JPS60174863A - 薄膜形成用アルミニウム基材の表面処理方法 - Google Patents

薄膜形成用アルミニウム基材の表面処理方法

Info

Publication number
JPS60174863A
JPS60174863A JP2783984A JP2783984A JPS60174863A JP S60174863 A JPS60174863 A JP S60174863A JP 2783984 A JP2783984 A JP 2783984A JP 2783984 A JP2783984 A JP 2783984A JP S60174863 A JPS60174863 A JP S60174863A
Authority
JP
Japan
Prior art keywords
base material
film
oxide film
thin film
aluminum base
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2783984A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0461068B2 (enExample
Inventor
Kenji Tsukamoto
塚本　建次
Yutaka Kato
豊 加藤
Eizo Isoyama
礒山　永三
Shigemi Tanimoto
谷本　繁美
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Altemira Co Ltd
Original Assignee
Showa Aluminum Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Showa Aluminum Corp filed Critical Showa Aluminum Corp
Priority to JP2783984A priority Critical patent/JPS60174863A/ja
Publication of JPS60174863A publication Critical patent/JPS60174863A/ja
Publication of JPH0461068B2 publication Critical patent/JPH0461068B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/10—Oxidising

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Formation Of Insulating Films (AREA)
  • Photoreceptors In Electrophotography (AREA)
JP2783984A 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法 Granted JPS60174863A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2783984A JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2783984A JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Publications (2)

Publication Number Publication Date
JPS60174863A true JPS60174863A (ja) 1985-09-09
JPH0461068B2 JPH0461068B2 (enExample) 1992-09-29

Family

ID=12232093

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2783984A Granted JPS60174863A (ja) 1984-02-15 1984-02-15 薄膜形成用アルミニウム基材の表面処理方法

Country Status (1)

Country Link
JP (1) JPS60174863A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283953U (enExample) * 1985-11-12 1987-05-28
JPS63301051A (ja) * 1987-06-01 1988-12-08 Fujitsu Ltd 感光体の製造方法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JPH02275467A (ja) * 1989-04-17 1990-11-09 Fuji Electric Co Ltd 電子写真用感光体の製造方法

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56278A (en) * 1979-06-13 1981-01-06 Matsushita Electronics Corp Method and apparatus for plasma ethcing of aluminum
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS57161067A (en) * 1981-03-27 1982-10-04 Mitsubishi Electric Corp Dry etching method for aluminum film
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS56278A (en) * 1979-06-13 1981-01-06 Matsushita Electronics Corp Method and apparatus for plasma ethcing of aluminum
JPS57147644A (en) * 1981-03-10 1982-09-11 Ricoh Co Ltd Photoreceptor for electrophotography
JPS57161067A (en) * 1981-03-27 1982-10-04 Mitsubishi Electric Corp Dry etching method for aluminum film
JPS5811944A (ja) * 1981-07-16 1983-01-22 Ricoh Co Ltd 電子写真用感光体の製造方法
JPS5815239A (ja) * 1981-07-21 1983-01-28 Ricoh Co Ltd 半導体素子
JPS5860747A (ja) * 1981-10-07 1983-04-11 Oki Electric Ind Co Ltd 電子写真感光体

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6283953U (enExample) * 1985-11-12 1987-05-28
JPS63301051A (ja) * 1987-06-01 1988-12-08 Fujitsu Ltd 感光体の製造方法
JPS6479755A (en) * 1987-09-21 1989-03-24 Furukawa Aluminium Drum of photosensitive body for laser beam printer and manufacture of same
JPH02275467A (ja) * 1989-04-17 1990-11-09 Fuji Electric Co Ltd 電子写真用感光体の製造方法

Also Published As

Publication number Publication date
JPH0461068B2 (enExample) 1992-09-29

Similar Documents

Publication Publication Date Title
US5811195A (en) Corrosion-resistant aluminum article for semiconductor processing equipment
JPS60174863A (ja) 薄膜形成用アルミニウム基材の表面処理方法
JPS60174864A (ja) 薄膜形成用アルミニウム基材の表面処理方法
EP0146115B1 (en) Process for producing aluminum material for use in vacuum
JPS60174865A (ja) 薄膜形成用アルミニウム基材の表面処理方法
JP2002226910A (ja) 積み重ねたアルミニウム・インゴット内のインゴットまたはスペーサ・ブロックの処理
JPS605233B2 (ja) 高融点化合物薄膜の製造方法
JPH07201673A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JPS6140747B2 (enExample)
JP3078853B2 (ja) 酸化膜形成方法
KR20010112414A (ko) 보호막 부착 실리콘 보트 및 그 제조방법, 그를 이용하여열처리된 실리콘 웨이퍼
JPH0897185A (ja) 半導体装置の製造方法
CN116918041A (zh) 硅晶圆的清洗方法、硅晶圆的制造方法及硅晶圆
JP4551991B2 (ja) プラズマエッチング方法およびこれを用いて製造された半導体装置
JPS60128259A (ja) 真空用アルミニウム材の製造法
JP3337506B2 (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
US11776805B2 (en) Selective oxidation and simplified pre-clean
JPH06136495A (ja) 電解コンデンサ電極用アルミニウム材料の製造方法
JP2595127B2 (ja) 金属酸化物膜の形成方法及びフォトマスク原板の製造方法
JPH04311550A (ja) 電解コンデンサ電極用アルミニウム箔の製造方法
JPH02177539A (ja) 保管用保護被膜付きシリコンウエハ及びシリコンウエハの保管用保護被膜の形成方法
JP3365098B2 (ja) エピタキシャル半導体ウェーハの製造方法
JP2686190B2 (ja) 酸化物超電導薄膜上のフォトレジストを除去する方法
JPS60159164A (ja) 真空蒸着用アルミニウム基材の製造方法
JPH0328515B2 (enExample)