JPS60130558A - 新規なスクエアリウム化合物およびその製造方法 - Google Patents
新規なスクエアリウム化合物およびその製造方法Info
- Publication number
- JPS60130558A JPS60130558A JP58236203A JP23620383A JPS60130558A JP S60130558 A JPS60130558 A JP S60130558A JP 58236203 A JP58236203 A JP 58236203A JP 23620383 A JP23620383 A JP 23620383A JP S60130558 A JPS60130558 A JP S60130558A
- Authority
- JP
- Japan
- Prior art keywords
- formula
- compound
- novel
- preparation
- methyl group
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 150000001875 compounds Chemical class 0.000 title claims abstract description 16
- 238000002360 preparation method Methods 0.000 title abstract description 3
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 claims abstract description 8
- 125000002490 anilino group Chemical class [H]N(*)C1=C([H])C([H])=C([H])C([H])=C1[H] 0.000 claims abstract 2
- 229910052739 hydrogen Inorganic materials 0.000 claims description 6
- 239000001257 hydrogen Substances 0.000 claims description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 6
- 238000004519 manufacturing process Methods 0.000 claims description 4
- WURBFLDFSFBTLW-UHFFFAOYSA-N benzil Chemical compound C=1C=CC=CC=1C(=O)C(=O)C1=CC=CC=C1 WURBFLDFSFBTLW-UHFFFAOYSA-N 0.000 claims description 2
- 125000005843 halogen group Chemical group 0.000 claims 2
- 206010034972 Photosensitivity reaction Diseases 0.000 abstract description 8
- 230000036211 photosensitivity Effects 0.000 abstract description 8
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 abstract description 6
- 239000000463 material Substances 0.000 abstract description 5
- 239000000126 substance Substances 0.000 abstract description 5
- 239000002904 solvent Substances 0.000 abstract description 3
- 230000003287 optical effect Effects 0.000 abstract description 2
- 239000004065 semiconductor Substances 0.000 abstract description 2
- 229910052736 halogen Inorganic materials 0.000 abstract 1
- 150000002367 halogens Chemical class 0.000 abstract 1
- PWEBUXCTKOWPCW-UHFFFAOYSA-N squaric acid Chemical compound OC1=C(O)C(=O)C1=O PWEBUXCTKOWPCW-UHFFFAOYSA-N 0.000 abstract 1
- YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 238000000862 absorption spectrum Methods 0.000 description 3
- 150000001448 anilines Chemical class 0.000 description 3
- 108091008695 photoreceptors Proteins 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- 238000000921 elemental analysis Methods 0.000 description 2
- AMQJEAYHLZJPGS-UHFFFAOYSA-N N-Pentanol Chemical compound CCCCCO AMQJEAYHLZJPGS-UHFFFAOYSA-N 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 230000002939 deleterious effect Effects 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 150000002484 inorganic compounds Chemical class 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- LXZGVFCKZRHKMU-UHFFFAOYSA-N n-benzyl-n-methylaniline Chemical compound C=1C=CC=CC=1N(C)CC1=CC=CC=C1 LXZGVFCKZRHKMU-UHFFFAOYSA-N 0.000 description 1
- 231100000252 nontoxic Toxicity 0.000 description 1
- 230000003000 nontoxic effect Effects 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical class N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 239000000049 pigment Substances 0.000 description 1
- 231100000614 poison Toxicity 0.000 description 1
- 230000007096 poisonous effect Effects 0.000 description 1
- 238000000746 purification Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E10/00—Energy generation through renewable energy sources
- Y02E10/50—Photovoltaic [PV] energy
- Y02E10/549—Organic PV cells
Landscapes
- Light Receiving Elements (AREA)
- Photoreceptors In Electrophotography (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Priority Applications (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58236203A JPS60130558A (ja) | 1983-12-16 | 1983-12-16 | 新規なスクエアリウム化合物およびその製造方法 |
| DE8484115344T DE3465985D1 (en) | 1983-12-16 | 1984-12-13 | Novel squarylium compound and photoreceptor containing same |
| EP84115344A EP0146123B1 (en) | 1983-12-16 | 1984-12-13 | Novel squarylium compound and photoreceptor containing same |
| US06/942,922 US4908289A (en) | 1983-12-16 | 1986-12-17 | Photoreceptor for electrophotography |
| US07/091,340 US4752650A (en) | 1983-12-16 | 1987-08-31 | Photoreceptor for electrophotography |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP58236203A JPS60130558A (ja) | 1983-12-16 | 1983-12-16 | 新規なスクエアリウム化合物およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60130558A true JPS60130558A (ja) | 1985-07-12 |
| JPH0348948B2 JPH0348948B2 (enrdf_load_stackoverflow) | 1991-07-26 |
Family
ID=16997305
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP58236203A Granted JPS60130558A (ja) | 1983-12-16 | 1983-12-16 | 新規なスクエアリウム化合物およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60130558A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63113464A (ja) * | 1986-10-30 | 1988-05-18 | Fuji Xerox Co Ltd | 電子写真感光体 |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142946A (ja) * | 1983-12-05 | 1985-07-29 | ゼロツクス コーポレーシヨン | 非対称スクアライン化合物 |
| JPS60142947A (ja) * | 1983-12-05 | 1985-07-29 | ゼロツクス コーポレーシヨン | 新規なベンジルフツ化スクアライン化合物を含む光導電性装置 |
-
1983
- 1983-12-16 JP JP58236203A patent/JPS60130558A/ja active Granted
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60142946A (ja) * | 1983-12-05 | 1985-07-29 | ゼロツクス コーポレーシヨン | 非対称スクアライン化合物 |
| JPS60142947A (ja) * | 1983-12-05 | 1985-07-29 | ゼロツクス コーポレーシヨン | 新規なベンジルフツ化スクアライン化合物を含む光導電性装置 |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63113464A (ja) * | 1986-10-30 | 1988-05-18 | Fuji Xerox Co Ltd | 電子写真感光体 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0348948B2 (enrdf_load_stackoverflow) | 1991-07-26 |
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