JPS60194067A - 硬質膜の形成方法 - Google Patents

硬質膜の形成方法

Info

Publication number
JPS60194067A
JPS60194067A JP4926884A JP4926884A JPS60194067A JP S60194067 A JPS60194067 A JP S60194067A JP 4926884 A JP4926884 A JP 4926884A JP 4926884 A JP4926884 A JP 4926884A JP S60194067 A JPS60194067 A JP S60194067A
Authority
JP
Japan
Prior art keywords
rotating body
substrate
forming
hard film
hard
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4926884A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6338428B2 (enExample
Inventor
Nobushige Mineta
峰田　進栄
Nobuo Yasunaga
安永　暢男
Noboru Tarumi
樽見　昇
Akira Obara
明 小原
Masayuki Ikeda
正幸 池田
Junichi Sato
純一 佐藤
Takeshi Sadahiro
貞廣　孟史
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology
Tungaloy Corp
Resonac Holdings Corp
Original Assignee
Agency of Industrial Science and Technology
Showa Denko KK
Toshiba Tungaloy Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology, Showa Denko KK, Toshiba Tungaloy Co Ltd filed Critical Agency of Industrial Science and Technology
Priority to JP4926884A priority Critical patent/JPS60194067A/ja
Publication of JPS60194067A publication Critical patent/JPS60194067A/ja
Publication of JPS6338428B2 publication Critical patent/JPS6338428B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/28—Vacuum evaporation by wave energy or particle radiation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP4926884A 1984-03-16 1984-03-16 硬質膜の形成方法 Granted JPS60194067A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4926884A JPS60194067A (ja) 1984-03-16 1984-03-16 硬質膜の形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4926884A JPS60194067A (ja) 1984-03-16 1984-03-16 硬質膜の形成方法

Publications (2)

Publication Number Publication Date
JPS60194067A true JPS60194067A (ja) 1985-10-02
JPS6338428B2 JPS6338428B2 (enExample) 1988-07-29

Family

ID=12826085

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4926884A Granted JPS60194067A (ja) 1984-03-16 1984-03-16 硬質膜の形成方法

Country Status (1)

Country Link
JP (1) JPS60194067A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320454A (ja) * 1986-07-14 1988-01-28 Nippon Kokan Kk <Nkk> 蒸着装置
WO1996010324A1 (en) * 1994-09-26 1996-04-04 Fom-Instituut Voor Plasmafysica Rijnhuizen Laser target for use in an apparatus for generating radiation and atomic particles
US5786129A (en) * 1997-01-13 1998-07-28 Presstek, Inc. Laser-imageable recording constructions utilizing controlled, self-propagating exothermic chemical reaction mechanisms
JP2004238701A (ja) * 2003-02-07 2004-08-26 Dainippon Printing Co Ltd イオンプレーティング装置およびこれを用いた成膜方法
JP2008255481A (ja) * 2007-03-09 2008-10-23 Mitsubishi Materials Corp 蒸着材
JP2009041219A (ja) * 2007-08-07 2009-02-26 Toyoda Gosei Co Ltd 車両用小物入れのロック装置
WO2017025662A1 (en) * 2015-08-10 2017-02-16 Picodeon Ltd Oy Method for manufacturing thin films by laser ablation by applying laser pulses with a rotating target

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158377A (en) * 1981-03-27 1982-09-30 Ishikawajima Harima Heavy Ind Co Ltd Plating device for inside surface of pipe utilizing laser beam

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57158377A (en) * 1981-03-27 1982-09-30 Ishikawajima Harima Heavy Ind Co Ltd Plating device for inside surface of pipe utilizing laser beam

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6320454A (ja) * 1986-07-14 1988-01-28 Nippon Kokan Kk <Nkk> 蒸着装置
WO1996010324A1 (en) * 1994-09-26 1996-04-04 Fom-Instituut Voor Plasmafysica Rijnhuizen Laser target for use in an apparatus for generating radiation and atomic particles
NL9401560A (nl) * 1994-09-26 1996-05-01 Rijnhuizen Plasmafysica Werkwijze en inrichting voor het generen van straling en atomaire deeltjes.
US5786129A (en) * 1997-01-13 1998-07-28 Presstek, Inc. Laser-imageable recording constructions utilizing controlled, self-propagating exothermic chemical reaction mechanisms
JP2004238701A (ja) * 2003-02-07 2004-08-26 Dainippon Printing Co Ltd イオンプレーティング装置およびこれを用いた成膜方法
JP2008255481A (ja) * 2007-03-09 2008-10-23 Mitsubishi Materials Corp 蒸着材
JP2009041219A (ja) * 2007-08-07 2009-02-26 Toyoda Gosei Co Ltd 車両用小物入れのロック装置
WO2017025662A1 (en) * 2015-08-10 2017-02-16 Picodeon Ltd Oy Method for manufacturing thin films by laser ablation by applying laser pulses with a rotating target

Also Published As

Publication number Publication date
JPS6338428B2 (enExample) 1988-07-29

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term