority
JP
Japan
Prior art keywords
mask
mark
signal
defect inspection
contraction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP58128913A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6352452B2 (OSRAM
Inventor
Osamu Ikenaga
修 池永
Ryoichi Yoshikawa
良一 吉川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP58128913A priority Critical patent/JPS6021523A/ja
Priority to DD84265112A priority patent/DD219567A5/de
Priority to EP84304754A priority patent/EP0132122B1/en
Priority to DE8484304754T priority patent/DE3475107D1/de
Publication of JPS6021523A publication Critical patent/JPS6021523A/ja
Publication of JPS6352452B2 publication Critical patent/JPS6352452B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
    • G03F1/82—Auxiliary processes, e.g. cleaning or inspecting
    • G03F1/84—Inspecting
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects
    • H10P95/00—

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Length Measuring Devices By Optical Means (AREA)
JP58128913A 1983-07-15 1983-07-15 マスク欠陥検査方法 Granted JPS6021523A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58128913A JPS6021523A (ja) 1983-07-15 1983-07-15 マスク欠陥検査方法
DD84265112A DD219567A5 (de) 1983-07-15 1984-07-10 Verfahren und geraet fuer die fehlerpruefung von uebertragungsmasken von leitungsmustern integrierter schaltungen
EP84304754A EP0132122B1 (en) 1983-07-15 1984-07-11 Apparatus for inspecting mask for use in manufacturing large scale integrated circuits
DE8484304754T DE3475107D1 (en) 1983-07-15 1984-07-11 Apparatus for inspecting mask for use in manufacturing large scale integrated circuits

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58128913A JPS6021523A (ja) 1983-07-15 1983-07-15 マスク欠陥検査方法

Publications (2)

Publication Number Publication Date
JPS6021523A true JPS6021523A (ja) 1985-02-02
JPS6352452B2 JPS6352452B2 (OSRAM) 1988-10-19

Family

ID=14996461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58128913A Granted JPS6021523A (ja) 1983-07-15 1983-07-15 マスク欠陥検査方法

Country Status (4)

Country Link
EP (1) EP0132122B1 (OSRAM)
JP (1) JPS6021523A (OSRAM)
DD (1) DD219567A5 (OSRAM)
DE (1) DE3475107D1 (OSRAM)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289336A (ja) * 1985-10-16 1987-04-23 Hitachi Ltd 半導体用基板上の異物検出装置
JPS63191041A (ja) * 1987-02-03 1988-08-08 Komori Printing Mach Co Ltd 濃度測定位置合わせ方法
US5048094A (en) * 1988-11-29 1991-09-10 Nippon Seiko Kabushiki Kaisha Method and apparatus for checking pattern
JPH0473766A (ja) * 1990-07-16 1992-03-09 Toshiba Corp プロキシミティ露光装置
JPH055981A (ja) * 1991-06-27 1993-01-14 Ushio Inc フイルム露光装置におけるマスクの精度の測定方法
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法
JP2008014700A (ja) * 2006-07-04 2008-01-24 Olympus Corp ワークの検査方法及びワーク検査装置
JP2008160855A (ja) * 1992-09-28 2008-07-10 Olympus Corp 情報取扱装置及び情報取扱方法

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2587489B1 (fr) * 1985-09-16 1988-07-08 Bertin & Cie Procede de controle optique automatique d'objets tels que des circuits integres
GB8612088D0 (en) * 1986-05-19 1986-06-25 Marconi Instruments Ltd Pattern alignment generator
US4867566A (en) * 1988-03-07 1989-09-19 The Gerber Scientific Instrument Company Method and apparatus for calibrating artwork from a direct imaging system
GB2264779B (en) * 1992-02-20 1996-05-01 Thermoteknix Systems Ltd Monitoring changes in image characteristics
LT3299B (en) 1993-05-07 1995-06-26 Alvydas Pikunas Stable petrol-ethanol-water fuel composition
DE19623192C2 (de) * 1996-06-11 2000-08-03 Aristo Graphic Systeme Verfahren zur Ermittlung von Meßwerten aus einer abzutastenden Vorlage und Bearbeitungsplotter zu dessen Durchführung
US6211505B1 (en) * 1997-12-25 2001-04-03 Nec Corporation Method and apparatus for checking shape
TWI497055B (zh) * 2010-07-30 2015-08-21 Ｈｏｙａ股份有限公司 透過率測定裝置、光罩之透過率檢查裝置、透過率檢查方法、光罩製造方法、圖案轉印方法、光罩製品
US20130243715A1 (en) * 2010-11-24 2013-09-19 L'oreal S.A. Compositions containing acrylic thickener and oil

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837923A (ja) * 1981-08-31 1983-03-05 Toshiba Corp フオトマスクの検査装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2076533A (en) * 1980-05-20 1981-12-02 Aerodyne Research Inc Mask Analysis
DE3070721D1 (en) * 1980-12-18 1985-07-04 Ibm Process for inspecting and automatically classifying objects presenting configurations with dimensional tolerances and variable rejecting criteria depending on placement, apparatus and circuits therefor
JPS57198627A (en) * 1981-06-01 1982-12-06 Fujitsu Ltd Reticle
JPS5963725A (ja) * 1982-10-05 1984-04-11 Toshiba Corp パタ−ン検査装置
JPS59119204A (ja) * 1982-12-27 1984-07-10 Toshiba Corp マ−ク位置検出方法

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5837923A (ja) * 1981-08-31 1983-03-05 Toshiba Corp フオトマスクの検査装置

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6289336A (ja) * 1985-10-16 1987-04-23 Hitachi Ltd 半導体用基板上の異物検出装置
JPS63191041A (ja) * 1987-02-03 1988-08-08 Komori Printing Mach Co Ltd 濃度測定位置合わせ方法
US5048094A (en) * 1988-11-29 1991-09-10 Nippon Seiko Kabushiki Kaisha Method and apparatus for checking pattern
JPH0473766A (ja) * 1990-07-16 1992-03-09 Toshiba Corp プロキシミティ露光装置
JPH055981A (ja) * 1991-06-27 1993-01-14 Ushio Inc フイルム露光装置におけるマスクの精度の測定方法
JP2008160855A (ja) * 1992-09-28 2008-07-10 Olympus Corp 情報取扱装置及び情報取扱方法
JPH07261371A (ja) * 1994-03-16 1995-10-13 Nec Corp 半導体素子製造用レチクルおよび露光装置におけるレチクル製造誤差の補正方法
JP2008014700A (ja) * 2006-07-04 2008-01-24 Olympus Corp ワークの検査方法及びワーク検査装置

Also Published As

Publication number Publication date
EP0132122A3 (en) 1985-09-18
DE3475107D1 (en) 1988-12-15
JPS6352452B2 (OSRAM) 1988-10-19
EP0132122B1 (en) 1988-11-09
DD219567A5 (de) 1985-03-06
EP0132122A2 (en) 1985-01-23

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