JPH0464179B2 - - Google Patents
Info
- Publication number
- JPH0464179B2 JPH0464179B2 JP59030653A JP3065384A JPH0464179B2 JP H0464179 B2 JPH0464179 B2 JP H0464179B2 JP 59030653 A JP59030653 A JP 59030653A JP 3065384 A JP3065384 A JP 3065384A JP H0464179 B2 JPH0464179 B2 JP H0464179B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- region
- base
- polycrystalline semiconductor
- forming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
- H10D48/30—Devices controlled by electric currents or voltages
- H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H10D48/34—Bipolar devices
- H10D48/345—Bipolar transistors having ohmic electrodes on emitter-like, base-like, and collector-like regions
Landscapes
- Bipolar Transistors (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59030653A JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP59030653A JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS60175452A JPS60175452A (ja) | 1985-09-09 |
JPH0464179B2 true JPH0464179B2 (enrdf_load_stackoverflow) | 1992-10-14 |
Family
ID=12309747
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP59030653A Granted JPS60175452A (ja) | 1984-02-20 | 1984-02-20 | トランジスタの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS60175452A (enrdf_load_stackoverflow) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62150746A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JPS62150748A (ja) * | 1985-12-24 | 1987-07-04 | Rohm Co Ltd | 半導体装置の配線形成方法 |
JP2641856B2 (ja) * | 1987-02-23 | 1997-08-20 | 日本電気株式会社 | 半導体装置の製造方法 |
JPH03256332A (ja) * | 1990-03-06 | 1991-11-15 | Sharp Corp | 縦型バイポーラトランジスタ素子及び該素子を備えたbi―CMOSインバータ |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5427774A (en) * | 1977-08-03 | 1979-03-02 | Nec Corp | Semiconductor device |
JPS5470776A (en) * | 1977-11-16 | 1979-06-06 | Nippon Telegr & Teleph Corp <Ntt> | Semiconductor device and its manufacture |
JPS57128063A (en) * | 1981-01-30 | 1982-08-09 | Toshiba Corp | Semiconductor device and manufacture thereof |
-
1984
- 1984-02-20 JP JP59030653A patent/JPS60175452A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS60175452A (ja) | 1985-09-09 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4036672A (en) | Method of making a junction type field effect transistor | |
KR100275544B1 (ko) | 선택적 컬렉터 박막 성장을 이용한 초자기정렬 바이폴러 트랜지스터의 제조방법 | |
US6642553B1 (en) | Bipolar transistor and method for producing same | |
JPH04321269A (ja) | Mos型半導体装置およびその製造方法 | |
JPH08228001A (ja) | 半導体装置及びその製造方法 | |
JPS60175453A (ja) | トランジスタの製造方法 | |
JPH0464179B2 (enrdf_load_stackoverflow) | ||
EP0042380B1 (en) | Method for achieving ideal impurity base profile in a transistor | |
JPH06302826A (ja) | 絶縁ゲート電界効果トランジスタ及びその製造方法 | |
JPH0464180B2 (enrdf_load_stackoverflow) | ||
JPS61296767A (ja) | 半導体装置の製造方法 | |
JP2546651B2 (ja) | バイポ−ラトランジスタの製造法 | |
JPH01111372A (ja) | 半導体装置の製造方法 | |
JPH0362015B2 (enrdf_load_stackoverflow) | ||
JPS6159871A (ja) | 半導体装置の製造方法 | |
JP2546650B2 (ja) | バイポ−ラトランジスタの製造法 | |
JPH05109745A (ja) | 半導体装置 | |
JPS61224355A (ja) | 半導体装置及びその製造方法 | |
JPH07114208B2 (ja) | トランジスタの製造方法 | |
JPH0137856B2 (enrdf_load_stackoverflow) | ||
JPS6018951A (ja) | 半導体装置の製造法 | |
JPS58216462A (ja) | 半導体装置及びその製造方法 | |
JPS58216466A (ja) | 絶縁ゲ−ト型fetの製造方法 | |
Krimmel et al. | Silicon Nitride in Bipolar Devices (Diodes, Transistors and Thyristors) | |
JPS6269675A (ja) | 半導体装置の製造方法 |