JPS60175452A - トランジスタの製造方法 - Google Patents
トランジスタの製造方法Info
- Publication number
- JPS60175452A JPS60175452A JP59030653A JP3065384A JPS60175452A JP S60175452 A JPS60175452 A JP S60175452A JP 59030653 A JP59030653 A JP 59030653A JP 3065384 A JP3065384 A JP 3065384A JP S60175452 A JPS60175452 A JP S60175452A
- Authority
- JP
- Japan
- Prior art keywords
- film
- semiconductor layer
- region
- base
- polycrystalline silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 8
- 239000012535 impurity Substances 0.000 claims abstract description 24
- 239000004065 semiconductor Substances 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 14
- 238000005530 etching Methods 0.000 claims description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 abstract description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract description 18
- 229910052814 silicon oxide Inorganic materials 0.000 abstract description 18
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 8
- 229910052710 silicon Inorganic materials 0.000 abstract description 8
- 239000010703 silicon Substances 0.000 abstract description 8
- 229910052796 boron Inorganic materials 0.000 abstract description 4
- -1 boron ions Chemical class 0.000 abstract description 4
- 239000000758 substrate Substances 0.000 abstract description 4
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052782 aluminium Inorganic materials 0.000 abstract description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 abstract description 2
- 229910052785 arsenic Inorganic materials 0.000 abstract description 2
- 239000013078 crystal Substances 0.000 abstract description 2
- 229910052751 metal Inorganic materials 0.000 abstract description 2
- 239000002184 metal Substances 0.000 abstract description 2
- 238000004904 shortening Methods 0.000 abstract 1
- 230000015572 biosynthetic process Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 238000005468 ion implantation Methods 0.000 description 2
- 230000001590 oxidative effect Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 230000003321 amplification Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 229920006268 silicone film Polymers 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59030653A JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59030653A JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60175452A true JPS60175452A (ja) | 1985-09-09 |
JPH0464179B2 JPH0464179B2 (enrdf_load_stackoverflow) | 1992-10-14 |
Family
ID=12309747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59030653A Granted JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60175452A (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62150746A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPS62150748A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPS63207154A (ja) * | 1987-02-23 | 1988-08-26 | Nec Corp | 半導体装置の製造方法 |
JPH03256332A (ja) * | 1990-03-06 | 1991-11-15 | Sharp Corp | 縦型バイポーラトランジスタ素子及び該素子を備えたbi―CMOSインバータ |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427774A (en) * | 1977-08-03 | 1979-03-02 | Nec Corp | Semiconductor device |
JPS5470776A (en) * | 1977-11-16 | 1979-06-06 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and its manufacture |
JPS57128063A (en) * | 1981-01-30 | 1982-08-09 | Toshiba Corp | Semiconductor device and manufacture thereof |
-
1984
- 1984-02-20 JP JP59030653A patent/JPS60175452A/ja active Granted
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427774A (en) * | 1977-08-03 | 1979-03-02 | Nec Corp | Semiconductor device |
JPS5470776A (en) * | 1977-11-16 | 1979-06-06 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and its manufacture |
JPS57128063A (en) * | 1981-01-30 | 1982-08-09 | Toshiba Corp | Semiconductor device and manufacture thereof |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62150746A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPS62150748A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPS63207154A (ja) * | 1987-02-23 | 1988-08-26 | Nec Corp | 半導体装置の製造方法 |
JPH03256332A (ja) * | 1990-03-06 | 1991-11-15 | Sharp Corp | 縦型バイポーラトランジスタ素子及び該素子を備えたbi―CMOSインバータ |
Also Published As
Publication number | Publication date |
---|---|
JPH0464179B2 (enrdf_load_stackoverflow) | 1992-10-14 |
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