JPS60161652A - 半導体立体回路素子の製造方法 - Google Patents
半導体立体回路素子の製造方法Info
- Publication number
- JPS60161652A JPS60161652A JP59016166A JP1616684A JPS60161652A JP S60161652 A JPS60161652 A JP S60161652A JP 59016166 A JP59016166 A JP 59016166A JP 1616684 A JP1616684 A JP 1616684A JP S60161652 A JPS60161652 A JP S60161652A
- Authority
- JP
- Japan
- Prior art keywords
- film
- single crystal
- circuit element
- spinel
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D99/00—Subject matter not provided for in other groups of this subclass
Landscapes
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59016166A JPS60161652A (ja) | 1984-02-02 | 1984-02-02 | 半導体立体回路素子の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59016166A JPS60161652A (ja) | 1984-02-02 | 1984-02-02 | 半導体立体回路素子の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60161652A true JPS60161652A (ja) | 1985-08-23 |
| JPH0336307B2 JPH0336307B2 (enrdf_load_stackoverflow) | 1991-05-31 |
Family
ID=11908919
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59016166A Granted JPS60161652A (ja) | 1984-02-02 | 1984-02-02 | 半導体立体回路素子の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60161652A (enrdf_load_stackoverflow) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5338278A (en) * | 1976-09-20 | 1978-04-08 | Fujitsu Ltd | Semiconductor device |
-
1984
- 1984-02-02 JP JP59016166A patent/JPS60161652A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5338278A (en) * | 1976-09-20 | 1978-04-08 | Fujitsu Ltd | Semiconductor device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0336307B2 (enrdf_load_stackoverflow) | 1991-05-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0774320A (ja) | 半導体装置の製造方法 | |
| JPH02260441A (ja) | 半導体素子 | |
| JPS60161652A (ja) | 半導体立体回路素子の製造方法 | |
| JPS61271839A (ja) | パタ−ン形成方法 | |
| JPH0542825B2 (enrdf_load_stackoverflow) | ||
| JPH0194648A (ja) | 半導体装置 | |
| JPS61166031A (ja) | 絶縁膜のエツチング方法 | |
| JPS59195859A (ja) | 半導体装置の製造方法 | |
| EP0053484B1 (en) | A method for fabricating semiconductor device | |
| JPS61226958A (ja) | 半導体装置およびその製造法 | |
| JPS5966150A (ja) | 半導体装置およびその製造方法 | |
| JPS6279625A (ja) | 半導体装置の製造方法 | |
| JPS62130525A (ja) | 半導体集積回路の製法 | |
| JPH0337740B2 (enrdf_load_stackoverflow) | ||
| JPH0263154A (ja) | 半導体装置の製造方法 | |
| JPS6161546B2 (enrdf_load_stackoverflow) | ||
| JPS60208853A (ja) | 半導体立体回路素子の製造方法 | |
| JPS60161653A (ja) | 半導体立体回路素子の製造方法 | |
| JPH0373137B2 (enrdf_load_stackoverflow) | ||
| JPH0287621A (ja) | 半導体装置の製造方法 | |
| JPH04369854A (ja) | 半導体装置及びその製造方法 | |
| JPS6149439A (ja) | 半導体装置の製造方法 | |
| JPS63117428A (ja) | 半導体装置の製造方法 | |
| JPS58121683A (ja) | 半導体集積回路装置の製造方法 | |
| JPS59151447A (ja) | 半導体装置の製造方法 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |