JPWO2020045286A1 - クリーニング装置 - Google Patents
クリーニング装置 Download PDFInfo
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Abstract
Description
図1には、本発明に係るクリーニング装置の一例が示されている。このクリーニング装置は、図1(b)の断面図で示したように、シリコンウエハやアルミナ等からなる円板状の基体部1の一方の面(裏面)に異物吸着部4が設けられ、もう一方の面(表面)に吸着制御部5が設けられている。また、基体部1の裏面には、異物吸着部4の外側において、基体部1を円周方向に略4等分する位置に4つの突起部6が備え付けられている。
Qci=Qcf+QESC ・・・(1)
また、静電容量の関係式Q=CVを用いて上記式(1)を書き換えると、下記式(2)及び(3)で表すことができる。
CCVi=CCVf+CESCVf ・・・(2)
Vf=〔CC/(CC+CESC)〕Vi ・・・(3)
Vf=〔10CESC/(10CESC+CESC)〕Vi=(10/11)Vi=0.91Vi ・・・(4)
一方で、実際に静電容量CCが吸着電極3の静電容量CESCの約11倍のコンデンサ9を使って、コンデンサ9から吸着電極3に放電した場合の吸着電極3の表面電位を調べたところ、コンデンサ9を介さずに吸着電極3を直接外部電源13に接続したときの吸着電極3の表面電位の約0.7倍になることを確認した。コンデンサ9を介した場合の表面電位の低下について、その理由としては電荷の漏れや抵抗によるロス等が考えられるが、上記(4)の計算結果を踏まえると、ほぼ想定したとおりに、コンデンサ9からの放電により吸着電極3を帯電させることができると言える。
真空処理室内で発現する静電吸着力を比較するために、大気圧下で吸着電極を帯電させた場合の静電吸着力と、真空下で吸着電極を帯電させた場合の静電吸着力について、次のようにして吸着力を測定する試験を行った。図12には、この試験で使用した試験装置が示されており、図示外のロータリーポンプと接続した真空チャンバー23内に試験用クリーニング装置を配しており、試験用クリーニング装置の上方には、50mm×48mmサイズ(24cm2)に切り出したシリコンウエハ24が取り付けられたロードセル25が設けられている。試験用クリーニング装置は、約120mm×120mm、厚さ約5mmのアルミ製ベース(基体部)1の上面に異物吸着部4を備えており、反対側のアルミ製ベース1の下面には両面テープ26が貼られて、真空チャンバー23の内壁底面部に固定されている。なお、シリコンウエハ24については、破損を防ぐために(ウエハの割れや欠けによる真空チャンバー内の汚染を防ぐために)、試験用クリーニング装置に対向する面とは反対側にポリイミド製の保護フィルムを貼着した。
吸着電極を帯電させたときの表面電位について、大気圧で維持する大気圧維持条件の場合と、大気圧から真空にして再び大気圧に戻す真空経由条件の場合とを比較するために、次のようにして表面電位を測定する試験を行った。なお、使用した表面電位測定装置(春日電機社製KSD-3000)の都合上、真空下で表面電位を測定することができなかったため、ここでは上記のような条件を採用した。
先ず、クリーニング装置を終始大気圧で維持する場合について、(1)リードスイッチ28a、28bの入力端子側に図示外の高電圧電源を接続し、リードスイッチ28a、28bをオンにして吸着電極3(3a、3b)に直流±3.5kVを印加して、この電圧印加の状態で異物吸着部4の表面電位を測定した〔測定(i)〕。次に、(2)リードスイッチ28a、28bをオフにすると共に、高電圧電源をオフにしてから、リードスイッチ28a、28bから高電圧電源を切り離し、リードスイッチをオフにした直後の異物吸着部4の表面電位を測定した〔測定(ii)〕。次に、(3)この試験用クリーニング装置を図示外のロータリーポンプと接続した真空チャンバー23内に入れて、大気圧状態のままで5分間待機した。最後に、(4)試験用クリーニング装置を真空チャンバー23から取り出し、(2)でリードスイッチ28a、28bをオフにしてから10分経過したタイミングで異物吸着部4の表面電位を測定した〔測定(iii)〕。
Claims (11)
- 半導体製造装置の真空処理室内における異物を除去するためのクリーニング装置であって、
一対の電極からなる吸着電極が絶縁体の内部に設けられた異物吸着部と、制御スイッチをオンにして前記吸着電極を帯電させ、前記絶縁体の表面に静電吸着力を発現させて異物を吸着可能にする吸着制御部とを備えており、
前記吸着制御部の制御スイッチが外部操作可能な遠隔操作型のスイッチであり、真空状態で閉ざされた真空閉空間内の該クリーニング装置に対して制御スイッチをオンにすることで、真空状態で発現させた静電吸着力により真空処理室内の異物を除去することができることを特徴とするクリーニング装置。 - 前記吸着制御部が、外部電源との接続端子と、外部電源の電圧により充電されて電荷が蓄えられるコンデンサと、コンデンサに蓄えられた電荷を放電して吸着電極を帯電させるための放電スイッチとを備えていると共に、該放電スイッチが前記制御スイッチを構成し、
大気圧下で前記接続端子に外部電源を接続して前記コンデンサを充電した上で、該クリーニング装置を真空閉空間内に配して前記放電スイッチをオンにすることで、真空状態で静電吸着力を発現させる請求項1に記載のクリーニング装置。 - 前記放電スイッチが、磁力で動作するリードスイッチであり、該リードスイッチにはコンデンサと吸着電極との間での伝導電流が通電する請求項2に記載のクリーニング装置。
- 前記放電スイッチが、ソリッドステートリレーと、ソリッドステートリレーを作動させる電池と、これらを接続する回路スイッチとを有したスイッチング回路からなり、該回路スイッチが、タイマー式スイッチ、レーザー感知式スイッチ、及び磁力で動作するリードスイッチからなる群から選ばれたいずれかの遠隔操作型スイッチである請求項2に記載のクリーニング装置。
- 前記吸着制御部が、電圧を昇圧する昇圧回路と、昇圧回路を作動させる電池と、昇圧回路からの高電圧出力により吸着電極を帯電させるための電圧印加スイッチとを備えていると共に、該電圧印加スイッチが前記制御スイッチを構成し、
該クリーニング装置を真空閉空間内に配して電圧印加スイッチをオンにすることで、真空状態で静電吸着力を発現させる請求項1に記載のクリーニング装置。 - 前記電圧印加スイッチが、タイマー式スイッチ、レーザー感知式スイッチ、及び磁力で動作するリードスイッチからなる群から選ばれたいずれかの遠隔操作型スイッチである請求項5に記載のクリーニング装置。
- 前記吸着制御部が、昇圧回路と吸着電極との間にダイオードを有して、昇圧回路からの高電圧出力による吸着電極の帯電が整流作用により維持される請求項5又は6に記載のクリーニング装置。
- 前記吸着制御部が、帯電した吸着電極の電荷を逃がすためのGND端子と、吸着電極とGND端子との間を接続するGNDスイッチとを備えており、真空処理室内の異物を吸着した後、GNDスイッチをオンにすることで、異物吸着部の絶縁体の表面から異物を取り除くことができる請求項1〜7のいずれかに記載のクリーニング装置。
- 前記異物吸着部及び吸着制御部が、基体部の一方の面に一体的に設けられており、異物吸着部の絶縁体を真空処理室内のウエハ載置台と対向するように配して、ウエハ載置台上の異物を除去する請求項1〜8のいずれかに記載のクリーニング装置。
- 前記異物吸着部における絶縁体の表面とウエハ載置台との間が互いに離間するための突起部を更に備える請求項9に記載のクリーニング装置。
- 前記異物吸着部における絶縁体の表面が、粘着性を有した粘着層を備える請求項10に記載のクリーニング装置。
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