JPH0262940B2 - - Google Patents

Info

Publication number
JPH0262940B2
JPH0262940B2 JP59016158A JP1615884A JPH0262940B2 JP H0262940 B2 JPH0262940 B2 JP H0262940B2 JP 59016158 A JP59016158 A JP 59016158A JP 1615884 A JP1615884 A JP 1615884A JP H0262940 B2 JPH0262940 B2 JP H0262940B2
Authority
JP
Japan
Prior art keywords
light
light source
shutter
laser
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59016158A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60162218A (ja
Inventor
Hideki Ine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP59016158A priority Critical patent/JPS60162218A/ja
Publication of JPS60162218A publication Critical patent/JPS60162218A/ja
Publication of JPH0262940B2 publication Critical patent/JPH0262940B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G02B26/04—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light by periodically varying the intensity of light, e.g. using choppers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP59016158A 1984-02-02 1984-02-02 露光装置 Granted JPS60162218A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59016158A JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Publications (2)

Publication Number Publication Date
JPS60162218A JPS60162218A (ja) 1985-08-24
JPH0262940B2 true JPH0262940B2 (enExample) 1990-12-27

Family

ID=11908695

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59016158A Granted JPS60162218A (ja) 1984-02-02 1984-02-02 露光装置

Country Status (1)

Country Link
JP (1) JPS60162218A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63193130A (ja) * 1987-02-05 1988-08-10 Canon Inc 光量制御装置
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP3175180B2 (ja) * 1990-03-09 2001-06-11 キヤノン株式会社 露光方法及び露光装置
JP2010089094A (ja) * 2008-10-03 2010-04-22 Disco Abrasive Syst Ltd レーザ加工装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50766A (enExample) * 1973-05-02 1975-01-07
JPS5046080A (enExample) * 1973-08-28 1975-04-24
JPS5347825A (en) * 1976-10-12 1978-04-28 Toshiba Corp Photoresist exposure
JPS56119646U (enExample) * 1980-02-15 1981-09-11

Also Published As

Publication number Publication date
JPS60162218A (ja) 1985-08-24

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