JPS60154528A - ステージ支持装置 - Google Patents

ステージ支持装置

Info

Publication number
JPS60154528A
JPS60154528A JP59263785A JP26378584A JPS60154528A JP S60154528 A JPS60154528 A JP S60154528A JP 59263785 A JP59263785 A JP 59263785A JP 26378584 A JP26378584 A JP 26378584A JP S60154528 A JPS60154528 A JP S60154528A
Authority
JP
Japan
Prior art keywords
deflection
stage
axis
horizontal
vertical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP59263785A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0334206B2 (enExample
Inventor
グラハム・ジエイ・シダル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Varian Medical Systems Inc
Original Assignee
Varian Associates Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Varian Associates Inc filed Critical Varian Associates Inc
Publication of JPS60154528A publication Critical patent/JPS60154528A/ja
Publication of JPH0334206B2 publication Critical patent/JPH0334206B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23Q—DETAILS, COMPONENTS, OR ACCESSORIES FOR MACHINE TOOLS, e.g. ARRANGEMENTS FOR COPYING OR CONTROLLING; MACHINE TOOLS IN GENERAL CHARACTERISED BY THE CONSTRUCTION OF PARTICULAR DETAILS OR COMPONENTS; COMBINATIONS OR ASSOCIATIONS OF METAL-WORKING MACHINES, NOT DIRECTED TO A PARTICULAR RESULT
    • B23Q1/00—Members which are comprised in the general build-up of a form of machine, particularly relatively large fixed members
    • B23Q1/25—Movable or adjustable work or tool supports
    • B23Q1/26—Movable or adjustable work or tool supports characterised by constructional features relating to the co-operation of relatively movable members; Means for preventing relative movement of such members
    • B23Q1/34—Relative movement obtained by use of deformable elements, e.g. piezoelectric, magnetostrictive, elastic or thermally-dilatable elements
    • B23Q1/36—Springs

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Machine Tool Units (AREA)
JP59263785A 1983-12-21 1984-12-18 ステージ支持装置 Granted JPS60154528A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US06/564,434 US4694477A (en) 1983-12-21 1983-12-21 Flexure stage alignment apparatus
US564434 1983-12-21

Publications (2)

Publication Number Publication Date
JPS60154528A true JPS60154528A (ja) 1985-08-14
JPH0334206B2 JPH0334206B2 (enExample) 1991-05-21

Family

ID=24254461

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59263785A Granted JPS60154528A (ja) 1983-12-21 1984-12-18 ステージ支持装置

Country Status (4)

Country Link
US (1) US4694477A (enExample)
EP (1) EP0147169B1 (enExample)
JP (1) JPS60154528A (enExample)
DE (1) DE3474219D1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017143248A (ja) * 2015-12-31 2017-08-17 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ 半導体処理装置においてシャワーヘッド傾斜を動的に調整するためのアクチュエータ

Families Citing this family (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8601095A (nl) * 1986-04-29 1987-11-16 Philips Nv Positioneerinrichting.
GB8713050D0 (en) * 1987-06-04 1987-07-08 Renishaw Plc Positioning apparatus
IT1221550B (it) * 1987-10-30 1990-07-12 Elleci Trimate Sas Di Cassanel Apparecchiatura perfezionata per la lappatura di interni
US4870668A (en) * 1987-12-30 1989-09-26 Hampshire Instruments, Inc. Gap sensing/adjustment apparatus and method for a lithography machine
US5808435A (en) * 1996-05-28 1998-09-15 Kmy Instruments Micropositioning device for disk head testing system
US5903085A (en) * 1997-06-18 1999-05-11 Phase Metrics, Inc. Piezoelectric nanopositioner
US6355994B1 (en) * 1999-11-05 2002-03-12 Multibeam Systems, Inc. Precision stage
US6555829B1 (en) 2000-01-10 2003-04-29 Applied Materials, Inc. High precision flexure stage
US6437463B1 (en) 2000-04-24 2002-08-20 Nikon Corporation Wafer positioner with planar motor and mag-lev fine stage
US6653639B1 (en) * 2000-10-17 2003-11-25 Nikon Corporation Chuck for mounting reticle to a reticle stage
US6688183B2 (en) * 2001-01-19 2004-02-10 Massachusetts Institute Of Technology Apparatus having motion with pre-determined degrees of freedom
US6791669B2 (en) 2001-04-12 2004-09-14 Nikon Corporation Positioning device and exposure apparatus including the same
US20030098965A1 (en) * 2001-11-29 2003-05-29 Mike Binnard System and method for supporting a device holder with separate components
US7068891B1 (en) 2002-03-12 2006-06-27 Palomar Technologies, Inc. System and method for positioning optical fibers
US20040080730A1 (en) * 2002-10-29 2004-04-29 Michael Binnard System and method for clamping a device holder with reduced deformation
JP4162664B2 (ja) 2005-02-22 2008-10-08 株式会社日立製作所 真空スイッチギヤ
DE102006034162B4 (de) * 2006-04-21 2008-11-27 Physik Instrumente (Pi) Gmbh & Co. Kg Piezoelektrische Einachsen-Verstelleinrichtung
KR101678065B1 (ko) * 2010-12-09 2016-12-07 삼성전자 주식회사 위치 정렬 장치 및 이의 조인트 모듈
US9588310B2 (en) 2012-06-25 2017-03-07 Quantum Elctro Opto Systems Sdn Bhd. Method and apparatus for aligning of opto-electronic components
WO2015191543A1 (en) * 2014-06-10 2015-12-17 Applied Materials Israel, Ltd. Scanning an object using multiple mechanical stages
US10184607B2 (en) 2016-05-18 2019-01-22 Aerotech, Inc. Open frame, parallel, two axis flexure stage with yaw compensation
CN107329376B (zh) * 2017-07-18 2019-02-22 中国科学院光电研究院 具有位置调节功能的嵌套式支承结构及其用途
CN110347119B (zh) * 2019-06-29 2021-11-16 瑞声科技（南京）有限公司 运动控制结构以及执行器
PL447702A1 (pl) * 2024-02-05 2025-08-11 Politechnika Krakowska im. Tadeusza Kościuszki Manipulator do mikroprzemieszczeń i obrotu elementu wykonawczego na płaszczyźnie

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1572353A1 (de) * 1967-05-27 1970-04-23 Wenczler & Heidenhain Verfahren zur Herstellung von Teilungen und sonstigen Bildmustern
US4068947A (en) * 1973-03-09 1978-01-17 The Perkin-Elmer Corporation Optical projection and scanning apparatus
US4019109A (en) * 1974-05-13 1977-04-19 Hughes Aircraft Company Alignment system and method with micromovement stage
FR2371716A1 (fr) * 1976-11-19 1978-06-16 Thomson Csf Appareil photorepeteur de masques
US4528451A (en) * 1982-10-19 1985-07-09 Varian Associates, Inc. Gap control system for localized vacuum processing
US4525852A (en) * 1983-03-15 1985-06-25 Micronix Partners Alignment apparatus

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2017143248A (ja) * 2015-12-31 2017-08-17 ラム リサーチ コーポレーションＬａｍ Ｒｅｓｅａｒｃｈ Ｃｏｒｐｏｒａｔｉｏｎ 半導体処理装置においてシャワーヘッド傾斜を動的に調整するためのアクチュエータ
JP2021170671A (ja) * 2015-12-31 2021-10-28 ラム リサーチ コーポレーションLam Research Corporation 半導体処理装置においてシャワーヘッド傾斜を動的に調整するためのアクチュエータ
US11230765B2 (en) 2015-12-31 2022-01-25 Lam Research Corporation Actuator to adjust dynamically showerhead tilt in a semiconductor-processing apparatus
JP2023082177A (ja) * 2015-12-31 2023-06-13 ラム リサーチ コーポレーション シャワーヘッド傾斜を動的に調整するためのアクチュエータ

Also Published As

Publication number Publication date
EP0147169A3 (en) 1985-08-21
EP0147169B1 (en) 1988-09-21
EP0147169A2 (en) 1985-07-03
JPH0334206B2 (enExample) 1991-05-21
DE3474219D1 (en) 1988-10-27
US4694477A (en) 1987-09-15

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