JPS60191735A - 静電チヤツク - Google Patents
静電チヤツクInfo
- Publication number
- JPS60191735A JPS60191735A JP4530984A JP4530984A JPS60191735A JP S60191735 A JPS60191735 A JP S60191735A JP 4530984 A JP4530984 A JP 4530984A JP 4530984 A JP4530984 A JP 4530984A JP S60191735 A JPS60191735 A JP S60191735A
- Authority
- JP
- Japan
- Prior art keywords
- film
- electrode
- processed article
- dielectric film
- processed
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000009825 accumulation Methods 0.000 abstract description 5
- 230000002093 peripheral effect Effects 0.000 abstract 2
- 238000001816 cooling Methods 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- 239000000498 cooling water Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 230000005611 electricity Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 241000257465 Echinoidea Species 0.000 description 1
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007123 defense Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000013507 mapping Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
Landscapes
- Jigs For Machine Tools (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4530984A JPS60191735A (ja) | 1984-03-09 | 1984-03-09 | 静電チヤツク |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP4530984A JPS60191735A (ja) | 1984-03-09 | 1984-03-09 | 静電チヤツク |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60191735A true JPS60191735A (ja) | 1985-09-30 |
JPH0145223B2 JPH0145223B2 (enrdf_load_stackoverflow) | 1989-10-03 |
Family
ID=12715709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP4530984A Granted JPS60191735A (ja) | 1984-03-09 | 1984-03-09 | 静電チヤツク |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60191735A (enrdf_load_stackoverflow) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278846A (ja) * | 1985-10-01 | 1987-04-11 | Tokyo Electron Ltd | 半導体ウエハ処理装置 |
JPS6286837A (ja) * | 1985-10-14 | 1987-04-21 | Tokyo Electron Ltd | ウエハ処理装置 |
-
1984
- 1984-03-09 JP JP4530984A patent/JPS60191735A/ja active Granted
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6278846A (ja) * | 1985-10-01 | 1987-04-11 | Tokyo Electron Ltd | 半導体ウエハ処理装置 |
JPS6286837A (ja) * | 1985-10-14 | 1987-04-21 | Tokyo Electron Ltd | ウエハ処理装置 |
Also Published As
Publication number | Publication date |
---|---|
JPH0145223B2 (enrdf_load_stackoverflow) | 1989-10-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4666219B2 (ja) | コンテナ | |
TW506033B (en) | Holding apparatus for object to be processed | |
US4569745A (en) | Sputtering apparatus | |
US5255153A (en) | Electrostatic chuck and plasma apparatus equipped therewith | |
JPH0119253B2 (enrdf_load_stackoverflow) | ||
US10370757B2 (en) | Thin substrate processing device | |
JP3225850B2 (ja) | 静電吸着電極およびその製作方法 | |
JPWO2020045286A1 (ja) | クリーニング装置 | |
JPH0652758B2 (ja) | 静電チヤツク | |
JP2000049143A (ja) | プラズマ処理装置 | |
JPS60191735A (ja) | 静電チヤツク | |
JP2767282B2 (ja) | 基板保持装置 | |
KR20020008791A (ko) | 플라스틱 필름의 정전 흡착 장치 및 정전 흡착 방법 | |
JPH10303286A (ja) | 静電チャック及び半導体製造装置 | |
JPH01200625A (ja) | 半導体ウェーハ処理装置 | |
JPH1116996A (ja) | 静電チャック装置及び載置台 | |
JPH1154604A (ja) | ウエハステージからのウエハ脱着方法 | |
JPH0855903A (ja) | 耐腐食性静電チャック | |
JPH0964160A (ja) | 半導体製造方法および装置 | |
JP2000216228A (ja) | 基板固定台 | |
JPS6325706B2 (enrdf_load_stackoverflow) | ||
JPH11162694A (ja) | 放電用部品及びプラズマ装置 | |
JP2003266354A (ja) | バキュームチャック | |
JPS6336138B2 (enrdf_load_stackoverflow) | ||
JPS61257733A (ja) | 静電チヤツク |