JPS60162218A - 露光装置 - Google Patents

露光装置

Info

Publication number
JPS60162218A
JPS60162218A JP59016158A JP1615884A JPS60162218A JP S60162218 A JPS60162218 A JP S60162218A JP 59016158 A JP59016158 A JP 59016158A JP 1615884 A JP1615884 A JP 1615884A JP S60162218 A JPS60162218 A JP S60162218A
Authority
JP
Japan
Prior art keywords
light
shutter
pulses
rotation
laser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59016158A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0262940B2 (enExample
Inventor
Hideki Ine
秀樹 稲
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59016158A priority Critical patent/JPS60162218A/ja
Publication of JPS60162218A publication Critical patent/JPS60162218A/ja
Publication of JPH0262940B2 publication Critical patent/JPH0262940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/04—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light by periodically varying the intensity of light, e.g. using choppers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59016158A 1984-02-02 1984-02-02 露光装置 Granted JPS60162218A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Publications (2)

Publication Number Publication Date
JPS60162218A true JPS60162218A (ja) 1985-08-24
JPH0262940B2 JPH0262940B2 (enExample) 1990-12-27

Family

ID=11908695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59016158A Granted JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Country Status (1)

Country Link
JP (1) JPS60162218A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947047A (en) * 1987-02-05 1990-08-07 Canon Kabushiki Kaisha Exposure system with exposure controlling acoustooptic element
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5597670A (en) * 1990-03-09 1997-01-28 Canon Kabushiki Kaisha Exposure method and apparatus
JP2010089094A (ja) * 2008-10-03 2010-04-22 Disco Abrasive Syst Ltd レーザ加工装置

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50766A (enExample) * 1973-05-02 1975-01-07
JPS5046080A (enExample) * 1973-08-28 1975-04-24
JPS5347825A (en) * 1976-10-12 1978-04-28 Toshiba Corp Photoresist exposure
JPS56119646U (enExample) * 1980-02-15 1981-09-11

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50766A (enExample) * 1973-05-02 1975-01-07
JPS5046080A (enExample) * 1973-08-28 1975-04-24
JPS5347825A (en) * 1976-10-12 1978-04-28 Toshiba Corp Photoresist exposure
JPS56119646U (enExample) * 1980-02-15 1981-09-11

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4947047A (en) * 1987-02-05 1990-08-07 Canon Kabushiki Kaisha Exposure system with exposure controlling acoustooptic element
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method
US5597670A (en) * 1990-03-09 1997-01-28 Canon Kabushiki Kaisha Exposure method and apparatus
US5661547A (en) * 1990-03-09 1997-08-26 Canon Kabushiki Kaisha Exposure method and apparatus and device produced thereby in which a stop includes an opening which is variable to substantially compensate for a change in bandwidth of a laser beam
JP2010089094A (ja) * 2008-10-03 2010-04-22 Disco Abrasive Syst Ltd レーザ加工装置

Also Published As

Publication number Publication date
JPH0262940B2 (enExample) 1990-12-27

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