JPS60131536A - 水なし平版印刷版原板 - Google Patents

水なし平版印刷版原板

Info

Publication number
JPS60131536A
JPS60131536A JP23983883A JP23983883A JPS60131536A JP S60131536 A JPS60131536 A JP S60131536A JP 23983883 A JP23983883 A JP 23983883A JP 23983883 A JP23983883 A JP 23983883A JP S60131536 A JPS60131536 A JP S60131536A
Authority
JP
Japan
Prior art keywords
layer
polyether
printing
acid
lithographic printing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23983883A
Other languages
English (en)
Japanese (ja)
Other versions
JPH043543B2 (enExample
Inventor
Kuniyuki Sakai
酒井　国行
Chiaki Tanaka
千秋 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP23983883A priority Critical patent/JPS60131536A/ja
Publication of JPS60131536A publication Critical patent/JPS60131536A/ja
Publication of JPH043543B2 publication Critical patent/JPH043543B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP23983883A 1983-12-21 1983-12-21 水なし平版印刷版原板 Granted JPS60131536A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP23983883A JPS60131536A (ja) 1983-12-21 1983-12-21 水なし平版印刷版原板

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP23983883A JPS60131536A (ja) 1983-12-21 1983-12-21 水なし平版印刷版原板

Publications (2)

Publication Number Publication Date
JPS60131536A true JPS60131536A (ja) 1985-07-13
JPH043543B2 JPH043543B2 (enExample) 1992-01-23

Family

ID=17050610

Family Applications (1)

Application Number Title Priority Date Filing Date
JP23983883A Granted JPS60131536A (ja) 1983-12-21 1983-12-21 水なし平版印刷版原板

Country Status (1)

Country Link
JP (1) JPS60131536A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6346465A (ja) * 1986-04-11 1988-02-27 Toray Ind Inc 水なし平版印刷用原版
JPH07253661A (ja) * 1986-04-11 1995-10-03 Toray Ind Inc 水なし平版印刷用原版
US6379571B1 (en) * 1998-06-11 2002-04-30 Canon Kabushiki Kaisha Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6346465A (ja) * 1986-04-11 1988-02-27 Toray Ind Inc 水なし平版印刷用原版
JPH07253661A (ja) * 1986-04-11 1995-10-03 Toray Ind Inc 水なし平版印刷用原版
US6379571B1 (en) * 1998-06-11 2002-04-30 Canon Kabushiki Kaisha Etching method for processing substrate, dry etching method for polyetheramide resin layer, production method of ink-jet printing head, ink-jet head and ink-jet printing apparatus

Also Published As

Publication number Publication date
JPH043543B2 (enExample) 1992-01-23

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